SCHEMBL23383136

SCHEMBL23383136

CC(C)(C)OC(=O)c1ccc(OCC(C(=O)O)C(F)(F)F)cc1

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 3/20 0.41
LMNA P02545 1/20 0.41
POLB P06746 1/20 0.41
NPSR1 Q6W5P4 1/20 0.41
SLC7A5 Q01650 1/20 0.40
CA12 O43570 1/20 0.40
CA1 P00915 1/20 0.40
CA2 P00918 1/20 0.40
CA9 Q16790 1/20 0.40
CA14 Q9ULX7 1/20 0.40
RAB9A P51151 1/20 0.39
ADRB2 P07550 2/20 0.39
ADRB1 P08588 2/20 0.39
ADRB3 P13945 2/20 0.39
ELANE P08246 2/20 0.38
GAA P10253 1/20 0.38
TSHR P16473 1/20 0.38
NR1H2 P55055 3/20 0.38
RXRA P19793 2/20 0.38
NR1H3 Q13133 2/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23383134 0.84 ACACB (0.39) MAPTLMNAPOLBNPSR1TSHR
SCHEMBL23382581 0.83 ELANE (0.51) MAPTLMNAPOLBNPSR1CA2
SCHEMBL23383132 0.81 ELANE (0.52) MAPTADRB2ADRB1ADRB3ELANE
SCHEMBL23383129 0.80 TP53 (0.44) MAPTADRB2ADRB1ADRB3TSHR
SCHEMBL23383133 0.77 ADRB2 (0.41) MAPTRAB9AADRB2ADRB1ADRB3
SCHEMBL11887264 0.76 PARP10 (0.58) MAPTLMNANPSR1RAB9AGAA
SCHEMBL20649443 0.74 MAPT (0.49) MAPTCA12CA1CA2CA9
SCHEMBL23383127 0.74 TP53 (0.42) MAPTADRB2ADRB1ADRB3TSHR
SCHEMBL16092469 0.73 MAPT (0.46) MAPTCA12CA1CA2CA9
SCHEMBL578611 0.73 MAPT (0.54) MAPTCA12CA1CA2CA9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11762287-B2 Onium salt compound, chemically amplified resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-19 US disclosed
US-11762287-B2 Onium salt compound, chemically amplified resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-19 US disclosed
US-20210149301-A1 ONIUM SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-05-20 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11762287-B2 Onium salt compound, chemically amplified resist composition and patterning process IDUA, SLC6A5, SLC6A9 MAPT 1694/4885LMNA 1080/4885POLB 416/4885
US-20210149301-A1 ONIUM SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS IDUA, SLC6A5, SLC6A9 MAPT 1694/4885LMNA 1080/4885POLB 416/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.