Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GAA | P10253 | 2/20 | 0.58 |
| ▸ | MGAM | O43451 | 1/20 | 0.58 |
| ▸ | SI | P14410 | 1/20 | 0.58 |
| ▸ | MGAM2 | Q2M2H8 | 1/20 | 0.58 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.43 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.43 |
| ▸ | POLB | P06746 | 1/20 | 0.39 |
| ▸ | FAAH | O00519 | 8/20 | 0.39 |
| ▸ | CES1 | P23141 | 5/20 | 0.38 |
| ▸ | CES2 | O00748 | 3/20 | 0.38 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.38 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.38 |
| ▸ | MEN1 | O00255 | 1/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.38 |
| ▸ | LMNA | P02545 | 1/20 | 0.37 |
| ▸ | NPC1 | O15118 | 1/20 | 0.36 |
| ▸ | RAB9A | P51151 | 1/20 | 0.36 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL77331 | 0.98 | GAA (0.61) | GAAMGAMSIMGAM2ALDH1A1 | |
| SCHEMBL7406648 | 0.96 | GAA (0.58) | GAAMGAMSIMGAM2ALDH1A1 | |
| SCHEMBL7210415 | 0.96 | GAA (0.58) | GAAMGAMSIMGAM2ALDH1A1 | |
| Water SCHEMBL10546276 | 0.96 | GAA (0.58) | GAAMGAMSIMGAM2ALDH1A1 | |
| SCHEMBL5149685 | 0.94 | GAA (0.56) | GAAMGAMSIMGAM2ALDH1A1 | |
| SCHEMBL5148170 | 0.90 | GAA (0.52) | GAAMGAMSIMGAM2ALDH1A1 | |
| SCHEMBL25223809 | 0.88 | GAA (0.54) | GAAMGAMSIMGAM2ALDH1A1 | |
| SCHEMBL2157670 | 0.87 | GAA (0.48) | GAAMGAMSIMGAM2ALDH1A1 | |
| SCHEMBL6248725 | 0.83 | GAA (0.58) | GAAMGAMSIMGAM2ALDH1A1 | |
| SCHEMBL15286697 | 0.83 | GAA (0.58) | GAAMGAMSIMGAM2ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7682774-B2 | Resin composition comprising catalyst precursor for electroless plating to form electromagnetic wave shielding layer, methods for forming metal patterns using the resin composition and metal patterns formed by the methods | LG CHEM, LTD. (KR) | 2010-03-23 | — | — | US | claimed |
| WO-2007119966-A9 | RESIN COMPOSITION COMPRISING CATALYST PRECURSOR FOR ELECTROLESS PLATING TO FORM ELECTROMAGNETIC WAVE SHIELDING LAYER, METHODS FOR FORMING METAL PATTERNS USING THE RESIN COMPOSITION AND METAL PATTERNS FORMED BY THE METHODS | LG CHEMICAL LTD (KR) | 2008-10-02 | — | — | WO | claimed |
| WO-2007119966-A1 | RESIN COMPOSITION COMPRISING CATALYST PRECURSOR FOR ELECTROLESS PLATING TO FORM ELECTROMAGNETIC WAVE SHIELDING LAYER, METHODS FOR FORMING METAL PATTERNS USING THE RESIN COMPOSITION AND METAL PATTERNS FORMED BY THE METHODS | LG CHEM, LTD. (KR) | 2007-10-25 | — | — | WO | claimed |
| US-20070243363-A1 | Resin composition comprising catalyst precursor for electroless plating to form electromagnetic wave shielding layer, methods for forming metal patterns using the resin composition and metal patterns formed by the methods | LG CHEM, LTD. (KR) | 2007-10-18 | — | — | US | claimed |
| US-20230274853-A1 | THIN METAL ELECTRODE FILMS, AND MANUFACTURING METHOD THEREOF | CLAP CO., LTD (KR) | 2023-08-31 | — | — | US | disclosed |
| WO-2022012937-A1 | THIN METAL ELECTRODE FILMS, AND MANUFACTURING METHOD THEREOF | BASF SE (DE) | 2022-01-20 | — | — | WO | disclosed |
| EP-3941167-A1 | THIN METAL ELECTRODE FILMS, AND MANUFACTURING METHOD THEREOF | BASF SE (DE) | 2022-01-19 | — | — | EP | disclosed |
| US-7682774-B2 | Resin composition comprising catalyst precursor for electroless plating to form electromagnetic wave shielding layer, methods for forming metal patterns using the resin composition and metal patterns formed by the methods | LG CHEM, LTD. (KR) | 2010-03-23 | — | — | US | disclosed |
| WO-2007119966-A9 | RESIN COMPOSITION COMPRISING CATALYST PRECURSOR FOR ELECTROLESS PLATING TO FORM ELECTROMAGNETIC WAVE SHIELDING LAYER, METHODS FOR FORMING METAL PATTERNS USING THE RESIN COMPOSITION AND METAL PATTERNS FORMED BY THE METHODS | LG CHEMICAL LTD (KR) | 2008-10-02 | — | — | WO | disclosed |
| WO-2007119966-A1 | RESIN COMPOSITION COMPRISING CATALYST PRECURSOR FOR ELECTROLESS PLATING TO FORM ELECTROMAGNETIC WAVE SHIELDING LAYER, METHODS FOR FORMING METAL PATTERNS USING THE RESIN COMPOSITION AND METAL PATTERNS FORMED BY THE METHODS | LG CHEM, LTD. (KR) | 2007-10-25 | — | — | WO | disclosed |
| US-20070243363-A1 | Resin composition comprising catalyst precursor for electroless plating to form electromagnetic wave shielding layer, methods for forming metal patterns using the resin composition and metal patterns formed by the methods | LG CHEM, LTD. (KR) | 2007-10-18 | — | — | US | disclosed |