SCHEMBL3267874

SCHEMBL3267874

O=S(=O)(O)CCCN1CC=Cc2ccccc21

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 5/20 0.43
MAPK1 P28482 5/20 0.43
MMP13 P45452 4/20 0.43
POLB P06746 4/20 0.43
HPGD P15428 4/20 0.43
TDP1 Q9NUW8 4/20 0.43
ALDH1A1 P00352 3/20 0.43
ALPG P10696 2/20 0.43
HTR1A P08908 2/20 0.34
DRD2 P14416 2/20 0.34
CHRM2 P08172 1/20 0.34
ADRA2A P08913 1/20 0.34
CHRM1 P11229 1/20 0.34
ADRA2B P18089 1/20 0.34
ADRA2C P18825 1/20 0.34
DRD1 P21728 1/20 0.34
PTGS1 P23219 1/20 0.34
SLC6A2 P23975 1/20 0.34
HTR2A P28223 1/20 0.34
SLC6A4 P31645 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28673885 0.96 MAPK1 (0.40) MAPTMAPK1MMP13POLBHPGD
SCHEMBL28673818 0.86 HTR1A (0.38) MAPTMAPK1MMP13POLBHPGD
Sulfuric Acid SCHEMBL27824624 0.82 CDC25A (0.41) ALDH1A1P2RX4P2RX1P2RX3LMNA
Sulfuric Acid SCHEMBL27824625 0.82 CDC25A (0.41) ALDH1A1P2RX4P2RX1P2RX3LMNA
SCHEMBL29690406 0.78 NOTUM (0.34) POLBHPGDALDH1A1MEN1KMT2A
SCHEMBL27498727 0.78 NOTUM (0.34) POLBHPGDALDH1A1MEN1KMT2A
Ammonia Solution, Strong SCHEMBL31438608 0.77 NOTUM (0.34) POLBHPGDALDH1A1MEN1KMT2A
SCHEMBL16836340 0.77 DRD2 (0.37) MAPTMAPK1TDP1ALDH1A1HTR1A
SCHEMBL30346054 0.77 DRD2 (0.46) MAPK1ALDH1A1HTR1ADRD2CHRM2
SCHEMBL3373919 0.77 DRD2 (0.46) MAPK1ALDH1A1HTR1ADRD2CHRM2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0492731-B1 Method for forming a sieve material having low internal stress and sieve material so obtained STORK SCREENS BV (NL) 1996-03-20 EP claimed
US-5282951-A Method for forming a sieve material having low internal stress and sieve material so obtained STORK SCREENS, B.V. (NL) 1994-02-01 US claimed
EP-0492731-A1 Method for forming a sieve material having low internal stress and sieve material so obtained STORK SCREENS B.V. (NL) 1992-07-01 EP claimed
EP-1567310-B1 SCREEN MATERIAL MANUFACTURING METHOD AND APPLICATIONS THEREOF STORK PRINTS BV (NL) 2010-06-09 EP disclosed
US-7449248-B2 Screen material manufacturing method and applications thereof STORK PRINTS B.V. (NL) 2008-11-11 US disclosed
US-20060141279-A1 Screen material manufacturing method and applications thereof STORK PRINTS B.V. (NL) 2006-06-29 US disclosed
EP-1567310-A1 SCREEN MATERIAL MANUFACTURING METHOD AND APPLICATIONS THEREOF Stork Prints B.V. (NL) 2005-08-31 EP disclosed
WO-2004043659-A1 SCREEN MATERIAL MANUFACTURING METHOD AND APPLICATIONS THEREOF STORK PRINTS B.V. (NL) 2004-05-27 WO disclosed
US-5282951-A Method for forming a sieve material having low internal stress and sieve material so obtained STORK SCREENS, B.V. (NL) 1994-02-01 US disclosed