Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 1/20 | 0.35 |
| ▸ | BLM | P54132 | 1/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.35 |
| ▸ | GSK3A | P49840 | 1/20 | 0.31 |
| ▸ | GSK3B | P49841 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10311254 | 0.82 | — | — | |
| SCHEMBL200674 | 0.77 | MAPT (0.41) | MEN1BLMKMT2AGSK3AGSK3B | |
| SCHEMBL22281755 | 0.76 | GAA (0.32) | GSK3AGSK3B | |
| SCHEMBL1263355 | 0.74 | MAPT (0.40) | MEN1BLMKMT2AGSK3AGSK3B | |
| SCHEMBL1263023 | 0.74 | MAPT (0.40) | MEN1BLMKMT2AGSK3AGSK3B | |
| SCHEMBL4006398 | 0.74 | MAPT (0.40) | MEN1BLMKMT2AGSK3AGSK3B | |
| SCHEMBL13438551 | 0.74 | MEN1 (0.34) | MEN1KMT2A | |
| SCHEMBL9612339 | 0.72 | MEN1 (0.35) | MEN1BLMKMT2A | |
| SCHEMBL6162735 | 0.72 | ALDH1A1 (0.43) | MEN1KMT2A | |
| SCHEMBL5266922 | 0.72 | MAPT (0.35) | MEN1BLMKMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9875904-B2 | Silicon etching liquid, silicon etching method, and microelectromechanical element | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2018-01-23 | — | — | US | claimed |
| US-20150340241-A1 | SILICON ETCHING LIQUID, SILICON ETCHING METHOD, AND MICROELECTROMECHANICAL ELEMENT | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2015-11-26 | — | — | US | claimed |
| JP-4126703-A | — | — | None | — | — | JP | disclosed |
| US-9875904-B2 | Silicon etching liquid, silicon etching method, and microelectromechanical element | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2018-01-23 | — | — | US | disclosed |
| US-20150340241-A1 | SILICON ETCHING LIQUID, SILICON ETCHING METHOD, AND MICROELECTROMECHANICAL ELEMENT | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2015-11-26 | — | — | US | disclosed |
| EP-0694298-B1 | PREFORMED GLASS IONOMER FILLER WHICH CAN SUSTAINEDLY RELEASE FLUORIDE ION AND DENTAL COMPOSITION CONTAINING THE SAME | SHOFU INC (JP) | 2010-06-09 | — | — | EP | disclosed |
| US-5883153-A | SUSTAINED RELEASE GLASS IONOMERS | SHOFU INC. (JP) | 1999-03-16 | — | — | US | disclosed |
| EP-0480785-B1 | Polymerization initiator composition controlling polymerization at interface and curable composition containing same | TERUMO CORP (JP) | 1996-12-27 | — | — | EP | disclosed |
| EP-0694298-A1 | PREFORMED GLASS IONOMER FILLER WHICH CAN SUSTAINEDLY RELEASE FLUORIDE ION AND DENTAL COMPOSITION CONTAINING THE SAME | SHOFU INC. (JP) | 1996-01-31 | — | — | EP | disclosed |
| US-5264513-A | Dental adhesive | KABUSHIKI KAISHA SHOFU (JP) | 1993-11-23 | — | — | US | disclosed |
| US-5166117-A | (thio)barbituric acid and metal halide as polymerization catalysts | TERUMO KABUSHIKI KAISHA (JP) | 1992-11-24 | — | — | US | disclosed |
| JP-H04126703-A | POLYMERIZATION INITIATOR COMPOSITION OF CONTROLLING POLYMERIZATION ON INTERFACE AND CURABLE COMPOSITION CONTAINING THE SAME COMPOSITION | TERUMO CORP | 1992-04-27 | — | — | JP | disclosed |
| EP-0480785-A2 | Polymerization initiator composition controlling polymerization at interface and curable composition containing same | TERUMO KABUSHIKI KAISHA (JP) | 1992-04-15 | — | — | EP | disclosed |