⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15915870 | 0.97 | — | — | |
| SCHEMBL9403825 | 0.87 | — | — | |
| SCHEMBL17533485 | 0.86 | — | — | |
| SCHEMBL9622170 | 0.80 | — | — | |
| SCHEMBL1315979 | 0.80 | — | — | |
| SCHEMBL723507 | 0.78 | — | — | |
| SCHEMBL10014694 | 0.77 | ALDH1A1 (0.32) | — | |
| SCHEMBL1562370 | 0.77 | — | — | |
| SCHEMBL9649925 | 0.74 | — | — | |
| SCHEMBL476203 | 0.74 | CES2 (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 43 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9970103-B2 | Film deposition material, sealing film using the same and use thereof | TOSOH CORPORATION (JP) | 2018-05-15 | — | — | US | disclosed |
| US-9695301-B2 | Nanoparticle, method for producing nanoparticle, addition curing silicone resin composition, and semiconductor apparatus | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-07-04 | — | — | US | disclosed |
| US-20160355671-A1 | NANOPARTICLE, METHOD FOR PRODUCING NANOPARTICLE, ADDITION CURING SILICONE RESIN COMPOSITION, AND SEMICONDUCTOR APPARATUS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-12-08 | — | — | US | disclosed |
| EP-3101062-A1 | NANOPARTICLE, METHOD FOR PRODUCING NANOPARTICLE, ADDITION CURING SILICONE RESIN COMPOSITION, AND SEMICONDUCTOR APPARATUS | Shin-Etsu Chemical Co., Ltd. (JP) | 2016-12-07 | — | — | EP | disclosed |
| US-20160326642-A1 | FILM DEPOSITION MATERIAL, SEALING FILM USING THE SAME AND USE THEREOF | TOSOH CORPORATION (JP) | 2016-11-10 | — | — | US | disclosed |
| US-9403967-B2 | Curable resin composition, cured product thereof and photosemiconductor apparatus | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-08-02 | — | — | US | disclosed |
| US-9403967-B2 | Curable resin composition, cured product thereof and photosemiconductor apparatus | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-08-02 | — | — | US | disclosed |
| US-20160185912-A1 | CURABLE SILICONE RESIN COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-06-30 | — | — | US | disclosed |
| EP-1770127-B1 | Method of reducing surface tackiness of silicone rubber cured product, liquid silicone rubber composition for sealing semiconductor, silicone rubber-sealed semiconductor device, and method of producing semiconductor device | SHINETSU CHEMICAL CO (JP) | 2016-05-04 | — | — | EP | disclosed |
| US-9306133-B2 | Optical semiconductor device | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-04-05 | — | — | US | disclosed |
| US-20070049691-A1 | Water-dispersible polyisocyanate composition, production thereof, and water-based curable composition and application thereof | DAINIPPON INK AND CHEMICALS, INC. (JP) | 2007-03-01 | — | — | US | disclosed |
| US-7166673-B2 | Water-dispersible polyisocyanate composition, process for its production, water-base curable composition and its application | DAINIPPON INK AND CHEMICALS, INC. (JP) | 2007-01-23 | — | — | US | disclosed |
| EP-1329468-A1 | WATER-DISPERSIBLE POLYISOCYANATE COMPOSITION, PROCESS FOR ITS PRODUCTION, WATER-BASE CURABLE COMPOSITION AND ITS APPLICATION | DAINIPPON INK AND CHEMICALS, INC. (JP) | 2003-07-23 | — | — | EP | disclosed |
| US-20030069353-A1 | Water-dispersible polyisocyanate composition, process for its production, water-base curable composition and its application | DAINIPPON INK AND CHEMICALS, INC. (JP) | 2003-04-10 | — | — | US | disclosed |
| EP-0556802-B1 | Method for preparing organomonochlorosilane | SHINETSU CHEMICAL CO (JP) | 1997-05-02 | — | — | EP | disclosed |
| EP-0556802-A1 | Method for preparing organomonochlorosilane | Shin-Etsu Chemical Co., Ltd. (JP) | 1993-08-25 | — | — | EP | disclosed |
| US-4956484-A | CATALYTIC HYDROGENATION OF PHENYL SILANE COMPOUND USING RANEY NICKEL CATALYSTS | INSTITUTO GUIDO DONEGANI S.P.A. (IT) | 1990-09-11 | — | — | US | disclosed |
| US-4912243-A | Catalytic hydrogenation of corresponding aromatic compound | ISTITUTO GUIDO DONEGANI S.P.A. (IT) | 1990-03-27 | — | — | US | disclosed |
| EP-0294745-A2 | A process of producing a silanic or siloxanic compound containing at least one cycloalkyl ring | ISTITUTO GUIDO DONEGANI S.p.A. (IT) | 1988-12-14 | — | — | EP | disclosed |
| EP-0281425-A2 | A process for producing a silanic or siloxanic compound containing at least one cycloalkylic ring | ISTITUTO GUIDO DONEGANI S.p.A. (IT) | 1988-09-07 | — | — | EP | disclosed |