Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28236997 | 1.00 | ALDH1A1 (0.40) | ALDH1A1SHBG | |
| Biphenyl SCHEMBL3836338 | 1.00 | ALDH1A1 (0.40) | ALDH1A1SHBG | |
| SCHEMBL28236989 | 0.97 | ALDH1A1 (0.42) | ALDH1A1 | |
| SCHEMBL28236993 | 0.87 | — | — | |
| SCHEMBL7924004 | 0.77 | SHBG (0.39) | SHBG | |
| Hydrochloric Acid SCHEMBL27663825 | 0.71 | — | — | |
| SCHEMBL27839497 | 0.71 | — | — | |
| Biphenyl SCHEMBL2855816 | 0.70 | ALDH1A1 (0.47) | ALDH1A1 | |
| SCHEMBL28221838 | 0.70 | ALDH1A1 (0.47) | ALDH1A1 | |
| SCHEMBL28236980 | 0.70 | ALDH1A1 (0.47) | ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 56 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2628744-B1 | Silicon-containing surface modifier, resist underlayer film composition containing this, and patterning process | SHINETSU CHEMICAL CO (JP) | 2016-11-30 | — | — | EP | claimed |
| CN-114660896-B | Composition for forming silicon-containing resist underlayer film, pattern forming method, and silicon compound | 信越化学工业株式会社 | 2024-06-11 | — | — | CN | disclosed |
| CN-116804825-A | Composition for forming silicon-containing metal hard mask and pattern forming method | 信越化学工业株式会社 | 2023-09-26 | — | — | CN | disclosed |
| CN-111458980-B | Composition for forming underlayer film of silicon-containing resist and method for forming pattern | 信越化学工业株式会社 | 2023-08-11 | — | — | CN | disclosed |
| CN-114660896-A | Composition for forming silicon-containing resist underlayer film, pattern forming method, and silicon compound | 信越化学工业株式会社 | 2022-06-24 | — | — | CN | disclosed |
| EP-4012499-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2022-06-15 | — | — | EP | disclosed |
| CN-114594657-A | Composition for forming silicon-containing resist underlayer film and pattern formation method | 信越化学工业株式会社 | 2022-06-07 | — | — | CN | disclosed |
| CN-112526822-A | Composition for forming silicon-containing resist underlayer film and pattern forming method | 信越化学工业株式会社 | 2021-03-19 | — | — | CN | disclosed |
| CN-112286000-A | Composition for forming silicon-containing resist underlayer film and pattern forming method | 信越化学工业株式会社 | 2021-01-29 | — | — | CN | disclosed |
| CN-111856882-A | Composition for forming silicon-containing resist underlayer film and pattern forming method | 信越化学工业株式会社 | 2020-10-30 | — | — | CN | disclosed |
| EP-2657240-A1 | Silicon compound, silicon-containing compound, composition for forming resits underlayer film containing the same and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2013-10-30 | — | — | EP | disclosed |
| EP-2628744-A1 | Silicon-containing surface modifier, resist underlayer film composition containing this, and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2013-08-21 | — | — | EP | disclosed |
| EP-2599818-A1 | Silicon-containing resist underlayer film-forming composition and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2013-06-05 | — | — | EP | disclosed |
| EP-2599819-A1 | Silicon-containing resist underlayer film-forming composition and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2013-06-05 | — | — | EP | disclosed |
| US-20130137041-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-05-30 | — | — | US | disclosed |
| US-20130137271-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-05-30 | — | — | US | disclosed |
| US-8198016-B2 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-06-12 | — | — | US | disclosed |
| US-20100086870-A1 | Composition for forming silicon-containing film, silicon-containing film-formed substrate and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-04-08 | — | — | US | disclosed |
| EP-2172807-A1 | Composition for forming silicon-containing film, silicon-containing film-formed substrate and patterning process | Shinetsu Chemical Co., Ltd. (JP) | 2010-04-07 | — | — | EP | disclosed |
| US-20090286188-A1 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-11-19 | — | — | US | disclosed |