Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL106461 | 0.74 | — | — | |
| Fluoride SCHEMBL27859121 | 0.71 | — | — | |
| SCHEMBL3837099 | 0.70 | ALDH1A1 (0.47) | ALDH1A1 | |
| SCHEMBL28891532 | 0.70 | — | — | |
| SCHEMBL7760066 | 0.70 | SHBG (0.32) | SHBG | |
| Biphenyl SCHEMBL3836338 | 0.70 | ALDH1A1 (0.40) | ALDH1A1SHBG | |
| SCHEMBL9056587 | 0.69 | ALDH1A1 (0.44) | ALDH1A1SHBG | |
| SCHEMBL23106312 | 0.68 | SHBG (0.31) | SHBG | |
| Methoxymethane SCHEMBL4178435 | 0.68 | ALDH1A1 (0.61) | ALDH1A1SHBG | |
| Methoxymethane SCHEMBL4182037 | 0.68 | ALDH1A1 (0.61) | ALDH1A1SHBG |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 58 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2628744-B1 | Silicon-containing surface modifier, resist underlayer film composition containing this, and patterning process | SHINETSU CHEMICAL CO (JP) | 2016-11-30 | — | — | EP | claimed |
| CN-116804825-A | Composition for forming silicon-containing metal hard mask and pattern forming method | 信越化学工业株式会社 | 2023-09-26 | — | — | CN | disclosed |
| CN-111458980-B | Composition for forming underlayer film of silicon-containing resist and method for forming pattern | 信越化学工业株式会社 | 2023-08-11 | — | — | CN | disclosed |
| CN-108473684-B | Process for producing siloxane polymer | 东丽精细化工株式会社 | 2023-05-12 | — | — | CN | disclosed |
| CN-111856882-A | Composition for forming silicon-containing resist underlayer film and pattern forming method | 信越化学工业株式会社 | 2020-10-30 | — | — | CN | disclosed |
| US-10109485-B2 | Silicon-containing condensate, composition for forming a silicon-containing resist under layer film, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-10-23 | — | — | US | disclosed |
| EP-2657767-B1 | Patterning process | SHINETSU CHEMICAL CO (JP) | 2018-10-10 | — | — | EP | disclosed |
| EP-2826826-B1 | COMPOSITION FOR FORMING A COATING TYPE BPSG FILM, SUBSTRATE FORMED A FILM BY SAID COMPOSITION, AND PATTERNING PROCESS USING SAID COMPOSITION | SHINETSU CHEMICAL CO (JP) | 2018-08-01 | — | — | EP | disclosed |
| US-9971245-B2 | Silicon-containing polymer, silicon-containing compound, composition for forming a resist under layer film, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-05-15 | — | — | US | disclosed |
| US-20180081272-A1 | THERMAL CROSSLINKING ACCELERATOR, POLYSILOXANE-CONTAINING RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SAME, AND PATTERNING PROCESS USING SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-03-22 | — | — | US | disclosed |
| EP-2628744-A1 | Silicon-containing surface modifier, resist underlayer film composition containing this, and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2013-08-21 | — | — | EP | disclosed |
| US-20130210236-A1 | SILICON-CONTAINING SURFACE MODIFIER, RESIST UNDERLAYER FILM COMPOSITION CONTAINING THIS, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-08-15 | — | — | US | disclosed |
| EP-2599818-A1 | Silicon-containing resist underlayer film-forming composition and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2013-06-05 | — | — | EP | disclosed |
| EP-2599819-A1 | Silicon-containing resist underlayer film-forming composition and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2013-06-05 | — | — | EP | disclosed |
| US-20130137271-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-05-30 | — | — | US | disclosed |
| US-20130137041-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-05-30 | — | — | US | disclosed |
| US-8198016-B2 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-06-12 | — | — | US | disclosed |
| US-20100086870-A1 | Composition for forming silicon-containing film, silicon-containing film-formed substrate and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-04-08 | — | — | US | disclosed |
| EP-2172807-A1 | Composition for forming silicon-containing film, silicon-containing film-formed substrate and patterning process | Shinetsu Chemical Co., Ltd. (JP) | 2010-04-07 | — | — | EP | disclosed |
| US-20090286188-A1 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-11-19 | — | — | US | disclosed |