2-Ethoxyethanol

2-Ethoxyethanol

SCHEMBL3274562

C1CCC(COCC2CCCC2)C1.CCOCCO

nearest known ligand 0.56

Full drug profile on Sugi Atlas →

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.56
TSHR P16473 2/20 0.40
MEN1 O00255 2/20 0.36
KMT2A Q03164 2/20 0.36
THRB P10828 1/20 0.36
HTT P42858 1/20 0.36
MAPT P10636 1/20 0.36
KDM4E B2RXH2 1/20 0.36
POLB P06746 1/20 0.36
MAPK1 P28482 1/20 0.35
GBA1 P04062 2/20 0.34
UGCG Q16739 2/20 0.34
GBA2 Q9HCG7 2/20 0.34
SPHK2 Q9NRA0 4/20 0.32
SPHK1 Q9NYA1 4/20 0.32
LMNA P02545 1/20 0.31
NAAA Q02083 1/20 0.31
CYP1A2 P05177 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15333732 0.83 NAAA (0.36) ALDH1A1TSHRKDM4EPOLBGBA1
SCHEMBL31601986 0.83 GBA1 (0.44) TSHRMEN1KMT2AMAPK1GBA1
Propanol SCHEMBL3281015 0.83 CYP1A2 (0.39) TSHRMEN1KMT2ATHRBHTT
SCHEMBL7536089 0.83 GBA1 (0.44) TSHRMEN1KMT2AMAPK1GBA1
Alcohol SCHEMBL3274620 0.83 CYP1A2 (0.37) GBA1UGCGGBA2SPHK2SPHK1
2-Methoxyethanol SCHEMBL3280961 0.82 GBA1 (0.35) ALDH1A1TSHRMAPK1GBA1UGCG
SCHEMBL16404859 0.81 NAAA (0.39) ALDH1A1KDM4EPOLBGBA1UGCG
SCHEMBL21215385 0.81 MEN1 (0.50) ALDH1A1TSHRMEN1KMT2ATHRB
Ether SCHEMBL3295222 0.81 ALDH1A1 (0.37) ALDH1A1TSHRKDM4EPOLBGBA1
SCHEMBL4592512 0.81

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8852844-B2 Composition for forming silicon-containing film, silicon-containing film-formed substrate and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-10-07 US disclosed
US-20100086870-A1 Composition for forming silicon-containing film, silicon-containing film-formed substrate and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-04-08 US disclosed