Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EPHX1 | P07099 | 2/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.32 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.32 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.32 |
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.32 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL289970 | 0.81 | EPHX1 (0.39) | EPHX1MEN1KMT2ACYP1A2CYP3A4 | |
| SCHEMBL334898 | 0.81 | EPHX1 (0.39) | EPHX1MEN1KMT2ACYP1A2CYP3A4 | |
| SCHEMBL289969 | 0.81 | EPHX1 (0.39) | EPHX1MEN1KMT2ACYP1A2CYP3A4 | |
| SCHEMBL6441040 | 0.77 | CPA1 (0.35) | EPHX1MEN1KMT2ACYP1A2 | |
| SCHEMBL8132371 | 0.76 | EPHX1 (0.38) | EPHX1CYP1A2CYP3A4CYP2D6TSHR | |
| SCHEMBL6441035 | 0.74 | SMN1; SMN2 (0.32) | MEN1KMT2ACYP1A2 | |
| SCHEMBL6636811 | 0.72 | SRR (0.41) | EPHX1CYP1A2 | |
| SCHEMBL9090132 | 0.72 | TSHR (0.41) | EPHX1MEN1KMT2ATSHR | |
| SCHEMBL4244385 | 0.72 | EPHX1 (0.40) | EPHX1CYP1A2CYP3A4CYP2D6TSHR | |
| SCHEMBL4460887 | 0.71 | IDO1 (0.38) | EPHX1TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12441840-B2 | Compound, binder resin, negative-type photosensitive resin composition, and display device comprising black bank formed using same | LG CHEM, LTD. (KR) | 2025-10-14 | — | — | US | disclosed |
| US-11892772-B2 | Binder resin, negative-type photosensitive resin composition, and display device comprising black bank formed using same | LG CHEM, LTD. (KR) | 2024-02-06 | — | — | US | disclosed |
| US-20220365431-A1 | BINDER RESIN, NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, AND DISPLAY DEVICE COMPRISING BLACK BANK FORMED USING SAME | LG CHEM, LTD. (KR) | 2022-11-17 | — | — | US | disclosed |
| US-20220348716-A1 | COMPOUND, BINDER RESIN, NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, AND DISPLAY DEVICE COMPRISING BLACK BANK FORMED USING SAME | LG CHEM, LTD. (KR) | 2022-11-03 | — | — | US | disclosed |
| US-10578967-B2 | Resin composition, and display device comprising black bank manufactured by using same | LG CHEM, LTD. (KR) | 2020-03-03 | — | — | US | disclosed |
| US-20180180995-A1 | RESIN COMPOSITION, AND DISPLAY DEVICE COMPRISING BLACK BANK MANUFACTURED BY USING SAME | LG CHEM, LTD. (KR) | 2018-06-28 | — | — | US | disclosed |
| CN-102087473-B | Radiation sensitive resin composition, interlayer dielectric, and method for producing thereof | JSR CORP | 2014-04-16 | — | — | CN | disclosed |
| WO-2014017669-A1 | NEAR INFRARED ABSORPTIVE LIQUID COMPOSITION, NEAR INFRARED CUT FILTER USING THE SAME, METHOD OF MANUFACTURING THE SAME, AND CAMERA MODULE AND METHOD OF MANUFACTURING THE SAME | FUJIFILM CORPORATION (JP) | 2014-01-30 | — | — | WO | disclosed |
| CN-102087473-A | Radiation sensitive resin composition, interlayer dielectric, and method for producing thereof | JSR CORP | 2011-06-08 | — | — | CN | disclosed |
| US-20100085518-A1 | PHOTO-SENSITIVE RESIN COMPOSITION FOR BLACK MATRIX, BLACK MATRIX PRODUCED BY THE COMPOSITION AND LIQUID CRYSTAL DISPLAY INCLUDING THE BLACK MATRIX | LG CHEM, LTD. (KR) | 2010-04-08 | — | — | US | disclosed |
| WO-2008102990-A1 | PHOTO-SENSITIVE RESIN COMPOSITION FOR BLACK MATRIX, BLACK MATRIX PRODUCED BY THE COMPOSITION AND LIQUID CRYSTAL DISPLAY INCLUDING THE BLACK MATRIX | LG CHEM, LTD. (KR) | 2008-08-28 | — | — | WO | disclosed |
| EP-1270645-B1 | Resin for optical material | MITSUBISHI GAS CHEMICAL CO (JP) | 2005-12-14 | — | — | EP | disclosed |
| US-6900157-B2 | Process for production of partially hydrophilized porous adsorbents | TOSOH CORPORATION (JP) | 2005-05-31 | — | — | US | disclosed |
| EP-0874016-B1 | Novel resin for optical material | MITSUBISHI GAS CHEMICAL CO (JP) | 2003-08-20 | — | — | EP | disclosed |
| US-20030050403-A1 | Process for production of partially hydrophilized porous adsorbents | TOSOH CORPORATION | 2003-03-13 | — | — | US | disclosed |
| EP-1291080-A2 | Process for production of partially hydrophilized porous adsorbents | Tosoh Corporation (JP) | 2003-03-12 | — | — | EP | disclosed |
| EP-1270645-A1 | Resin for optical material | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2003-01-02 | — | — | EP | disclosed |
| US-6117923-A | OXIDATION RESISTANCE. POLYMERIZING A NOVEL SULFUR-CONTAINING COMPOUND HAVING AN EPISULFIDE STRUCTURE | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2000-09-12 | — | — | US | disclosed |
| EP-0874016-A2 | Novel resin for optical material | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1998-10-28 | — | — | EP | disclosed |