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Ammonia Solution, Strong

Ammonia Solution, Strong

SCHEMBL3279112

N.N.N.N.N.N.N.N.N.N.N.N.N.N.N.N.O=P(O)(O)C(N(CCN(C(P(=O)(O)O)P(=O)(O)O)C(P(=O)(O)O)P(=O)(O)O)C(P(=O)(O)O)P(=O)(O)O)P(=O)(O)O

nearest known ligand 0.48

Full drug profile on Sugi Atlas →

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
▸ FDPS P14324 4/20 0.48
▸ KDM4E B2RXH2 1/20 0.35
▸ MMP2 P08253 1/20 0.35
▸ THRB P10828 1/20 0.35
▸ MAPK1 P28482 1/20 0.35
▸ HSD17B10 Q99714 1/20 0.35
▸ ANPEP P15144 1/20 0.32
▸ ERAP2 Q6P179 1/20 0.32
▸ TYMS P04818 1/20 0.32
▸ LAP3 P28838 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL38156 0.97 FDPS (0.50) FDPSKDM4EMMP2THRBMAPK1
Water SCHEMBL7073557 0.94 FDPS (0.48) FDPSKDM4EMMP2THRBMAPK1
Ammonia Solution, Strong SCHEMBL3285845 0.90 FDPS (0.58) FDPSANPEPERAP2LAP3
SCHEMBL12231067 0.89 FDPS (0.44) FDPSKDM4EMMP2THRBMAPK1
SCHEMBL6740726 0.87 FDPS (0.60) FDPSKDM4EMMP2THRBMAPK1
Ethylenediamine SCHEMBL14694305 0.87 FDPS (0.43) FDPSANPEPERAP2LAP3
SCHEMBL62120 0.87 FDPS (0.60) FDPSKDM4EMMP2THRBMAPK1
SCHEMBL10945040 0.87 FDPS (0.60) FDPSKDM4EMMP2THRBMAPK1
Ethylenediamine SCHEMBL5193597 0.87 FDPS (0.43) FDPSANPEPERAP2LAP3
SCHEMBL449507 0.86 FDPS (0.46) FDPSKDM4EMMP2THRBMAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7700532-B2 Cleaning composition and method of cleaning therewith WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2010-04-20 — — US claimed
US-20060154838-A1 Cleaning composition and method of cleaning therewith WAKO PURE CHEMICAL INDUSTRIES (JP) 2006-07-13 — — US claimed
EP-1562225-A1 CLEANING COMPOSITION AND METHOD OF CLEANING THEREWITH Wako Pure Chemical Industries, Ltd. (JP) 2005-08-10 — — EP claimed
EP-1564797-B1 POLISHING COMPOSITION AND RINSING COMPOSITION FUJIMI INC (JP) 2016-07-27 — — EP disclosed
US-7481949-B2 Polishing composition and rinsing composition WAKO PURE CHEMICAL INDUSTRIES, LTD (JP) 2009-01-27 — — US disclosed
US-20060151854-A1 Polishing composition and rinsing composition FUJIMI INCORPORATED (JP) 2006-07-13 — — US disclosed
EP-1564797-A1 POLISHING COMPOSITION AND RINSING COMPOSITION FUJIMI INCORPORATED (JP) 2005-08-17 — — EP disclosed