SCHEMBL3279779

SCHEMBL3279779

C=C(C)C(=O)NCNC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL59411 0.89 TGFBR1 (0.41)
SCHEMBL11866190 0.82 TGFBR1 (0.38)
SCHEMBL112305 0.80 TGFBR1 (0.36)
SCHEMBL3286234 0.78 TGFBR1 (0.35)
SCHEMBL1071535 0.78 TDP1 (0.42)
Hydrochloric Acid SCHEMBL22341966 0.78 TGFBR1 (0.35)
SCHEMBL23395739 0.78
SCHEMBL316224 0.78 TGFBR1 (0.41)
Dimethylamine SCHEMBL141861 0.77 TGFBR1 (0.42)
SCHEMBL522738 0.77 RXFP1 (0.39)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7700540-B2 Hard surface cleaning composition THE CLOROX COMPANY (US) 2010-04-20 US claimed
US-20070099816-A1 Hard Surface Cleaning Composition THE CLOROX COMPANY 2007-05-03 US claimed
WO-2021122709-A1 TEXTILE COATED WITH MALODOR REDUCING POLYMERS BASF SE (DE) 2021-06-24 WO disclosed
US-7700540-B2 Hard surface cleaning composition THE CLOROX COMPANY (US) 2010-04-20 US disclosed
US-20070099816-A1 Hard Surface Cleaning Composition THE CLOROX COMPANY 2007-05-03 US disclosed
EP-0859284-A1 Water-developable photosensitive composition and production process thereof Nippon Paint Co., Ltd. (JP) 1998-08-19 EP disclosed
EP-0459632-A1 Composition and method for controlling cholesterol ROHM AND HAAS COMPANY (US) 1991-12-04 EP disclosed