Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.42 |
| ▸ | POLB | P06746 | 2/20 | 0.42 |
| ▸ | APEX1 | P27695 | 1/20 | 0.42 |
| ▸ | HTT | P42858 | 1/20 | 0.42 |
| ▸ | TSHR | P16473 | 5/20 | 0.42 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.39 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.39 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.39 |
| ▸ | PLA2G4B | P0C869 | 1/20 | 0.37 |
| ▸ | THRA | P10827 | 1/20 | 0.37 |
| ▸ | THRB | P10828 | 1/20 | 0.37 |
| ▸ | LMNA | P02545 | 2/20 | 0.37 |
| ▸ | ESR1 | P03372 | 1/20 | 0.37 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.37 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.37 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.37 |
| ▸ | NR1H2 | P55055 | 1/20 | 0.37 |
| ▸ | RNASEL | Q05823 | 1/20 | 0.37 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13289963 | 0.84 | HTT (0.58) | TDP1POLBAPEX1HTTTSHR | |
| SCHEMBL8432920 | 0.84 | THRB (0.43) | TDP1POLBAPEX1HTTTSHR | |
| SCHEMBL4274169 | 0.83 | THRB (0.38) | TDP1POLBAPEX1HTTTSHR | |
| SCHEMBL3279634 | 0.82 | THRB (0.48) | TDP1TSHRMAPK1L3MBTL1ALDH1A1 | |
| SCHEMBL10446076 | 0.79 | TSHR (0.61) | TDP1POLBAPEX1HTTTSHR | |
| SCHEMBL24667571 | 0.78 | L3MBTL1 (0.40) | TDP1POLBTSHRMAPK1L3MBTL1 | |
| SCHEMBL13289967 | 0.78 | THRB (0.49) | TDP1POLBAPEX1HTTTSHR | |
| SCHEMBL7785612 | 0.77 | RARB (0.51) | TDP1POLBAPEX1HTTTSHR | |
| SCHEMBL8988297 | 0.77 | POLB (0.42) | POLBTSHRALDH1A1PLA2G4BLMNA | |
| SCHEMBL10665718 | 0.77 | THRB (0.53) | POLBTSHRALDH1A1CYP3A4THRA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 56 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7700269-B2 | Method of forming stack layer and method of manufacturing electronic device having the same | SAMSUNG SDI CO., LTD. (KR) | 2010-04-20 | — | — | US | claimed |
| US-7374859-B2 | Protective layers compatible with thick film pastes | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2008-05-20 | — | — | US | claimed |
| US-7354781-B2 | Method of manufacturing field emission device | SAMSUNG SDI CO., LTD. (KR) | 2008-04-08 | — | — | US | claimed |
| CN-1942824-A | UV radiation blocking protective layer compatible with thick film paste | DU PONT (US) | 2007-04-04 | — | — | CN | claimed |
| US-20060275966-A1 | Method of manufacturing field emission device | SAMSUNG SDI CO., LTD. (KR) | 2006-12-07 | — | — | US | claimed |
| US-20060275987-A1 | Method of forming stack layer and method of manufacturing electronic device having the same | SAMSUNG SDI CO., LTD., A CORP. OF THE REPUBLIC OF KOREA (KR) | 2006-12-07 | — | — | US | claimed |
| EP-1714189-A2 | UV RADIATION BLOCKING PROTECTIVE LAYERS COMPATIBLE WITH THICK FILM PASTES | E.I. DUPONT DE NEMOURS AND COMPANY (US) | 2006-10-25 | — | — | EP | claimed |
| JP-2006518860-A | — | — | 2006-08-17 | — | — | JP | claimed |
| CN-1742233-A | Positive imageable thick film compositions | DU PONT (US) | 2006-03-01 | — | — | CN | claimed |
| US-20060025549-A1 | Process for using protective layers in the fabrication of electronic devices | E. I. DU PONT DE NEMOURS AND COMPANY | 2006-02-02 | — | — | US | claimed |
| WO-2004053593-A2 | POSITIVE IMAGEABLE THICK FILM COMPOSITIONS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2004-06-24 | — | — | WO | claimed |
| WO-2004047166-A2 | PROCESS FOR USING PROTECTIVE LAYERS IN THE FABRICATION OF ELECTRONIC DEVICES | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2004-06-03 | — | — | WO | claimed |
| EP-0524187-B1 | POSITIVE WORKING RESIST COMPOSITIONS AND THEIR UTILITY IN DRY FILM PHOTORESISTS | DU PONT (US) | 1996-07-10 | — | — | EP | claimed |
| US-5262281-A | Polymers with pendant acid labile a-alkoxyalkyl esters, high resolution, integrated circuits, aqueous development | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1993-11-16 | — | — | US | claimed |
| EP-0524250-A1 | RESIST MATERIAL FOR USE IN THICK FILM RESISTS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1993-01-27 | — | — | EP | claimed |
| EP-0524187-A1 | POSITIVE WORKING RESIST COMPOSITIONS AND THEIR UTILITY IN DRY FILM PHOTORESISTS. | DU PONT (US) | 1993-01-27 | — | — | EP | claimed |
| US-5145764-A | Acrylic ester polymer | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1992-09-08 | — | — | US | claimed |
| US-5077174-A | Aqueous development, stripping | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1991-12-31 | — | — | US | claimed |
| WO-1991015808-A1 | RESIST MATERIAL FOR USE IN THICK FILM RESISTS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1991-10-17 | — | — | WO | claimed |
| WO-1991015809-A1 | POSITIVE WORKING RESIST COMPOSITIONS AND THEIR UTILITY IN DRY FILM PHOTORESISTS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1991-10-17 | — | — | WO | claimed |