⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17558053 | 0.84 | — | — | |
| SCHEMBL7653 | 0.80 | — | — | |
| SCHEMBL5050744 | 0.78 | — | — | |
| SCHEMBL4741780 | 0.78 | — | — | |
| Ammonia Solution, Strong SCHEMBL27920701 | 0.76 | — | — | |
| SCHEMBL7976957 | 0.75 | — | — | |
| SCHEMBL1517850 | 0.73 | — | — | |
| SCHEMBL3288573 | 0.73 | ALDH1A1 (0.40) | — | |
| SCHEMBL11318225 | 0.72 | CES2 (0.36) | — | |
| SCHEMBL8531355 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7705115-B2 | Process for producing radiation-sensitive resin composition | JSR CORPORATION (JP) | 2010-04-27 | — | — | US | disclosed |
| US-20090081586-A1 | PROCESS FOR PRODUCING RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2009-03-26 | — | — | US | disclosed |
| EP-1881371-A1 | PROCESS FOR PRODUCING RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2008-01-23 | — | — | EP | disclosed |