SCHEMBL3282009

SCHEMBL3282009

C=C(C)C(=O)ON1CCOC(CC)C1

nearest known ligand 0.41

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.41
PDK1 Q15118 4/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9764676 0.84 PDK1 (0.41) PDK1
SCHEMBL27700100 0.76 PDK1 (0.37) PDK1
SCHEMBL27450034 0.75 PDK1 (0.32) PDK1
SCHEMBL27504095 0.74 PDK1 (0.43) ALDH1A1PDK1
SCHEMBL11668584 0.73 PDK1 (0.33) PDK1
SCHEMBL1371997 0.72 SMN1; SMN2 (0.42) ALDH1A1
Azelaic Acid SCHEMBL3951798 0.71 ALDH1A1 (0.37) ALDH1A1
SCHEMBL8425994 0.69 PDK1 (0.48) PDK1
SCHEMBL673250 0.69
SCHEMBL27917790 0.69 PDK1 (0.35) PDK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 146 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10754249-B2 Coating compositions for photolithography ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2020-08-25 US disclosed
US-20170285478-A1 COATING COMPOSITIONS FOR PHOTOLITHOGRAPHY ROHM AND HAAS ELECTRONIC MATERIALS LLC 2017-10-05 US disclosed
US-9690199-B2 Coating compositions for photolithography ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2017-06-27 US disclosed
US-20160223911-A1 COATING COMPOSITIONS FOR PHOTOLITHOGRAPHY ROHM & HAAS ELECT MAT (US) 2016-08-04 US disclosed
US-9323154-B2 Coating compositions for photolithography ROHM AND HAAS ELECTRONIC MATERIALS, LLC (US) 2016-04-26 US disclosed
EP-1209528-B1 Photoresist composition ETERNAL TECHNOLOGY CORP (US) 2015-07-22 EP disclosed
EP-1353228-B1 Method for forming a relief image using a very thick photoresist layer on a semiconductor wafer and metal plating method ROHM & HAAS ELECT MAT (US) 2015-01-28 EP disclosed
CN-101517021-B Photocatalyst-containing water-based curable coating compositions and process for production thereof DAINIPPON INK & CHEMICALS 2013-11-13 CN disclosed
CN-101153196-B Aqueous composition for one-time rust-proofing treatment of metal plate and one-time rust-proofing treated metal plate DAINIPPON INK & CHEMICALS 2012-05-23 CN disclosed
CN-102341467-A Coating composition, coating film, laminate, and method for producing laminate ASAHI KASEI E MATERIALS CORP 2012-02-01 CN disclosed
US-6271273-B1 Porous materials SHIPLEY COMPANY, L.L.C. 2001-08-07 US disclosed
EP-1088848-A1 Porous materials Shipley Company LLC (US) 2001-04-04 EP disclosed
EP-1085529-A2 Dielectric composition Shipley Company LLC (US) 2001-03-21 EP disclosed
EP-0989143-A1 Acrylic polymer compositions with crystalline side chains and processes for their preparation ROHM AND HAAS COMPANY (US) 2000-03-29 EP disclosed
CN-1232549-A Photosensitive composition and use thereof SANYO CHEMICAL IND LTD (JP) 1999-10-20 CN disclosed
EP-0940433-A1 Plasticizers and processing aids for elastomers ROHM AND HAAS COMPANY (US) 1999-09-08 EP disclosed
EP-0193272-B1 Preparation of a graft-copolymeric compatibilizer useful as an oil additive ROHM & HAAS (US) 1994-08-31 EP disclosed
US-4611031-A Process for the preparation of a compatibilizer for concentrated polymer blends and compatibilizer product ROHM AND HAAS COMPANY (US) 1986-09-09 US disclosed
EP-0193272-A2 Preparation of a graft-copolymeric compatibilizer useful as an oil additive ROHM AND HAAS COMPANY (US) 1986-09-03 EP disclosed
US-4417991-A NONTHICKENING, EXTREME PRESSURE LUBRICANTS ATLANTIC RICHFIELD COMPANY (US) 1983-11-29 US disclosed