SCHEMBL3284786

SCHEMBL3284786

O=C(c1ccc([N+](=O)[O-])cc1)C(S)(c1ccccc1)c1ccccc1

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CES1 P23141 2/20 0.57
CES2 O00748 1/20 0.57
TDP1 Q9NUW8 1/20 0.53
MAPK1 P28482 2/20 0.53
POLB P06746 2/20 0.53
CA1 P00915 2/20 0.49
CA2 P00918 2/20 0.49
SRD5A2 P31213 1/20 0.49
ALDH1A1 P00352 3/20 0.48
MEN1 O00255 3/20 0.48
KMT2A Q03164 3/20 0.48
CYP1B1 Q16678 1/20 0.48
CRHBP P24387 1/20 0.48
CRHR2 Q13324 1/20 0.48
HSP90AA1 P07900 1/20 0.48
MAPT P10636 1/20 0.48
OPRK1 P41145 1/20 0.48
NPSR1 Q6W5P4 1/20 0.48
TSHR P16473 1/20 0.47
LMNA P02545 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1127623 0.80 CES1 (0.57) CES1CES2TDP1MAPK1POLB
SCHEMBL28444892 0.80 CES1 (0.53) CES1CES2TDP1MAPK1POLB
Perchlorate SCHEMBL9003681 0.76 CES1 (0.49) CES1CES2TDP1MAPK1POLB
SCHEMBL4656668 0.75 CES1 (0.65) CES1CES2TDP1MAPK1POLB
SCHEMBL16146941 0.74 CES1 (0.57) CES1CES2TDP1MAPK1POLB
SCHEMBL20912919 0.74 TDP1 (0.62) CES1CES2TDP1MAPK1POLB
SCHEMBL28847269 0.74 POLB (0.83) CES1CES2TDP1MAPK1POLB
SCHEMBL229627 0.73 POLB (0.82) CES1CES2TDP1MAPK1POLB
SCHEMBL1370034 0.73 CES1 (1.00) CES1CES2TDP1MAPK1POLB
Benzophenone SCHEMBL28231509 0.73 POLB (0.82) CES1CES2TDP1MAPK1POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4738010-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION COATING FILM, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION FILM, CURED FILM, AND ELECTRONIC COMPONENT COMPRISING SAME Toray Industries, Inc. (JP) 2026-05-06 EP disclosed
EP-4668018-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION COATING, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION FILM, CURED FILM, AND SEMICONDUCTOR DEVICE USING THESE Toray Industries, Inc. (JP) 2025-12-24 EP disclosed
WO-2025063041-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION COATING FILM, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION FILM, CURED FILM, AND ELECTRONIC COMPONENT USING SAME 東レ株式会社 2025-03-27 WO disclosed
WO-2025004924-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION COATING FILM, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION FILM, CURED FILM, AND ELECTRONIC COMPONENT COMPRISING SAME 東レ株式会社 2025-01-02 WO disclosed
WO-2025004805-A1 RESIN COMPOSITION FOR LENS, CURED PRODUCT FOR LENS, AND LENS 三井化学株式会社 2025-01-02 WO disclosed
WO-2025004697-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION COATING, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION FILM, CURED FILM, AND SEMICONDUCTOR DEVICE USING THESE 東レ株式会社 2025-01-02 WO disclosed
US-20240176239-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION FILM, CURED PRODUCT, PREPARATION METHOD OF CURED PRODUCT, HOLLOW STRUCTURE, AND ELECTRONIC COMPONENT TORAY INDUSTRIES, INC. (JP) 2024-05-30 US disclosed
US-20240059831-A1 CURABLE COMPOSITION AND CURED PRODUCT OF THE SAME, AND WAFER-LEVEL LENS DAICEL CORPORATION (JP) 2024-02-22 US disclosed
EP-4317240-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION FILM, CURED PRODUCT, PREPARATION METHOD OF CURED PRODUCT, HOLLOW STRUCTURE, AND ELECTRONIC COMPONENT Toray Industries, Inc. (JP) 2024-02-07 EP disclosed
CN-111406233-B Photosensitive resin composition, dry film resist and cured product thereof 日本化药株式会社 2023-12-26 CN disclosed
US-20200139433-A1 METHOD FOR PRODUCING SURFACE-MODIFIED METAL OXIDE FINE PARTICLE, METHOD FOR PRODUCING IMPROVED METAL OXIDE FINE PARTICLES, SURFACE-MODIFIED METAL OXIDE FINE PARTICLES, AND METAL OXIDE FINE PARTICLE DISPERSION LIQUID TOKYO OHKA KOGYO CO., LTD. (JP) 2020-05-07 US disclosed
CN-111095038-A Plastic lens 株式会社大赛璐 2020-05-01 CN disclosed
CN-110621723-A Polyorganosilsesquioxane, transfer film, in-mold molded article, and hard coat film 株式会社大赛璐 2019-12-27 CN disclosed
CN-110621494-A Hard coat film with suppressed curling and process for producing the same 株式会社大赛璐 2019-12-27 CN disclosed
CN-110546001-A Laminated body DAICEL CORP 2019-12-06 CN disclosed
CN-110494466-A Solidification compound, solidfied material and hard coat film DAICEL CORP 2019-11-22 CN disclosed
US-20190031818-A1 CURABLE COMPOSITION, CURED FILM, DISPLAY PANEL OR OLED LIGHT, AND METHOD FOR PRODUCING CURED PRODUCT TOKYO OHKA KOGYO CO., LTD. (JP) 2019-01-31 US disclosed
US-7709598-B2 Fluorinated alkyl fluorophoshoric acid salts of onium and transition metal complex SAN-APRO LIMITED (JP) 2010-05-04 US disclosed
US-20070225458-A1 Novel Fluorinated Alkyl Fluorophosphoric Acid Salts of Onium and Ttransition Metal Complex SAN-APRO LIMITED (JP) 2007-09-27 US disclosed
EP-1752463-A1 NOVEL FLUORINATED ALKYLFLUOROPHOSPHORIC ACID SALT OF ONIUM AND TRANSITION METAL COMPLEX San-Apro Limited (JP) 2007-02-14 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20070225458-A1 Novel Fluorinated Alkyl Fluorophosphoric Acid Salts of Onium and Ttransition Metal Complex AS3MT, TTR, PFAS CES1 4197/4885CES2 4463/4885TDP1 577/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.