Propionic Acid

Propionic Acid

SCHEMBL3286165

CCC(=O)O.CCCOCC(C)O

nearest known ligand 0.75

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD17B10 Q99714 1/20 0.75
TDP1 Q9NUW8 1/20 0.57
FFAR3 O14843 2/20 0.42
MAPT P10636 3/20 0.39
USP2 O75604 2/20 0.37
HTT P42858 1/20 0.36
CYP1A2 P05177 1/20 0.36
CYP3A4 P08684 1/20 0.36
CYP2C19 P33261 1/20 0.36
LPAR5 Q9H1C0 1/20 0.35
KDM4E B2RXH2 1/20 0.35
ALDH1A1 P00352 1/20 0.35
ALOX15 P16050 1/20 0.35
PLA2G2C Q5R387 1/20 0.34
SPHK1 Q9NYA1 1/20 0.33
ALPL P05186 1/20 0.33
ALPI P09923 1/20 0.33
GAA P10253 1/20 0.33
ALPG P10696 1/20 0.33
MAPK1 P28482 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Acetic Acid SCHEMBL3099063 0.89 HSD17B10 (0.78) HSD17B10TDP1MAPTUSP2HTT
Propionic Acid SCHEMBL3284799 0.88 HSD17B10 (0.57) HSD17B10TDP1FFAR3MAPTUSP2
SCHEMBL9637969 0.87
SCHEMBL21356623 0.87 HSD17B10 (1.00) HSD17B10TDP1MAPTUSP2HTT
SCHEMBL34792 0.87
SCHEMBL17164541 0.87
Acetic Acid SCHEMBL28658463 0.86 HSD17B10 (0.72) HSD17B10TDP1MAPTUSP2HTT
Isopropyl Alcohol SCHEMBL1060955 0.84 HSD17B10 (0.95) HSD17B10TDP1MAPTUSP2HTT
SCHEMBL30725962 0.84
Propane SCHEMBL28092303 0.84 HSD17B10 (0.95) HSD17B10TDP1MAPTUSP2HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-105093846-B The forming method of photocuring pattern 东友精细化工有限公司 2017-06-23 CN disclosed
CN-101236356-B Photoresist composition, thin film patterning method using the same, and method of fabricating liquid crystal display using the same SAMSUNG ELECTRONICS CO LTD 2012-11-21 CN disclosed
US-7713677-B2 Photoresist composition, method of patterning thin film using the same, and method of manufacturing liquid crystal display panel using the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2010-05-11 US disclosed
CN-101236356-A Photoresist composition, thin film patterning method using the same, and method of fabricating liquid crystal display using the same SAMSUNG ELECTRONICS CO LTD (KR) 2008-08-06 CN disclosed
US-20070190454-A1 PHOTORESIST COMPOSITION, METHOD OF PATTERNING THIN FILM USING THE SAME, AND METHOD OF MANUFACTURING LIQUID CRYSTAL DISPLAY PANEL USING THE SAME SAMSUNG ELECTRONICS CO., LTD. (KR) 2007-08-16 US disclosed