Methacrylic Acid

Methacrylic Acid

SCHEMBL3288561

C=C(C)C(=O)O.CCC1CCCCCCC1

nearest known ligand 0.36

Full drug profile on Sugi Atlas →

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 1/20 0.35
LMNA P02545 1/20 0.35
CYP2D6 P10635 1/20 0.35
EPHX1 P07099 3/20 0.34
HPGD P15428 1/20 0.34
KMT2A Q03164 1/20 0.34
ALOX5 P09917 1/20 0.34
HSD11B1 P28845 1/20 0.34
KDM4E B2RXH2 2/20 0.34
POLB P06746 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methacrylic Acid SCHEMBL6279551 1.00 CYP1A2 (0.35) CYP1A2LMNACYP2D6EPHX1HPGD
Methacrylic Acid SCHEMBL3291139 1.00 CYP1A2 (0.35) CYP1A2LMNACYP2D6EPHX1HPGD
Methacrylic Acid SCHEMBL27647227 1.00 CYP1A2 (0.35) CYP1A2LMNACYP2D6EPHX1HPGD
Methacrylic Acid SCHEMBL3292921 1.00 CYP1A2 (0.35) CYP1A2LMNACYP2D6EPHX1HPGD
Methacrylic Acid SCHEMBL3288532 1.00 CYP1A2 (0.35) CYP1A2LMNACYP2D6EPHX1HPGD
Methacrylic Acid SCHEMBL27733294 0.98 CYP1A2 (0.34) CYP1A2LMNACYP2D6EPHX1HPGD
Methacrylic Acid SCHEMBL2502608 0.98 ALOX5 (0.32) CYP1A2LMNACYP2D6EPHX1HPGD
Methacrylic Acid SCHEMBL1631617 0.94 TDP1 (0.35) ALOX5POLB
Methacrylic Acid SCHEMBL9236260 0.94 TDP1 (0.35) ALOX5POLB
Methacrylic Acid SCHEMBL3286640 0.89 CYP19A1 (0.33) LMNAHPGDKMT2APOLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3186226-B1 OXIME SULFONATE DERIVATIVES BASF SE (DE) 2020-06-17 EP disclosed
US-20190171099-A1 POLYMERIZABLE COMPOSITION COMPRISING AN OXIME SULFONATE AS THERMAL CURING AGENT BASF SE (DE) 2019-06-06 US disclosed
US-10241399-B2 Polymerizable composition comprising an oxime sulfonate as thermal curing agent BASF SE (DE) 2019-03-26 US disclosed
US-10234761-B2 Oxime ester photoinitiators BASF SE (DE) 2019-03-19 US disclosed
EP-2668156-B1 POLYMERIZABLE COMPOSITION COMPRISING AN OXIME SULFONATE AS THERMAL CURING AGENT BASF SE (DE) 2018-10-31 EP disclosed
US-20170260132-A1 OXIME SULFONATE DERIVATIVES BASF SE (DE) 2017-09-14 US disclosed
EP-3186226-A1 OXIME SULFONATE DERIVATIVES BASF SE (DE) 2017-07-05 EP disclosed
US-20160377977-A1 OXIME ESTER PHOTOINITIATORS BASF SE (DE) 2016-12-29 US disclosed
EP-3019473-A1 OXIME ESTER PHOTOINITIATORS BASF SE (DE) 2016-05-18 EP disclosed
US-9310683-B2 Monomer, polymer, positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-04-12 US disclosed
EP-2668156-A1 POLYMERIZABLE COMPOSITION COMPRISING AN OXIME SULFONATE AS THERMAL CURING AGENT BASF SE (DE) 2013-12-04 EP disclosed
US-20130308219-A1 POLYMERIZABLE COMPOSITION COMPRISING AN OXIME SULFONATE AS THERMAL CURING AGENT BASF SE (DE) 2013-11-21 US disclosed
US-8574817-B2 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-11-05 US disclosed
US-20130288180-A1 MONOMER, POLYMER, POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-10-31 US disclosed
US-20130084529-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-04-04 US disclosed
US-20130084527-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-04-04 US disclosed
US-20130084528-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-04-04 US disclosed
US-20130029269-A1 POSITIVE RESIST COMPOSITION AND PATTTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-01-31 US disclosed
WO-2012101245-A1 POLYMERIZABLE COMPOSITION COMPRISING AN OXIME SULFONATE AS THERMAL CURING AGENT BASF SE (DE) 2012-08-02 WO disclosed
US-7713680-B2 Radiation sensitive resin composition for forming a protective film, method of forming a protective film from the composition, liquid crystal display device and solid-state image sensing device JSR CORPORATION (JP) 2010-05-11 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-10234761-B2 Oxime ester photoinitiators C9, C5, CBR3 CYP1A2 91/4885LMNA 1297/4885CYP2D6 40/4885
US-20160377977-A1 OXIME ESTER PHOTOINITIATORS C5, C9, CBR3 CYP1A2 92/4885LMNA 1302/4885CYP2D6 39/4885
US-10241399-B2 Polymerizable composition comprising an oxime sulfonate as thermal curing agent SULT1E1, COX6B1, SULT1A1 CYP1A2 158/4885LMNA 2160/4885CYP2D6 124/4885
US-20170260132-A1 OXIME SULFONATE DERIVATIVES CBR3, CBR1, C1R CYP1A2 101/4885LMNA 2958/4885CYP2D6 29/4885
US-20190171099-A1 POLYMERIZABLE COMPOSITION COMPRISING AN OXIME SULFONATE AS THERMAL CURING AGENT SULT1E1, COX6B1, SULT1A1 CYP1A2 158/4885LMNA 2160/4885CYP2D6 124/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.