Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 4/20 | 0.62 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.62 |
| ▸ | LMNA | P02545 | 1/20 | 0.61 |
| ▸ | NPC1 | O15118 | 1/20 | 0.57 |
| ▸ | RAB9A | P51151 | 1/20 | 0.57 |
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.57 |
| ▸ | HPGD | P15428 | 3/20 | 0.56 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.56 |
| ▸ | CES1 | P23141 | 3/20 | 0.54 |
| ▸ | CES2 | O00748 | 2/20 | 0.54 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.53 |
| ▸ | MEN1 | O00255 | 2/20 | 0.53 |
| ▸ | TSHR | P16473 | 2/20 | 0.52 |
| ▸ | POLB | P06746 | 2/20 | 0.50 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.50 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.50 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.50 |
| ▸ | CA12 | O43570 | 2/20 | 0.50 |
| ▸ | CA9 | Q16790 | 2/20 | 0.50 |
| ▸ | DAO | P14920 | 1/20 | 0.50 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Acetophenone SCHEMBL28598165 | 1.00 | MAPT (0.62) | MAPTSMN1; SMN2LMNANPC1RAB9A | |
| Acetophenone SCHEMBL25382045 | 0.97 | SMN1; SMN2 (0.60) | MAPTSMN1; SMN2LMNANPC1RAB9A | |
| Acetophenone SCHEMBL27462873 | 0.92 | MAPT (0.71) | MAPTSMN1; SMN2LMNANPC1RAB9A | |
| Acetophenone SCHEMBL16745259 | 0.92 | — | — | |
| Acetophenone SCHEMBL719033 | 0.92 | MAPT (0.71) | MAPTSMN1; SMN2LMNANPC1RAB9A | |
| Acetophenone SCHEMBL30537005 | 0.92 | — | — | |
| Acetophenone SCHEMBL737 | 0.92 | — | — | |
| Acetophenone SCHEMBL30537000 | 0.92 | — | — | |
| Acetophenone SCHEMBL1450855 | 0.92 | — | — | |
| Acetophenone SCHEMBL11354178 | 0.89 | MAPT (0.68) | MAPTSMN1; SMN2LMNANPC1RAB9A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1178 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116120533-A | Synthesis and application of photosensitive resin | 盐城艾肯科技有限公司 | 2023-05-16 | — | — | CN | claimed |
| CN-116003702-A | 3D printing resin and application | 深圳市纵维立方科技有限公司 | 2023-04-25 | — | — | CN | claimed |
| CN-113088281-B | Fluorescent probe for detecting beta-amyloid protein and preparation method and application thereof | 山东师范大学 | 2022-07-29 | — | — | CN | claimed |
| CN-113088281-A | Fluorescent probe for detecting beta-amyloid protein and preparation method and application thereof | 山东师范大学 | 2021-07-09 | — | — | CN | claimed |
| CN-106318019-B | Low dielectric solder resist ink composition for printed circuit board | 南亚塑胶工业股份有限公司 | 2020-03-17 | — | — | CN | claimed |
| CN-103889995-B | Novel nitrogen ligand-containing metal ruthenium complex and preparation method and application thereof | 中山奕安泰医药科技有限公司 | 2016-06-08 | — | — | CN | claimed |
| CN-100569815-C | Resin compound containing benzoquinone-cyclopentadiene adduct and photoresist composition containing the same | DAXIN MATERIALS CORP (CN) | 2009-12-16 | — | — | CN | claimed |
| WO-2009054621-A2 | THE COMPOSITION OF DECOLORABLE INK AND DECOLORING METHOD | HAN JONG-SOO (KR) | 2009-04-30 | — | — | WO | claimed |
| CN-1916044-A | Resin compound containing benzoquinone-cyclopentadiene adduct and photoresist composition containing the same | CHANGXING CHEMICAL IND CO LTD (CN) | 2007-02-21 | — | — | CN | claimed |
| EP-1070709-B1 | Novel pyrylium compound, process for making the same, nucleic acid stain, and labeled nucleic acid | CANON KK (JP) | 2004-12-01 | — | — | EP | claimed |
| US-6384237-B1 | CONDENSATION CYCLIZATION OF 4-N,N-DIMETHYLAMINOACETOPHENONE AND ACYCLIC ANHYDRIDE OR THIOANHYDRIDE; FLUORESCENCE | CANON KABUSHIKI KAISHA (JP) | 2002-05-07 | — | — | US | claimed |
| EP-1070709-A1 | Novel pyrylium compound, process for making the same, nucleic acid stain, and labeled nucleic acid | CANON KABUSHIKI KAISHA (JP) | 2001-01-24 | — | — | EP | claimed |
| US-20260146026-A1 | COMPOUND, COMPOSITION, CURED PRODUCT, METHOD FOR PRODUCING CURED PRODUCT, AND METHOD FOR PRODUCING ELECTRONIC COMPONENT | ADEKA CORPORATION (JP) | 2026-05-28 | — | — | US | disclosed |
| US-12610853-B2 | Curable composition for inkjet and air cavity formation, electronic component, and method for manufacturing electronic component | SEKISUI CHEMICAL CO., LTD. (JP) | 2026-04-21 | — | — | US | disclosed |
| US-12606662-B2 | Photosensitive resin composition, photosensitive resin film, multilayered printed wiring board, semiconductor package, and method for producing multilayered printed wiring board | RESONAC CORPORATION (JP) | 2026-04-21 | — | — | US | disclosed |
| EP-3419051-B1 | CURABLE RESIN COMPOSITION AND FAN OUT TYPE WAFER LEVEL PACKAGE | TAIYO HOLDINGS CO LTD (JP) | 2026-04-08 | — | — | EP | disclosed |
| US-4943516-A | Photosensitive thermosetting resin composition and method of forming solder resist pattern by use thereof | TAIYO INK MANUFACTURING CO., LTD. (JP) | 1990-07-24 | — | — | US | disclosed |
| EP-0339518-A2 | Quinoline compounds and their use | BASF Aktiengesellschaft (DE) | 1989-11-02 | — | — | EP | disclosed |
| EP-0323563-A2 | Photosensitive thermosetting resin composition and method of forming solder resist pattern by use thereof | TAIYO INK MANUFACTURING CO. LTD. (JP) | 1989-07-12 | — | — | EP | disclosed |
| US-4187307-A | 4-AMINOPTERIDINES | ABBOTT LABORATORIES (US) | 1980-02-05 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12610853-B2 | Curable composition for inkjet and air cavity formation, electronic component, and method for manufacturing electronic component | MMAB, VCL, ACR | MAPT 1275/4885SMN1; SMN2 2390/4885LMNA 1433/4885 |
| US-20260146026-A1 | COMPOUND, COMPOSITION, CURED PRODUCT, METHOD FOR PRODUCING CURED PRODUCT, AND METHOD FOR PRODUCING ELECTRONIC COMPONENT | CBR3, CBR1, NOTUM | MAPT 4526/4885SMN1; SMN2 2208/4885LMNA 1641/4885 |
| US-12606662-B2 | Photosensitive resin composition, photosensitive resin film, multilayered printed wiring board, semiconductor package, and method for producing multilayered printed wiring board | MMAB, ELOB, RARB | MAPT 2173/4885SMN1; SMN2 2699/4885LMNA 1387/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.