Butyrolactone

Butyrolactone

SCHEMBL3294240

CCOC(=O)C(C)O.O=C1CCCO1

nearest known ligand 0.42

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA1 P00915 1/20 0.42
CA9 Q16790 1/20 0.42
CYP2D6 P10635 1/20 0.35
CYP2C19 P33261 3/20 0.34
CYP3A4 P08684 2/20 0.34
ALDH1A1 P00352 5/20 0.33
HPGD P15428 3/20 0.33
TSHR P16473 3/20 0.33
MAPT P10636 2/20 0.33
NPSR1 Q6W5P4 2/20 0.33
LMNA P02545 2/20 0.33
KMT2A Q03164 2/20 0.33
KDM4E B2RXH2 1/20 0.33
ALOX15 P16050 1/20 0.33
MAPK1 P28482 1/20 0.33
HSD17B10 Q99714 1/20 0.33
RAB9A P51151 1/20 0.33
GAA P10253 1/20 0.33
ATM Q13315 1/20 0.33
TP53 P04637 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Butyrolactone SCHEMBL9134210 1.00 CA1 (0.42) CA1CA9CYP2D6CYP2C19CYP3A4
Ethyl Acetate SCHEMBL7201203 0.94 ALDH1A1 (0.40) CA1CA9CYP2D6CYP2C19CYP3A4
Ethyl Pyruvate SCHEMBL8667552 0.86 CA1 (0.35) CA1CA9CYP2D6
Butyrolactone SCHEMBL17237549 0.83 CA1 (0.45) CA1CA9CYP2D6ALDH1A1HPGD
Butyrolactone SCHEMBL2696582 0.83 CA1 (0.48) CA1CA9ALDH1A1HPGDTSHR
Butyrolactone SCHEMBL2036135 0.82 CA1 (0.44) CA1CA9CYP2D6CYP2C19CYP3A4
Ethyl Acetate SCHEMBL2248792 0.81 ALDH1A1 (0.50) CA1CA9CYP2D6CYP2C19CYP3A4
Ethyl Propionate SCHEMBL981617 0.81 CA1 (0.37) CA1CA9CYP2D6CYP2C19ALDH1A1
Urethane SCHEMBL22471765 0.80 ALOX15 (0.52) CA1CA9CYP2D6ALDH1A1HPGD
Ethyl Propionate SCHEMBL2256850 0.80 CA1 (0.45) CA1CA9CYP2D6CYP2C19ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-5150450-A None JP disclosed
US-10025181-B2 Polymer composition and photoresist comprising same DOW GLOBAL TECHNOLOGIES LLC (US) 2018-07-17 US disclosed
EP-2540750-A1 Polymer composition and photoresist comprising same Dow Global Technologies LLC (US) 2013-01-02 EP disclosed
US-20120328983-A1 POLYMER COMPOSITION AND PHOTORESIST COMPRISING SAME DOW GLOBAL TECHNOLOGIES LLC (US) 2012-12-27 US disclosed
US-7732334-B2 Method for manufacturing semiconductor device SEMICONDUCTOR ENERGY LABORATORY CO., LTD. (JP) 2010-06-08 US disclosed
US-20060040435-A1 Method for manufacturing semiconductor device SEMICONDUCTOR ENERGY LABORATORY CO., LTD. (JP) 2006-02-23 US disclosed
US-5413729-A Removal of paints MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1995-05-09 US disclosed
JP-H05150450-A POSITIVE RESIST COMPOSITION SUMITOMO CHEM CO LTD 1993-06-18 JP disclosed