SCHEMBL3297488

SCHEMBL3297488

COc1ccccc1O[SiH2]c1ccccc1

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA1 P00915 4/20 0.56
CA2 P00918 4/20 0.56
CA7 P43166 3/20 0.56
CA9 Q16790 3/20 0.56
CA12 O43570 2/20 0.56
CA14 Q9ULX7 2/20 0.56
CA4 P22748 2/20 0.56
ALDH1A1 P00352 2/20 0.45
HTT P42858 2/20 0.45
MAPK1 P28482 1/20 0.45
L3MBTL1 Q9Y468 1/20 0.45
TP53 P04637 1/20 0.41
TSHR P16473 1/20 0.41
ADRA2B P18089 1/20 0.41
PTGS1 P23219 1/20 0.41
TDP1 Q9NUW8 1/20 0.41
POLB P06746 1/20 0.41
SMN1; SMN2 Q16637 1/20 0.41
KMT2A Q03164 1/20 0.40
LMNA P02545 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
1,2-Dimethoxybenzene SCHEMBL27452731 0.78 CA1 (0.93) CA1CA2CA7CA9CA12
1,2-Dimethoxybenzene SCHEMBL29351917 0.75 CA1 (1.00) CA1CA2CA7CA9CA12
1,2-Dimethoxybenzene SCHEMBL5308636 0.75 CA1 (1.00) CA1CA2CA7CA9CA12
1,2-Dimethoxybenzene SCHEMBL105872 0.75 CA1 (1.00) CA1CA2CA7CA9CA12
SCHEMBL3300499 0.75 CA1 (0.65) CA1CA2CA7CA9CA12
SCHEMBL3297486 0.74 CA4 (0.54) CA1CA2CA7CA9CA12
SCHEMBL28052383 0.74 CXCL8 (0.37) ALDH1A1L3MBTL1TDP1KMT2ANFE2L2
1,2-Dimethoxybenzene SCHEMBL29229370 0.72 CA1 (0.93) CA1CA2CA7CA9CA12
1,2-Dimethoxybenzene SCHEMBL9793057 0.72 CA1 (0.93) CA1CA2CA7CA9CA12
1,2-Dimethoxybenzene SCHEMBL28602492 0.72 CA1 (0.93) CA1CA2CA7CA9CA12

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-104073157-A Diffusant composition, method for forming impurity diffusion layer, and solar cell TOKYO OHKA KOGYO CO LTD 2014-10-01 CN disclosed
CN-103579412-A Method of diffusing impurity-diffusing component and method of manufacturing solar cell TOKYO OHKA KOGYO CO LTD 2014-02-12 CN disclosed
US-7736837-B2 Antireflective coating composition based on silicon polymer AZ ELECTRONIC MATERIALS USA CORP. (US) 2010-06-15 US disclosed
US-20100093969-A1 Process for making siloxane polymers ZHANG RUZHI 2010-04-15 US disclosed
EP-2132253-A1 PROCESS FOR MAKING SILOXANE POLYMERS AZ Electronic Materials USA Corp. (US) 2009-12-16 EP disclosed
EP-2129733-A2 ANTIREFLECTIVE COATING COMPOSITION BASED ON A SILICON POLYMER AZ Electronic Materials USA Corp. (US) 2009-12-09 EP disclosed
EP-2035518-A2 ANTIREFLECTIVE COATING COMPOSITIONS COMPRISING SILOXANE POLYMER AZ Electronic Materials USA Corp. (US) 2009-03-18 EP disclosed
WO-2008104874-A1 PROCESS FOR MAKING SILOXANE POLYMERS AZ ELECTRONIC MATERIALS USA CORP. (DE) 2008-09-04 WO disclosed
WO-2008102259-A2 ANTIREFLECTIVE COATING COMPOSITION BASED ON A SILICON POLYMER AZ ELECTRONIC MATERIALS USA CORP. (DE) 2008-08-28 WO disclosed
US-20080199789-A1 Antireflective Coating Composition Based on Silicon Polymer MERCK PATENT GMBH (DE) 2008-08-21 US disclosed
US-20070298349-A1 Antireflective Coating Compositions Comprising Siloxane Polymer AZ ELECTRONIC MATERIALS USA CORP. 2007-12-27 US disclosed
WO-2007148223-A2 ANTIREFLECTIVE COATING COMPOSITIONS COMPRISING SILOXANE POLYMER AZ ELECTRONIC MATERIALS USA CORP. (DE) 2007-12-27 WO disclosed