⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3300263 | 1.00 | — | — | |
| SCHEMBL10744826 | 0.86 | F2 (0.56) | — | |
| SCHEMBL10744820 | 0.86 | F2 (0.56) | — | |
| SCHEMBL27473563 | 0.84 | F2 (0.54) | — | |
| SCHEMBL30298025 | 0.84 | ALDH1A1 (0.52) | — | |
| SCHEMBL11186784 | 0.83 | HCAR2 (0.48) | — | |
| SCHEMBL7756518 | 0.80 | — | — | |
| SCHEMBL9508072 | 0.79 | HCAR2 (0.44) | — | |
| SCHEMBL9508075 | 0.79 | HCAR2 (0.44) | — | |
| SCHEMBL29595632 | 0.79 | HCAR2 (0.41) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117142916-B | Preparation method of allyl sulfone compound | 安徽金桐精细化学有限公司 | 2024-10-11 | — | — | CN | claimed |
| CN-109195935-B | Selective reduction of aldehydes and ketones | 帝斯曼知识产权资产管理有限公司 | 2022-04-29 | — | — | CN | disclosed |
| US-10975009-B2 | Selective reduction of aldehydes and ketones | DSM IP ASSETS B.V. (NL) | 2021-04-13 | — | — | US | disclosed |
| US-10975009-B2 | Selective reduction of aldehydes and ketones | DSM IP ASSETS B.V. (NL) | 2021-04-13 | — | — | US | disclosed |
| EP-3455198-B1 | SELECTIVE REDUCTION OF ALDEHYDES AND KETONES | DSM IP ASSETS BV (NL) | 2020-10-21 | — | — | EP | disclosed |
| EP-3455198-B1 | SELECTIVE REDUCTION OF ALDEHYDES AND KETONES | DSM IP ASSETS BV (NL) | 2020-10-21 | — | — | EP | disclosed |
| US-20190300462-A1 | SELECTIVE REDUCTION OF ALDEHYDES AND KETONES | DSM IP ASSETS B.V. (NL) | 2019-10-03 | — | — | US | disclosed |
| US-20190300462-A1 | SELECTIVE REDUCTION OF ALDEHYDES AND KETONES | DSM IP ASSETS B.V. (NL) | 2019-10-03 | — | — | US | disclosed |
| EP-3455198-A1 | SELECTIVE REDUCTION OF ALDEHYDES AND KETONES | DSM IP Assets B.V. (NL) | 2019-03-20 | — | — | EP | disclosed |
| WO-2017194662-A1 | SELECTIVE REDUCTION OF ALDEHYDES AND KETONES | DSM IP ASSETS B.V. (NL) | 2017-11-16 | — | — | WO | disclosed |
| EP-1091253-B1 | Plate making process for planographic plate, automatic developing apparatus and recording medium | FUJI PHOTO FILM CO LTD (JP) | 2005-03-30 | — | — | EP | disclosed |
| WO-2004024684-A2 | ENANTIOSELECTIVE AMINATION AND ETHERIFICATION | YALE UNIVERSITY (US) | 2004-03-25 | — | — | WO | disclosed |
| US-6558873-B1 | Interlayer containing a compound capable of forming a complex with aluminum and a photopolymerizable photosensitive layer containing a photopolymerization initiator, an addition polymerizable compound capable of complexing with aluminum | FUJI PHOTO FILM CO., LTD. (JP) | 2003-05-06 | — | — | US | disclosed |
| EP-1091253-A2 | Plate making process for planographic plate, automatic developing apparatus and recording medium | FUJI PHOTO FILM CO., LTD. (JP) | 2001-04-11 | — | — | EP | disclosed |
| EP-1091251-A2 | Lithographic printing plate precursor | FUJI PHOTO FILM CO., LTD. (JP) | 2001-04-11 | — | — | EP | disclosed |
| EP-0347766-B1 | 4,5,7,8-Tetrahydro-6H-thiazolo[5,4-d]azepines, their preparation and their use as medicaments | THOMAE GMBH DR K (DE) | 1994-05-25 | — | — | EP | disclosed |
| US-5068325-A | Dopaminergic systems as hypotensives, sedatives, antitussives and/or antiphlogistics | KARL THOMAE GMBH (DE) | 1991-11-26 | — | — | US | disclosed |
| US-4687727-A | Light-sensitive planographic printing plate with layer of diazo resin containing photopolymerizable composition | FUJI PHOTO FILM CO., LTD. (JP) | 1987-08-18 | — | — | US | disclosed |
| US-4511645-A | ALLYL METHACRYLATE-METHACRYLIC ACID COPOLYMER, CURING AGENT, PHOTOINITIATOR | FUJI PHOTO FILM CO., LTD. (JP) | 1985-04-16 | — | — | US | disclosed |
| EP-0104863-A2 | Light-sensitive planographic printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 1984-04-04 | — | — | EP | disclosed |