SCHEMBL330062

SCHEMBL330062

C=C(C)C(=O)N1C(=O)c2ccccc2C1=O

nearest known ligand 0.53

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.53
CES1 P23141 2/20 0.47
ASAH1 Q13510 1/20 0.42
CA9 Q16790 3/20 0.42
CA12 O43570 2/20 0.42
SCN2A Q99250 2/20 0.42
CASP3 P42574 1/20 0.41
LMNA P02545 1/20 0.41
KDM4E B2RXH2 1/20 0.40
MEN1 O00255 1/20 0.40
HPGD P15428 1/20 0.40
KMT2A Q03164 1/20 0.40
HSD17B10 Q99714 1/20 0.40
NR1H2 P55055 1/20 0.40
NR1H3 Q13133 1/20 0.40
CA1 P00915 1/20 0.39
CA2 P00918 1/20 0.39
NOTUM Q6P988 1/20 0.39
TRPA1 O75762 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8732506 0.83 ALDH1A1 (0.57) ALDH1A1CES1ASAH1CA9CA12
SCHEMBL25707024 0.82 CES1 (0.70) ALDH1A1CES1MEN1KMT2ANOTUM
SCHEMBL21855119 0.82 CA12 (0.52) ALDH1A1CES1ASAH1CA9CA12
SCHEMBL887161 0.80 CES1 (0.62) ALDH1A1CES1ASAH1CA9CA12
SCHEMBL28380606 0.79 ALDH1A1 (0.49) ALDH1A1CES1ASAH1CA9CA12
SCHEMBL28384508 0.78 BCHE (0.47) ALDH1A1CES1LMNAKDM4EMEN1
SCHEMBL13133189 0.78 ALDH1A1 (0.49) ALDH1A1CA9CA12KDM4EMEN1
SCHEMBL6553580 0.78 ALDH1A1 (0.50) ALDH1A1CES1ASAH1CA9CA12
SCHEMBL1137053 0.76 KDM4E (0.39) ALDH1A1LMNAKDM4EMEN1HPGD
SCHEMBL23732653 0.76 CA12 (0.52) ALDH1A1CES1ASAH1CA9CA12

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 87 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2404940-B1 Method for producing polymer composition and polymer composition INCTEC INC (JP) 2014-12-24 EP claimed
US-7960470-B2 Method for producing polymer composition and polymer composition THE INCTEC INC. (JP) 2011-06-14 US claimed
US-20240239940-A1 RADICALLY POLYMERIZABLE RESIN COMPOSITION RESONAC CORPORATION (JP) 2024-07-18 US disclosed
WO-2024122542-A1 PHOTOSENSITIVE RESIN COMPOSITION, RESIN FILM HAVING PATTERN, PRODUCTION METHOD FOR SAME, AND SEMICONDUCTOR CIRCUIT BOARD JSR株式会社 2024-06-13 WO disclosed
WO-2024090151-A1 RADICALLY POLYMERIZABLE RESIN COMPOSITION AND PIPE REHABILITATION LINER MATERIAL 株式会社レゾナック 2024-05-02 WO disclosed
WO-2024090516-A1 RADICAL POLYMERIZABLE RESIN CURING AGENT COMPOSITION AND RADICAL POLYMERIZABLE RESIN COMPOSITION 株式会社レゾナック 2024-05-02 WO disclosed
EP-4357381-A1 RADICALLY POLYMERIZABLE RESIN COMPOSITION Resonac Corporation (JP) 2024-04-24 EP disclosed
WO-2024075837-A1 COLORANT-CONTAINING LIQUID, COLORED RESIN COMPOSITION, COLOR FILTER, IMAGE DISPLAY DEVICE, AND METHOD FOR PRODUCING COLORED RESIN COMPOSITION 三菱ケミカル株式会社 2024-04-11 WO disclosed
WO-2023095828-A1 COLORED RESIN COMPOSITION, COLORED RESIN COMPOSITION SET, AND COLOR FILTER 三菱ケミカル株式会社 2023-06-01 WO disclosed
WO-2023063336-A1 COLORED RESIN COMPOSITION, COLOR FILTER, AND IMAGE DISPLAY DEVICE 三菱ケミカル株式会社 2023-04-20 WO disclosed
WO-2022264761-A1 RADICALLY POLYMERIZABLE RESIN COMPOSITION 昭和電工株式会社 2022-12-22 WO disclosed
EP-1247820-A1 Method of preparing polymer particles having narrow particle size distribution Agfa-Gevaert (BE) 2002-10-09 EP disclosed
EP-1219416-A1 On-press development printing method using a negative working thermally sensitive lithographic printing plate Agfa-Gevaert (BE) 2002-07-03 EP disclosed
US-20020055059-A1 Radiation sensitive resin composition, cathode separator and el display device JSR CORPORATION (JP) 2002-05-09 US disclosed
EP-1193557-A1 Use of a radiation sensitive resin composition for the formation of cathode separator, cathode separator and electroluminescent display device JSR Corporation (JP) 2002-04-03 EP disclosed
US-20010044075-A1 Radiation sensitive resin composition for forming barrier ribs for an EL display element, barrier rib and EL display element JSR CORPORATION (JP) 2001-11-22 US disclosed
EP-1150165-A1 Radiation sensitive resin composition for forming barrier ribs for an el display element, barrier ribs and el display element JSR Corporation (JP) 2001-10-31 EP disclosed
EP-0594452-B1 Radiation sensitive resin composition for microlens JAPAN SYNTHETIC RUBBER CO LTD (JP) 1997-01-15 EP disclosed
US-5432039-A Radiation sensitive quinone diazide and resin composition for microlens JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1995-07-11 US disclosed
EP-0594452-A2 Radiation sensitive resin composition for microlens JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1994-04-27 EP disclosed