Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | USP2 | O75604 | 1/20 | 0.36 |
| ▸ | HTT | P42858 | 1/20 | 0.35 |
| ▸ | LPAR1 | Q92633 | 4/20 | 0.33 |
| ▸ | LPAR3 | Q9UBY5 | 4/20 | 0.33 |
| ▸ | LPAR2 | Q9HBW0 | 1/20 | 0.33 |
| ▸ | PRKD3 | O94806 | 1/20 | 0.32 |
| ▸ | PRKCG | P05129 | 1/20 | 0.32 |
| ▸ | PRKCB | P05771 | 1/20 | 0.32 |
| ▸ | PRKCA | P17252 | 1/20 | 0.32 |
| ▸ | PRKCH | P24723 | 1/20 | 0.32 |
| ▸ | PRKCI | P41743 | 1/20 | 0.32 |
| ▸ | PRKCE | Q02156 | 1/20 | 0.32 |
| ▸ | PRKCQ | Q04759 | 1/20 | 0.32 |
| ▸ | PRKCZ | Q05513 | 1/20 | 0.32 |
| ▸ | PRKCD | Q05655 | 1/20 | 0.32 |
| ▸ | PRKD1 | Q15139 | 1/20 | 0.32 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
| ▸ | LPAR5 | Q9H1C0 | 1/20 | 0.31 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.31 |
| ▸ | HPGD | P15428 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3377002 | 0.90 | HSD17B10 (0.34) | USP2HTTHSD17B10TDP1 | |
| SCHEMBL9502490 | 0.79 | TSHR (0.42) | USP2HTTLPAR1LPAR3LPAR2 | |
| SCHEMBL28449693 | 0.76 | DNM1 (0.31) | — | |
| SCHEMBL3871729 | 0.74 | DNM1 (0.31) | — | |
| SCHEMBL28534846 | 0.72 | TSHR (0.39) | USP2HTTLPAR1LPAR3LPAR2 | |
| SCHEMBL2284148 | 0.72 | PLA2G2C (0.33) | USP2LPAR1LPAR3LPAR2 | |
| SCHEMBL14958388 | 0.72 | USP2 (0.55) | USP2HTTLPAR1LPAR3LPAR2 | |
| SCHEMBL15414996 | 0.72 | LPAR1 (0.38) | USP2HTTLPAR1LPAR3LPAR2 | |
| SCHEMBL582639 | 0.71 | LPAR1 (0.37) | USP2HTTLPAR1LPAR3LPAR2 | |
| SCHEMBL9637326 | 0.71 | TSHR (0.56) | USP2HTTLPAR1LPAR3LPAR2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1641908-B1 | CLEANING COMPOSITION, METHOD OF CLEANING SEMICONDUCTOR SUBSTRATE, AND METHOD OF FORMING WIRING ON SEMICONDUCTOR SUBSTRATE | TOKYO OHKA KOGYO CO LTD (JP) | 2010-11-17 | — | — | EP | disclosed |
| US-7736837-B2 | Antireflective coating composition based on silicon polymer | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2010-06-15 | — | — | US | disclosed |
| US-20100093969-A1 | Process for making siloxane polymers | ZHANG RUZHI | 2010-04-15 | — | — | US | disclosed |
| EP-2132253-A1 | PROCESS FOR MAKING SILOXANE POLYMERS | AZ Electronic Materials USA Corp. (US) | 2009-12-16 | — | — | EP | disclosed |
| EP-2129733-A2 | ANTIREFLECTIVE COATING COMPOSITION BASED ON A SILICON POLYMER | AZ Electronic Materials USA Corp. (US) | 2009-12-09 | — | — | EP | disclosed |
| US-20090274974-A1 | SPIN-ON GRADED K SILICON ANTIREFLECTIVE COATING | AZ ELECTRONIC MATERIALS USA CORP. | 2009-11-05 | — | — | US | disclosed |
| WO-2009133456-A1 | SPIN-ON GRADED K SILICON ANTIREFLECTIVE COATING | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2009-11-05 | — | — | WO | disclosed |
| EP-2035518-A2 | ANTIREFLECTIVE COATING COMPOSITIONS COMPRISING SILOXANE POLYMER | AZ Electronic Materials USA Corp. (US) | 2009-03-18 | — | — | EP | disclosed |
| US-7442675-B2 | Cleaning composition and method of cleaning semiconductor substrate | TOKYO OHKA KOGYO CO., LTD. (JP) | 2008-10-28 | — | — | US | disclosed |
| WO-2008104874-A1 | PROCESS FOR MAKING SILOXANE POLYMERS | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2008-09-04 | — | — | WO | disclosed |
| WO-2008102259-A2 | ANTIREFLECTIVE COATING COMPOSITION BASED ON A SILICON POLYMER | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2008-08-28 | — | — | WO | disclosed |
| US-20080199789-A1 | Antireflective Coating Composition Based on Silicon Polymer | MERCK PATENT GMBH (DE) | 2008-08-21 | — | — | US | disclosed |
| US-20070298349-A1 | Antireflective Coating Compositions Comprising Siloxane Polymer | AZ ELECTRONIC MATERIALS USA CORP. | 2007-12-27 | — | — | US | disclosed |
| WO-2007148223-A2 | ANTIREFLECTIVE COATING COMPOSITIONS COMPRISING SILOXANE POLYMER | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2007-12-27 | — | — | WO | disclosed |
| EP-1641908-A1 | CLEANING COMPOSITION, METHOD OF CLEANING SEMICONDUCTOR SUBSTRATE, AND METHOD OF FORMING WIRING ON SEMICONDUCTOR SUBSTRATE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2006-04-05 | — | — | EP | disclosed |
| WO-2004113486-A1 | CLEANING COMPOSITION, METHOD OF CLEANING SEMICONDUCTOR SUBSTRATE, AND METHOD OF FORMING WIRING ON SEMICONDUCTOR SUBSTRATE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2004-12-29 | — | — | WO | disclosed |
| US-20040259761-A1 | Cleaning composition, method of cleaning semiconductor substrate, and method of forming wiring on semiconductor substrate | TOKYO OHKA KOGYO CO., LTD. INTEL CORPORATION | 2004-12-23 | — | — | US | disclosed |
| US-6515073-B2 | Comprising di-, tri- and/or tetra-(alkoxy/phenoxy)silanes and a thermosetting resin which can be condensed therewith which has an absorption capacity with respect to exposing light; can be etched at high rate for fine resist patterns | TOKYO OHKA KOGYO CO., LTD. (JP) | 2003-02-04 | — | — | US | disclosed |
| US-20010036998-A1 | Anti-reflective coating-forming composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2001-11-01 | — | — | US | disclosed |