SCHEMBL3303079

SCHEMBL3303079

CCCCOCCN1CCCCC1

nearest known ligand 0.63

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LTA4H P09960 1/20 0.54
HRH3 Q9Y5N1 10/20 0.50
SLC6A2 P23975 3/20 0.46
HRH1 P35367 3/20 0.46
CHRM2 P08172 2/20 0.46
ADRA2C P18825 2/20 0.46
SLC6A3 Q01959 2/20 0.46
KCNH2 Q12809 2/20 0.46
SLC6A4 P31645 1/20 0.46
CACNA1C Q13936 1/20 0.46
SCN5A Q14524 1/20 0.46
TSHR P16473 1/20 0.46
CHRM4 P08173 2/20 0.45
ALDH1A1 P00352 2/20 0.45
LMNA P02545 2/20 0.45
THRB P10828 2/20 0.45
CYP1A2 P05177 1/20 0.45
CHRM5 P08912 1/20 0.45
CYP2D6 P10635 1/20 0.45
CYP2C9 P11712 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3303986 0.98 LTA4H (0.53) LTA4HHRH3SLC6A2HRH1CHRM2
SCHEMBL955788 0.98 LTA4H (0.53) LTA4HHRH3SLC6A2HRH1CHRM2
SCHEMBL3306544 0.98 LTA4H (0.56) LTA4HHRH3SLC6A2HRH1CHRM2
SCHEMBL501405 0.96 LTA4H (0.54) LTA4HHRH3SLC6A2HRH1CHRM2
SCHEMBL3308012 0.96 LTA4H (0.54) LTA4HHRH3SLC6A2HRH1CHRM2
SCHEMBL15510652 0.96 HRH3 (0.53) LTA4HHRH3SLC6A2HRH1CHRM2
SCHEMBL27553334 0.94 HRH3 (0.54) LTA4HHRH3
SCHEMBL3305481 0.94 LTA4H (0.57) LTA4HHRH3SLC6A2HRH1CHRM2
SCHEMBL24757676 0.94 LTA4H (0.51) LTA4HHRH3SLC6A2HRH1CHRM2
SCHEMBL18909892 0.94 LTA4H (0.51) LTA4HHRH3CHRM2KCNH2TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118994058-A Preparation of 1- (2-alkoxyethyl) piperidine modulators and modulation of poly-conjugated diene side group structure 湖南大学 2024-11-22 CN disclosed
EP-2958181-B1 NON-AQUEOUS ELECTROLYTIC SOLUTION AND NON-AQUEOUS ELECTROLYTE SECONDARY BATTERY MITSUBISHI CHEM CORP (JP) 2017-06-14 EP disclosed
US-9653754-B2 Nonaqueous electrolytes and nonaqueous-electrolyte secondary batteries employing the same MITSUBISHI CHEMICAL CORPORATION (JP) 2017-05-16 US disclosed
US-9620814-B2 2017-04-11 US disclosed
US-9515348-B2 Nonaqueous electrolytic solution and nonaqueous-electrolyte secondary battery MITSUBISHI CHEMICAL CORPORATION (JP) 2016-12-06 US disclosed
US-9231277-B2 Nonaqueous electrolytes and nonaqueous-electrolyte secondary batteries employing the same MITSUBISHI CHEMICAL CORPORATION (JP) 2016-01-05 US disclosed
EP-2958181-A1 NON-AQUEOUS ELECTROLYTIC SOLUTION AND NON-AQUEOUS ELECTROLYTE SECONDARY BATTERY Mitsubishi Chemical Corporation (JP) 2015-12-23 EP disclosed
EP-2535976-B1 NON-AQUEOUS ELECTROLYTE SOLUTION, AND SECONDARY BATTERY COMPRISING THE SAME MITSUBISHI CHEM CORP (JP) 2015-09-02 EP disclosed
US-9048508-B2 Nonaqueous electrolytes and nonaqueous-electrolyte secondary batteries employing the same MITSUBISHI CHEMICAL CORPORATION (JP) 2015-06-02 US disclosed
US-20140335405-A1 NONAQUEOUS ELECTROLYTES AND NONAQUEOUS-ELECTROLYTE SECONDARY BATTERIES EMPLOYING THE SAME MITSUBISHI CHEMICAL CORPORATION (JP) 2014-11-13 US disclosed
EP-2166611-A1 NONAQUEOUS ELECTROLYTE, AND RECHARGEABLE BATTERY WITH THE NONAQUEOUS ELECTROLYTE Mitsubishi Chemical Corporation (JP) 2010-03-24 EP disclosed
US-7670750-B2 Polymer, resist protective coating material, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-03-02 US disclosed
US-7670750-B2 Polymer, resist protective coating material, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-03-02 US disclosed
US-20090208867-A1 Resist Composition, Resist Protective Coating Composition, and Patterning Process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-08-20 US disclosed
US-20090208867-A1 Resist Composition, Resist Protective Coating Composition, and Patterning Process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-08-20 US disclosed
US-20080085466-A1 Polymer, resist protective coating material, and patterning process SHIN-ETSU CHEMICAL CO., LTD. 2008-04-10 US disclosed
US-20080085466-A1 Polymer, resist protective coating material, and patterning process SHIN-ETSU CHEMICAL CO., LTD. 2008-04-10 US disclosed
US-20070275326-A1 Resist protective film composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-11-29 US disclosed
US-20070275326-A1 Resist protective film composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-11-29 US disclosed
US-7217447-B2 Ink-jet recording sheet FUJIFILM CORPORATION (JP) 2007-05-15 US disclosed