SCHEMBL3303147

SCHEMBL3303147

CCCCOCN1CCCCC1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.47
LTA4H P09960 1/20 0.43
HRH3 Q9Y5N1 7/20 0.40
THRB P10828 3/20 0.40
ALDH1A1 P00352 3/20 0.40
LMNA P02545 2/20 0.40
CYP1A2 P05177 1/20 0.40
CHRM2 P08172 1/20 0.40
CHRM4 P08173 1/20 0.40
CHRM5 P08912 1/20 0.40
CYP2D6 P10635 1/20 0.40
CYP2C9 P11712 1/20 0.40
ADRA2C P18825 1/20 0.40
DRD4 P21917 1/20 0.40
ACHE P22303 1/20 0.40
SLC6A2 P23975 1/20 0.40
HRH2 P25021 1/20 0.40
HTR2A P28223 1/20 0.40
ADRA1A P35348 1/20 0.40
HRH1 P35367 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2494566 0.98 TSHR (0.44) TSHRLTA4HHRH3THRBALDH1A1
SCHEMBL3307520 0.94 LTA4H (0.46) TSHRLTA4HHRH3THRBALDH1A1
SCHEMBL6690746 0.92 LTA4H (0.49) TSHRLTA4HHRH3THRBALDH1A1
SCHEMBL5935795 0.92 LTA4H (0.49) TSHRLTA4HHRH3THRBALDH1A1
SCHEMBL3308645 0.91 LTA4H (0.47) TSHRLTA4HHRH3THRBALDH1A1
SCHEMBL5935796 0.89 LTA4H (0.50) TSHRLTA4HHRH3THRBALDH1A1
SCHEMBL5892364 0.89 TSHR (0.42) TSHRLTA4HHRH3ALDH1A1LMNA
SCHEMBL3314123 0.86 TSHR (0.38) TSHRLTA4HHRH3THRBALDH1A1
SCHEMBL2494508 0.84 TSHR (0.35) TSHRLTA4HHRH3THRBALDH1A1
SCHEMBL19176320 0.81 NPC1 (0.45) TSHRLTA4HHRH3THRBALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7049275-B2 Photoresist stripping composition and cleaning composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2006-05-23 US claimed
EP-2958181-B1 NON-AQUEOUS ELECTROLYTIC SOLUTION AND NON-AQUEOUS ELECTROLYTE SECONDARY BATTERY MITSUBISHI CHEM CORP (JP) 2017-06-14 EP disclosed
US-9653754-B2 Nonaqueous electrolytes and nonaqueous-electrolyte secondary batteries employing the same MITSUBISHI CHEMICAL CORPORATION (JP) 2017-05-16 US disclosed
US-9620814-B2 2017-04-11 US disclosed
US-9515348-B2 Nonaqueous electrolytic solution and nonaqueous-electrolyte secondary battery MITSUBISHI CHEMICAL CORPORATION (JP) 2016-12-06 US disclosed
US-9231277-B2 Nonaqueous electrolytes and nonaqueous-electrolyte secondary batteries employing the same MITSUBISHI CHEMICAL CORPORATION (JP) 2016-01-05 US disclosed
EP-2958181-A1 NON-AQUEOUS ELECTROLYTIC SOLUTION AND NON-AQUEOUS ELECTROLYTE SECONDARY BATTERY Mitsubishi Chemical Corporation (JP) 2015-12-23 EP disclosed
EP-2535976-B1 NON-AQUEOUS ELECTROLYTE SOLUTION, AND SECONDARY BATTERY COMPRISING THE SAME MITSUBISHI CHEM CORP (JP) 2015-09-02 EP disclosed
US-9048508-B2 Nonaqueous electrolytes and nonaqueous-electrolyte secondary batteries employing the same MITSUBISHI CHEMICAL CORPORATION (JP) 2015-06-02 US disclosed
US-20140335405-A1 NONAQUEOUS ELECTROLYTES AND NONAQUEOUS-ELECTROLYTE SECONDARY BATTERIES EMPLOYING THE SAME MITSUBISHI CHEMICAL CORPORATION (JP) 2014-11-13 US disclosed
US-20100099031-A1 NONAQUEOUS ELECTROLYTES AND NONAQUEOUS-ELECTROLYTE SECONDARY BATTERIES EMPLOYING THE SAME MITSUBISHI CHEMICAL CORPORATION (JP) 2010-04-22 US disclosed
EP-2166611-A1 NONAQUEOUS ELECTROLYTE, AND RECHARGEABLE BATTERY WITH THE NONAQUEOUS ELECTROLYTE Mitsubishi Chemical Corporation (JP) 2010-03-24 EP disclosed
CN-1312535-C Optical photoresist stripping composition and cleaning composition MITSUBISHI GAS CHEMICAL CO (JP) 2007-04-25 CN disclosed
US-7049275-B2 Photoresist stripping composition and cleaning composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2006-05-23 US disclosed
US-20030181344-A1 Photoresist stripping composition and cleaning composition MITSUBISHI GAS CHEMICAL CO., INC. (JP) 2003-09-25 US disclosed
CN-1444103-A Optical photoresist stripping composition and cleaning composition MITSUBISHI GAS CHEMICAL CO (JP) 2003-09-24 CN disclosed
EP-0662964-B1 HETEROCYCLIC AMINES HAVING CALMODULIN ANTAGONIST PROPERTIES BRITISH TECH GROUP (GB) 1997-06-11 EP disclosed
US-5543422-A HYPOTENSIVE AGENTS, ANTIISCHEMIC AGENTS, FUNGICIDES BRITISH TECHNOLOGY GROUP LIMITED (GB) 1996-08-06 US disclosed
EP-0662964-A1 HETEROCYCLIC AMINES HAVING COLMODULIN ANTAGONIST PROPERTIES. BRITISH TECH GROUP (GB) 1995-07-19 EP disclosed
WO-1994007875-A1 HETEROCYCLIC AMINES HAVING COLMODULIN ANTAGONIST PROPERTIES BRITISH TECHNOLOGY GROUP LIMITED (GB) 1994-04-14 WO disclosed