Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9975638 | 0.87 | — | — | |
| SCHEMBL22399918 | 0.87 | — | — | |
| SCHEMBL14549206 | 0.87 | — | — | |
| SCHEMBL415325 | 0.87 | — | — | |
| SCHEMBL3305897 | 0.83 | ATM (0.33) | ATMCYP19A1 | |
| SCHEMBL12190159 | 0.82 | — | — | |
| SCHEMBL21010755 | 0.80 | ATM (0.31) | ATM | |
| SCHEMBL15147128 | 0.78 | POLB (0.35) | — | |
| SCHEMBL641536 | 0.78 | ATM (0.65) | ATMCYP19A1 | |
| SCHEMBL29353750 | 0.78 | ATM (0.65) | ATMCYP19A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7816471-B2 | Process for producing photoresist polymeric compounds | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2010-10-19 | — | — | US | disclosed |
| US-20100099836-A1 | PROCESS FOR PRODUCING PHOTORESIST POLYMERIC COMPOUNDS | WATANABE HITOSHI | 2010-04-22 | — | — | US | disclosed |
| US-7662897-B2 | dropping polymerization of monomers such as 1-hydroxy-3-methacryloyloxyadamantane (HMA), 5-methacryloyloxy-2,6-norbornane carbolactone (MNBL), 2-methacryloyloxy-2-methyladamantane (2-MMA), solvent extraction, redissolving, desolventing; purification; metal-free | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2010-02-16 | — | — | US | disclosed |
| US-7655743-B2 | Process for producing photoresist polymeric compounds | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2010-02-02 | — | — | US | disclosed |
| US-20080268377-A1 | PROCESS FOR PRODUCING PHOTORESIST POLYMERIC COMPOUNDS | WATANABE HITOSHI | 2008-10-30 | — | — | US | disclosed |
| EP-1491560-B1 | PROCESS FOR THE PRODUCTION OF HIGH-MOLECULAR COMPOUNDS FOR PHOTORESIST | DAICEL CHEM (JP) | 2007-11-21 | — | — | EP | disclosed |
| US-20060116494-A1 | Process for producing photoresist polymeric compounds | WATANABE HITOSHI | 2006-06-01 | — | — | US | disclosed |
| US-20060116493-A1 | Process for producing photoresist polymeric compounds | WATANABE HITOSHI | 2006-06-01 | — | — | US | disclosed |
| US-7015291-B2 | Process for the production of high-molecular compounds for photoresist | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2006-03-21 | — | — | US | disclosed |
| US-20050100815-A1 | Process for the production of high-molecular compounds for photoresist | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2005-05-12 | — | — | US | disclosed |