Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ATM | Q13315 | 2/20 | 0.33 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.32 |
| ▸ | GRM1 | Q13255 | 2/20 | 0.31 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.30 |
| ▸ | NPC1 | O15118 | 1/20 | 0.30 |
| ▸ | POLB | P06746 | 1/20 | 0.30 |
| ▸ | MAPT | P10636 | 1/20 | 0.30 |
| ▸ | PKM | P14618 | 1/20 | 0.30 |
| ▸ | HTT | P42858 | 1/20 | 0.30 |
| ▸ | RECQL | P46063 | 1/20 | 0.30 |
| ▸ | RAB9A | P51151 | 1/20 | 0.30 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL22840948 | 0.88 | KDM4E (0.31) | ATMKDM4ENPC1POLBMAPT | |
| SCHEMBL19719271 | 0.88 | KDM4E (0.31) | ATMKDM4ENPC1POLBMAPT | |
| SCHEMBL13088042 | 0.88 | KDM4E (0.31) | ATMKDM4ENPC1POLBMAPT | |
| SCHEMBL15166539 | 0.88 | KDM4E (0.31) | ATMKDM4ENPC1POLBMAPT | |
| SCHEMBL47307 | 0.88 | KDM4E (0.31) | ATMKDM4ENPC1POLBMAPT | |
| SCHEMBL9975636 | 0.88 | KDM4E (0.31) | ATMKDM4ENPC1POLBMAPT | |
| SCHEMBL74605 | 0.83 | KDM4E (0.30) | ATMKDM4ENPC1POLBMAPT | |
| SCHEMBL19050201 | 0.83 | KDM4E (0.30) | ATMKDM4ENPC1POLBMAPT | |
| SCHEMBL3303720 | 0.83 | ATM (0.42) | ATMCYP19A1 | |
| SCHEMBL13588254 | 0.81 | ATM (0.32) | ATMCYP19A1KDM4ENPC1POLB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7816471-B2 | Process for producing photoresist polymeric compounds | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2010-10-19 | — | — | US | disclosed |
| US-20100099836-A1 | PROCESS FOR PRODUCING PHOTORESIST POLYMERIC COMPOUNDS | WATANABE HITOSHI | 2010-04-22 | — | — | US | disclosed |
| US-7662897-B2 | dropping polymerization of monomers such as 1-hydroxy-3-methacryloyloxyadamantane (HMA), 5-methacryloyloxy-2,6-norbornane carbolactone (MNBL), 2-methacryloyloxy-2-methyladamantane (2-MMA), solvent extraction, redissolving, desolventing; purification; metal-free | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2010-02-16 | — | — | US | disclosed |
| US-7655743-B2 | Process for producing photoresist polymeric compounds | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2010-02-02 | — | — | US | disclosed |
| US-20080268377-A1 | PROCESS FOR PRODUCING PHOTORESIST POLYMERIC COMPOUNDS | WATANABE HITOSHI | 2008-10-30 | — | — | US | disclosed |
| EP-1491560-B1 | PROCESS FOR THE PRODUCTION OF HIGH-MOLECULAR COMPOUNDS FOR PHOTORESIST | DAICEL CHEM (JP) | 2007-11-21 | — | — | EP | disclosed |
| US-20060116494-A1 | Process for producing photoresist polymeric compounds | WATANABE HITOSHI | 2006-06-01 | — | — | US | disclosed |
| US-20060116493-A1 | Process for producing photoresist polymeric compounds | WATANABE HITOSHI | 2006-06-01 | — | — | US | disclosed |
| US-7015291-B2 | Process for the production of high-molecular compounds for photoresist | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2006-03-21 | — | — | US | disclosed |
| US-20050100815-A1 | Process for the production of high-molecular compounds for photoresist | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2005-05-12 | — | — | US | disclosed |