⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Diallylsulfone SCHEMBL9947 | 0.86 | — | — | |
| SCHEMBL10784787 | 0.83 | — | — | |
| SCHEMBL10626498 | 0.83 | — | — | |
| Diallylsulfone SCHEMBL9518459 | 0.83 | CA2 (0.31) | — | |
| Diallylsulfone SCHEMBL17707262 | 0.83 | CA2 (0.31) | — | |
| SCHEMBL10785656 | 0.81 | — | — | |
| SCHEMBL14955466 | 0.80 | — | — | |
| Diallylsulfone SCHEMBL4543929 | 0.78 | ALDH1A1 (0.33) | — | |
| SCHEMBL780195 | 0.78 | — | — | |
| SCHEMBL5923896 | 0.78 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-4047952-A | Imagewise soluble silver salt intensification of diffusion transfer silver images | EASTMAN KODAK COMPANY (US) | 1977-09-13 | — | — | US | claimed |
| US-4047953-A | PHOTOGRAPHIC FILMS | EASTMAN KODAK COMPANY (US) | 1977-09-13 | — | — | US | claimed |
| US-9405199-B2 | Method for forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-08-02 | — | — | US | disclosed |
| US-20150044617-A1 | METHOD FOR FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-02-12 | — | — | US | disclosed |
| US-8614033-B2 | Resist film, resist coated mask blanks and method of forming resist pattern using the resist film, and chemical amplification type resist composition | FUJIFILM CORPORATION (JP) | 2013-12-24 | — | — | US | disclosed |
| US-8404390-B2 | Nonaqueous electrolyte solution for lithium secondary battery and lithium secondary battery using the same | UBE INDUSTRIES, LTD. (JP) | 2013-03-26 | — | — | US | disclosed |
| US-20120214091-A1 | RESIST FILM, RESIST COATED MASK BLANKS AND METHOD OF FORMING RESIST PATTERN USING THE RESIST FILM, AND CHEMICAL AMPLIFICATION TYPE RESIST COMPOSITION | FUJIFILM CORPORATION (JP) | 2012-08-23 | — | — | US | disclosed |
| US-20100092872-A1 | NONAQUEOUS ELECTROLYTE SOLUTION FOR LITHIUM SECONDARY BATTERY AND LITHIUM SECONDARY BATTERY USING THE SAME | UBE INDUSTRIES, LTD. (JP) | 2010-04-15 | — | — | US | disclosed |
| EP-2138481-A1 | NONAQUEOUS ELECTROLYTE SOLUTION FOR LITHIUM SECONDARY BATTERY AND LITHIUM SECONDARY BATTERY USING THE SAME | Ube Industries, Ltd. (JP) | 2009-12-30 | — | — | EP | disclosed |
| JP-2009292726-A | METHOD FOR PRODUCING HYDRAZONE COMPOUNDS | SHIRATORI PHARMACEUTICAL CO LTD | 2009-12-17 | — | — | JP | disclosed |
| US-20090030191-A1 | Process for Producing Carbon-Reduced Aldose Compounds | ASUBIO PHARMA CO., LTD. (JP) | 2009-01-29 | — | — | US | disclosed |
| EP-1849793-A1 | PROCESS FOR PRODUCING CARBON-DIMINISHED ALDOSE COMPOUND | Asubio Pharma Co., Ltd. (JP) | 2007-10-31 | — | — | EP | disclosed |
| US-6815143-B2 | POST EXPOSURE DELAY (PED)-STABILIZER-CONTAINING RESIST MATERIAL HAVING HIGH SENSITIVITY AND HIGH RESOLUTION; THIOL DERIVATIVES, DISULFIDE DERIVATIVES AND/OR THIOLSULFONATE DERIVATIVES | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-11-09 | — | — | US | disclosed |
| US-20020136981-A1 | Resist material and pattern forming method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-09-26 | — | — | US | disclosed |
| JP-2002122992-A | RESIST MATERIAL AND PATTERN FORMING METHOD | SHIN ETSU CHEM CO LTD | 2002-04-26 | — | — | JP | disclosed |
| CN-1290408-A | Electrolytes containing mixed fluorocarbon/hydrocarbon imide and methide salts | MINNESOTA MINING & MFG (US) | 2001-04-04 | — | — | CN | disclosed |
| EP-1066657-A1 | ELECTROLYTES CONTAINING MIXED FLUOROCARBON/HYDROCARBON IMIDE AND METHIDE SALTS | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 2001-01-10 | — | — | EP | disclosed |
| US-6063522-A | IMIDE OR METHIDE CONDUCTIVE SALTS OF GIVEN FORMULA HAVING MIXED FLUOROCHEMICAL AND HYDROCARBON GROUPS; RELATIVELY INEXPENSIVE SALTS EXHIBIT GOOD CONDUCTIVITY IN ELECTROLYTES | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2000-05-16 | — | — | US | disclosed |
| WO-1999049529-A1 | ELECTROLYTES CONTAINING MIXED FLUOROCARBON/HYDROCARBON IMIDE AND METHIDE SALTS | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1999-09-30 | — | — | WO | disclosed |
| US-4047952-A | Imagewise soluble silver salt intensification of diffusion transfer silver images | EASTMAN KODAK COMPANY (US) | 1977-09-13 | — | — | US | disclosed |