SCHEMBL3307958

SCHEMBL3307958

FCCCOC(F)(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17295373 0.83
SCHEMBL1608194 0.83
SCHEMBL9240401 0.80
SCHEMBL13286319 0.79
SCHEMBL28309187 0.77
SCHEMBL20561085 0.77 NFKB1 (0.39)
Hydrochloric Acid SCHEMBL21408438 0.77 ODC1 (0.41)
SCHEMBL1717819 0.75
SCHEMBL31051707 0.75 DNM1 (0.42)
SCHEMBL1118611 0.73

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 46 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107867978-A A kind of synthetic method of heptafluoropropyl trifluoromethyl ethers 中昊晨光化工研究院有限公司 2018-04-03 CN claimed
JP-7179386-A None JP disclosed
US-20250343048-A1 ETCHING METHOD RESONAC CORPORATION (JP) 2025-11-06 US disclosed
EP-4481794-A1 ETCHING METHOD Resonac Corporation (JP) 2024-12-25 EP disclosed
CN-118679554-A Etching method 株式会社力森诺科 2024-09-20 CN disclosed
WO-2023157441-A1 ETCHING METHOD 株式会社レゾナック 2023-08-24 WO disclosed
CN-116014240-A Nonaqueous electrolyte solution and nonaqueous electrolyte secondary battery using same 三菱化学株式会社 2023-04-25 CN disclosed
CN-110233290-A Nonaqueous electrolyte solution and nonaqueous electrolyte secondary battery using same 三菱化学株式会社 2019-09-13 CN disclosed
CN-104966849-B Nonaqueous electrolyte solution and nonaqueous electrolyte secondary battery using same 三菱化学株式会社 2019-06-07 CN disclosed
US-9653754-B2 Nonaqueous electrolytes and nonaqueous-electrolyte secondary batteries employing the same MITSUBISHI CHEMICAL CORPORATION (JP) 2017-05-16 US disclosed
US-7553529-B2 Article with lubricated surface and method TRIBOFILM RESEARCH, INC. (US) 2009-06-30 US disclosed
US-20090126404-A1 Method for Treating a Hydrophilic Surface TRIBOFILM RESEARCH, INC. (US) 2009-05-21 US disclosed
US-20090010985-A1 Article with Lubricated Surface and Method TRIBOFILM RESEARCH, INC. (US) 2009-01-08 US disclosed
US-20080254304-A1 Article with Lubricated Surface and Method TRIBOFILM RESEARCH, INC. (US) 2008-10-16 US disclosed
US-7431989-B2 Article with lubricated surface and method TRIBOFILM RESEARCH, INC. (US) 2008-10-07 US disclosed
US-RE40519-E1 Conductive fluoro-resin compositions SHIN-ETSU CHEMICAL CO., LTD. (JP) 2008-09-23 US disclosed
US-20080145565-A1 Article with Lubricated Surface and Method SAKHRANI VINAY G 2008-06-19 US disclosed
US-20080085070-A1 Retainer for Rolling Bearing, and Rolling Bearing NTN CORPORATION (JP) 2008-04-10 US disclosed
US-20080044588-A1 Method for Treating a Hydrophilic Surface SAKHRANI VINAY G 2008-02-21 US disclosed
JP-H07179386-A NEW TRIFLUOROMETHOXYFLUOROPROPANES AND THEIR PRODUCTION AGENCY OF IND SCIENCE & TECHNOL 1995-07-18 JP disclosed