⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3310208 | 0.76 | ALDH1A1 (0.44) | — | |
| SCHEMBL1532594 | 0.75 | TSHR (0.50) | — | |
| SCHEMBL27517268 | 0.75 | TSHR (0.32) | — | |
| SCHEMBL13613127 | 0.75 | TSHR (0.50) | — | |
| SCHEMBL10948804 | 0.75 | TSHR (0.38) | — | |
| SCHEMBL666918 | 0.75 | TSHR (0.50) | — | |
| SCHEMBL3992013 | 0.74 | — | — | |
| SCHEMBL8082266 | 0.74 | — | — | |
| SCHEMBL3338061 | 0.73 | TSHR (0.48) | — | |
| SCHEMBL448478 | 0.73 | TSHR (0.48) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8551687-B2 | Alkali developable photosensitive resin composition and dry film manufactured by the same | LG CHEM, LTD. (KR) | 2013-10-08 | — | — | US | disclosed |
| US-20100113640-A1 | ALKALI DEVELOPABLE PHOTOSENSITIVE RESIN COMPOSITION AND DRY FILM MANUFACTURED BY THE SAME | LG CHEM, LTD. (KR) | 2010-05-06 | — | — | US | disclosed |