SCHEMBL3310208

SCHEMBL3310208

C=C(C)C(=O)OC(C=O)C=O

nearest known ligand 0.44

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.44
TSHR P16473 3/20 0.40
THRB P10828 1/20 0.38
TDP1 Q9NUW8 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27385530 0.81 ALDH1A1 (0.44) ALDH1A1TSHRTHRBTDP1
SCHEMBL2218766 0.79 TSHR (0.43) ALDH1A1TSHRTHRBTDP1
SCHEMBL26936563 0.79 ALDH1A1 (0.42) ALDH1A1TSHRTHRBTDP1
Hydrochloric Acid SCHEMBL3958450 0.76 TSHR (0.45) ALDH1A1TSHRTHRBTDP1
SCHEMBL27967355 0.76 TSHR (0.41) ALDH1A1TSHRTHRB
SCHEMBL2515977 0.74 TSHR (0.39) ALDH1A1TSHRTHRB
SCHEMBL27741747 0.74 ALDH1A1 (0.60) ALDH1A1TSHRTHRB
SCHEMBL8082266 0.74
SCHEMBL17070900 0.74 ALDH1A1 (0.52) ALDH1A1TSHRTHRBTDP1
SCHEMBL2909111 0.73 ALDH1A1 (0.46) ALDH1A1TSHRTHRBTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8551687-B2 Alkali developable photosensitive resin composition and dry film manufactured by the same LG CHEM, LTD. (KR) 2013-10-08 US disclosed
US-20100113640-A1 ALKALI DEVELOPABLE PHOTOSENSITIVE RESIN COMPOSITION AND DRY FILM MANUFACTURED BY THE SAME LG CHEM, LTD. (KR) 2010-05-06 US disclosed