Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6034392 | 0.89 | THRB (0.35) | THRBLMNA | |
| SCHEMBL704023 | 0.88 | THRB (0.38) | THRBLMNA | |
| SCHEMBL557200 | 0.88 | THRB (0.38) | THRBLMNA | |
| SCHEMBL646412 | 0.88 | THRB (0.38) | THRBLMNA | |
| SCHEMBL6007776 | 0.86 | THRB (0.36) | THRBLMNA | |
| SCHEMBL3104636 | 0.86 | THRB (0.36) | THRBLMNA | |
| SCHEMBL478006 | 0.86 | THRB (0.36) | THRBLMNA | |
| SCHEMBL1847272 | 0.84 | THRB (0.35) | THRBLMNA | |
| SCHEMBL55696 | 0.84 | THRB (0.35) | THRBLMNA | |
| Ethylene SCHEMBL28262365 | 0.84 | THRB (0.35) | THRBLMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 359 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250304819-A1 | Flexible and foldable abrasion resistant photopatternable siloxane hard coat | OPTITUNE OY (FI) | 2025-10-02 | — | — | US | claimed |
| US-20240361695-A1 | STRUCTURES INCLUDING A SiOCN PHOTORESIST ADHESION LAYER AND METAL-OXIDE RESIST AND METHODS OF FORMING SAME | ASM IP HOLDING B.V. (NL) | 2024-10-31 | — | — | US | claimed |
| CN-118859631-A | Structure including photoresist adhesive layer and method of forming the same | ASM IP私人控股有限公司 | 2024-10-29 | — | — | CN | claimed |
| CN-107636097-B | Silicone polymer composition and use thereof | 奥普提汀公司 | 2024-03-15 | — | — | CN | claimed |
| US-20230288810-A1 | METHOD OF FORMING A STRUCTURE COMPRISING A PHOTORESIST UNDERLAYER | ASM IP HOLDING B.V. (NL) | 2023-09-14 | — | — | US | claimed |
| CN-116736637-A | Method of forming a structure comprising a photoresist underlayer | ASM IP私人控股有限公司 | 2023-09-12 | — | — | CN | claimed |
| EP-3663301-B1 | BORON-CONTAINING COMPOUNDS, COMPOSITIONS, AND METHODS FOR THE DEPOSITION OF BORON CONTAINING FILMS | VERSUM MAT US LLC (US) | 2023-08-30 | — | — | EP | claimed |
| US-11634610-B2 | Siloxane polymer compositions and their use | OPTITUNE OY (FI) | 2023-04-25 | — | — | US | claimed |
| US-20220350248-A1 | METHOD OF FORMING AN ADHESION LAYER ON A PHOTORESIST UNDERLAYER AND STRUCTURE INCLUDING SAME | ASM IP HOLDING B.V. (NL) | 2022-11-03 | — | — | US | claimed |
| US-20220010172-A1 | SILOXANE POLYMER COMPOSITIONS AND THEIR USE | OPTITUNE OY (FI) | 2022-01-13 | — | — | US | claimed |
| US-20160225616-A1 | METHOD AND PRECURSORS FOR MANUFACTURING 3D DEVICES | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2016-08-04 | — | — | US | claimed |
| EP-3051001-A2 | METHOD AND PRECURSORS FOR MANUFACTURING 3D DEVICES | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2016-08-03 | — | — | EP | claimed |
| EP-2993687-A1 | METHOD AND COMPOSITION FOR PROVIDING PORE SEALING LAYER ON POROUS LOW DIELECTRIC CONSTANT FILMS | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2016-03-09 | — | — | EP | claimed |
| US-20160049293-A1 | METHOD AND COMPOSITION FOR PROVIDING PORE SEALING LAYER ON POROUS LOW DIELECTRIC CONSTANT FILMS | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2016-02-18 | — | — | US | claimed |
| EP-2618364-A2 | Catalyst and formulations comprising same for alkoxysilanes hydrolysis reaction in semiconductor process | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2013-07-24 | — | — | EP | claimed |
| US-20130180215-A1 | CATALYST AND FORMULATIONS COMPRISING SAME FOR ALKOXYSILANES HYDROLYSIS REACTION IN SEMICONDUCTOR PROCESS | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2013-07-18 | — | — | US | claimed |
| US-7932295-B2 | Organic silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device | JSR CORPORATION (JP) | 2011-04-26 | — | — | US | claimed |
| US-7875317-B2 | formed by hydrolyzing and condensing a siloxy compound in the presence of a polycarbosilane; low relative dielectric constant and excellent mechanical strength, storage stability, and chemical resistance; semiconductors | JSR CORPORATION (JP) | 2011-01-25 | — | — | US | claimed |
| US-20080246153-A1 | ORGANIC SILICA-BASED FILM, METHOD OF FORMING THE SAME, COMPOSITION FOR FORMING INSULATING FILM FOR SEMICONDUCTOR DEVICE, INTERCONNECT STRUCTURE, AND SEMICONDUCTOR DEVICE | JSR CORPORATION (JP) | 2008-10-09 | — | — | US | claimed |
| US-7399715-B2 | Organic silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device | JSR CORPORATION (JP) | 2008-07-15 | — | — | US | claimed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20160225616-A1 | METHOD AND PRECURSORS FOR MANUFACTURING 3D DEVICES | MEF2D, HTR3D, NSD3 | THRB 3064/4885LMNA 3947/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.