⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL310297 | 0.85 | — | — | |
| SCHEMBL5425407 | 0.79 | — | — | |
| SCHEMBL5405139 | 0.79 | — | — | |
| SCHEMBL978795 | 0.76 | — | — | |
| SCHEMBL9404238 | 0.76 | — | — | |
| SCHEMBL309171 | 0.76 | — | — | |
| SCHEMBL5421282 | 0.76 | — | — | |
| SCHEMBL996897 | 0.71 | — | — | |
| SCHEMBL9404218 | 0.71 | — | — | |
| SCHEMBL498205 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 57 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-7002933-A | — | — | None | — | — | JP | disclosed |
| US-20250326880-A1 | (ULTRA)HIGH MOLECULAR WEIGHT POLYETHYLENE-BASED BLOCK COPOLYMER, MANUFACTURING METHOD THEREOF, AND SECONDARY BATTERY SEPARATOR FABRICATED USING SAME AS RAW MATERIAL | KOREA PETROCHEMICAL IND. CO., LTD (KR) | 2025-10-23 | — | — | US | disclosed |
| US-20250326869-A1 | METHOD FOR MANUFACTURING ULTRA-HIGH MOLECULAR WEIGHT POLYPROPYLENE | KOREA PETROCHEMICAL IND. CO., LTD (KR) | 2025-10-23 | — | — | US | disclosed |
| US-12346026-B2 | Composition for forming underlayer film, resist pattern forming method, and manufacturing method of electronic device | FUJIFILM CORPORATION (JP) | 2025-07-01 | — | — | US | disclosed |
| EP-4435026-A1 | (ULTRA)HIGH MOLECULAR WEIGHT POLYETHYLENE-BASED BLOCK COPOLYMER, MANUFACTURING METHOD THEREOF, AND SECONDARY BATTERY SEPARATOR FABRICATED USING SAME AS RAW MATERIAL | Korea Petrochemical Ind. Co., Ltd (KR) | 2024-09-25 | — | — | EP | disclosed |
| CN-118251433-A | (Ultra) high molecular weight polyethylene-based block copolymer, method for producing same, and secondary battery separation membrane produced using same as raw material | 大韩油化株式会社 | 2024-06-25 | — | — | CN | disclosed |
| US-20220252985-A1 | COMPOSITION FOR FORMING UNDERLAYER FILM, RESIST PATTERN FORMING METHOD, AND MANUFACTURING METHOD OF ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2022-08-11 | — | — | US | disclosed |
| WO-2021122431-A1 | POLYURETHANE FOAMS BASED ON POLYETHER CARBONATE POLYOLS | COVESTRO INTELLECTUAL PROPERTY GMBH & CO. KG (DE) | 2021-06-24 | — | — | WO | disclosed |
| EP-3838964-A1 | POLYURETHANE FOAMS BASED ON POLYETHER CARBONATE POLYOLS | Covestro Deutschland AG (DE) | 2021-06-23 | — | — | EP | disclosed |
| US-10025188-B2 | Resist pattern-forming method | JSR CORPORATION (JP) | 2018-07-17 | — | — | US | disclosed |
| US-20100178620-A1 | INVERTED PATTERN FORMING METHOD AND RESIN COMPOSITION | JSR CORPORATION (JP) | 2010-07-15 | — | — | US | disclosed |
| US-20100174103-A1 | MATERIAL FOR FORMING SILICON-CONTAINING FILM, AND SILICON-CONTAINING INSULATING FILM AND METHOD FOR FORMING THE SAME | JSR CORPORATION (JP) | 2010-07-08 | — | — | US | disclosed |
| US-20100174103-A1 | MATERIAL FOR FORMING SILICON-CONTAINING FILM, AND SILICON-CONTAINING INSULATING FILM AND METHOD FOR FORMING THE SAME | JSR CORPORATION (JP) | 2010-07-08 | — | — | US | disclosed |
| US-20100140754-A1 | FILM-FORMING MATERIAL, SILICON-CONTAINING INSULATING FILM AND METHOD FOR FORMING THE SAME | JSR CORPORATION (JP) | 2010-06-10 | — | — | US | disclosed |
| US-20100140754-A1 | FILM-FORMING MATERIAL, SILICON-CONTAINING INSULATING FILM AND METHOD FOR FORMING THE SAME | JSR CORPORATION (JP) | 2010-06-10 | — | — | US | disclosed |
| CN-101611043-A | Containing silicon fiml forms with material and contains silicon insulating film and forming method thereof | JSR CORP (JP) | 2009-12-23 | — | — | CN | disclosed |
| EP-2123658-A1 | MATERIAL FOR FORMING SILICON-CONTAINING FILM, AND SILICON-CONTAINING INSULATING FILM AND METHOD FOR FORMING THE SAME | JSR Corporation (JP) | 2009-11-25 | — | — | EP | disclosed |
| CN-101528874-A | Material for film formation, and silicon-containing insulating film and method for forming same | JSR CORP (JP) | 2009-09-09 | — | — | CN | disclosed |
| EP-2053107-A1 | FILM-FORMING MATERIAL, SILICON-CONTAINING INSULATING FILM AND METHOD FOR FORMING THE SAME | JSR Corporation (JP) | 2009-04-29 | — | — | EP | disclosed |
| JP-H072933-A | METHOD FOR POLYMERIZING ALPHA-OLEFIN | UBE IND LTD | 1995-01-06 | — | — | JP | disclosed |