⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3673804 | 0.80 | — | — | |
| SCHEMBL3677408 | 0.78 | — | — | |
| SCHEMBL9404238 | 0.76 | — | — | |
| SCHEMBL9404241 | 0.76 | — | — | |
| SCHEMBL3680176 | 0.76 | LMNA (0.31) | — | |
| SCHEMBL25190374 | 0.74 | LMNA (0.34) | — | |
| SCHEMBL9404218 | 0.71 | — | — | |
| SCHEMBL331284 | 0.71 | — | — | |
| SCHEMBL996897 | 0.71 | — | — | |
| SCHEMBL331462 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 115 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2014170799-A1 | CROSSLINKABLE VARNISH AND METHOD FOR APPLYING SAME | COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES (FR) | 2014-10-23 | — | — | WO | claimed |
| US-8039049-B2 | Treatment of low dielectric constant films using a batch processing system | TOKYO ELECTRON LIMITED (JP) | 2011-10-18 | — | — | US | claimed |
| US-7405168-B2 | Plural treatment step process for treating dielectric films | TOKYO ELECTRON LIMITED (JP) | 2008-07-29 | — | — | US | claimed |
| US-20080076262-A1 | METHOD AND SYSTEM FOR TREATING A DIELECTRIC FILM | TOKYO ELECTRON LIMITED (JP) | 2008-03-27 | — | — | US | claimed |
| US-7345000-B2 | Method and system for treating a dielectric film | TOKYO ELECTRON LIMITED (JP) | 2008-03-18 | — | — | US | claimed |
| WO-2007040834-A2 | PLURAL TREATMENT STEP PROCESS FOR TREATING DIELECTRIC FILMS | TOKYO ELECTRON LIMITED (JP) | 2007-04-12 | — | — | WO | claimed |
| WO-2007040816-A2 | TREATMENT OF LOW DIELECTRIC CONSTANT FILMS USING A BATCH PROCESSING SYSTEM | TOKYO ELECTRON LIMITED (JP) | 2007-04-12 | — | — | WO | claimed |
| WO-2007040856-A2 | PLASMA-ASSISTED VAPOR PHASE TREATMENT OF LOW DIELECTRIC CONSTANT FILMS USING A BATCH PROCESSING SYSTEM | TOKYO ELECTRON LIMITED (JP) | 2007-04-12 | — | — | WO | claimed |
| US-20070077782-A1 | Treatment of low dielectric constant films using a batch processing system | TOKYO ELECTRON LIMITED (JP) | 2007-04-05 | — | — | US | claimed |
| US-20070077353-A1 | Plasma-assisted vapor phase treatment of low dielectric constant films using a batch processing system | TOKYO ELECTRON LIMITED (JP) | 2007-04-05 | — | — | US | claimed |
| US-20070077781-A1 | Plural treatment step process for treating dielectric films | TOKYO ELECTRON LIMTED (JP) | 2007-04-05 | — | — | US | claimed |
| WO-2006091264-A1 | METHOD AND SYSTEM FOR TREATING A DIELECTRIC FILM | TOKYO ELECTRON LIMITED (JP) | 2006-08-31 | — | — | WO | claimed |
| US-20050215072-A1 | Method and system for treating a dielectric film | TOKYO ELECTRON LIMITED (JP) | 2005-09-29 | — | — | US | claimed |
| EP-3935114-B1 | PROTECTIVE COATING COMPOSITION AND COATED METALLIC SUBSTRATE COMPRISING SAME | MOMENTIVE PERFORMANCE MAT INC (US) | 2025-07-16 | — | — | EP | disclosed |
| US-11939490-B2 | Curable surface-protective coating composition, processes for its preparation and application to a metallic substrate and resulting coated metallic substrate | MOMENTIVE PERFORMANCE MATERIALS INC. (US) | 2024-03-26 | — | — | US | disclosed |
| CN-113692432-B | Protective coating composition and coated metal substrate comprising the same | 迈图高新材料公司 | 2023-10-20 | — | — | CN | disclosed |
| US-6461419-B1 | Curable inkjet printable ink compositions | 3M INNOVATIVE PROPERTIES COMPANY | 2002-10-08 | — | — | US | disclosed |
| EP-1238024-A1 | CURABLE INKJET PRINTABLE INK COMPOSITIONS | 3M Innovative Properties Company (US) | 2002-09-11 | — | — | EP | disclosed |
| WO-2001032789-A1 | CURABLE INKJET PRINTABLE INK COMPOSITIONS | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2001-05-10 | — | — | WO | disclosed |
| US-5302734-A | Pyrolysis of alkoxytrisilaalkanes | KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) | 1994-04-12 | — | — | US | disclosed |