Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.43 |
| ▸ | MEN1 | O00255 | 3/20 | 0.43 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.43 |
| ▸ | ATM | Q13315 | 2/20 | 0.42 |
| ▸ | TSHR | P16473 | 2/20 | 0.42 |
| ▸ | MAPT | P10636 | 2/20 | 0.42 |
| ▸ | HTT | P42858 | 2/20 | 0.42 |
| ▸ | RECQL | P46063 | 1/20 | 0.42 |
| ▸ | LMNA | P02545 | 3/20 | 0.39 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.39 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.38 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.37 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.37 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10637349 | 0.89 | ALDH1A1 (0.50) | ALDH1A1MEN1KMT2AATMTSHR | |
| SCHEMBL1131131 | 0.86 | GAA (0.47) | ALDH1A1MEN1KMT2AATMTSHR | |
| SCHEMBL8795 | 0.83 | CYP1A2 (0.52) | ALDH1A1MEN1KMT2AATMTSHR | |
| SCHEMBL329816 | 0.83 | LMNA (0.35) | ALDH1A1MEN1KMT2AATMTSHR | |
| SCHEMBL1531434 | 0.83 | LMNA (0.36) | ALDH1A1MEN1KMT2AATMTSHR | |
| SCHEMBL1576395 | 0.83 | TSHR (0.44) | ALDH1A1MEN1KMT2AATMTSHR | |
| SCHEMBL11779440 | 0.83 | ALDH1A1 (0.35) | ALDH1A1MEN1KMT2AATMTSHR | |
| SCHEMBL8943512 | 0.83 | ALDH1A1 (0.35) | ALDH1A1MEN1KMT2AATMTSHR | |
| SCHEMBL11110111 | 0.80 | ALDH1A1 (0.33) | ALDH1A1MEN1KMT2AATMTSHR | |
| SCHEMBL5026448 | 0.80 | ALDH1A1 (0.33) | ALDH1A1MEN1KMT2AATMTSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 327 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-109399991-B | Method for preparing telechelic polycarboxylic acid water reducer | 江苏博西瑞新材料科技有限公司 | 2021-03-02 | — | — | CN | claimed |
| CN-109399991-A | A method of preparing distant pawl poly carboxylic acid series water reducer | 江苏博西瑞新材料科技有限公司 | 2019-03-01 | — | — | CN | claimed |
| CN-104199261-A | Composition useful for removal of post-etch photoresist and bottom anti-reflection coatings | ADVANCED TECH MATERIALS | 2014-12-10 | — | — | CN | claimed |
| EP-2121605-B1 | PROCESS FOR PREPARING (1R,2S,5S)-N-[(1S)-3-AMINO-1-(CYCLOBUTYLMETHYL)-2,3-DIOXOPROPYL]-3-[(2S)-2-[[[(1,1-DIMETHYLETHYL)AMINO]-CARBONYL]AMINO]-3,3-DIMETHYL-1-OXOBUTYL]-6,6-DIMETHYL-3-AZABICYCLO[3.1.0]HEXANE-2-CARBOXAMIDE | MERCK SHARP & DOHME (US) | 2013-11-20 | — | — | EP | claimed |
| CN-101611000-B | Process for preparing (1r,2s,5s)-n-[(1s)-3-amino-1-(cyclobutylmethyl)-2,3-dioxopropyl]-3-[(2s)-2-[[[(1,1-dimethylethyl)amino]-carbonyl]amino]-3,3-dimethyl-1-oxobutyl]-6,6-dimethyl-3-azabicyclo[3.1.0]hexane-2-carboxamide | MERCK SHARP & DOHME | 2013-08-21 | — | — | CN | claimed |
| EP-2482134-A2 | Composition useful for removal of post-etch photoresist and bottom anti-reflection coatings | Advanced Technology Materials, Inc. (US) | 2012-08-01 | — | — | EP | claimed |
| US-8163937-B2 | Process for preparing (1R,2S,5S)-N-[(1S)-3-amino-1-(cyclobutylmethyl)-2,3-dioxopropyl]-3-[(2S)-2-[[[(1,1-dimethylethyl)amino]-carbonyl]amino]-3,3-dimethyl-1-oxobutyl]-6,6-dimethyl-3-azabicyclo[3.1.0]hexane-2-carboxamide | SCHERING CORPORATION (US) | 2012-04-24 | — | — | US | claimed |
| US-7994108-B2 | Composition useful for removal of post-etch photoresist and bottom anti-reflection coatings | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2011-08-09 | — | — | US | claimed |
| US-7867294-B2 | Triazine compounds for removing acids and water from nonaqueous electrolytes for electrochemical cells | NOVOLYTE TECHNOLOGIES INC. (US) | 2011-01-11 | — | — | US | claimed |
| US-20100192363-A1 | Triazine Compounds For Removing Acids And Water From Nonaqueous Electrolytes For Electrochemical Cells | FERRO CORPORATION (US) | 2010-08-05 | — | — | US | claimed |
| CN-101137939-A | Composition suitable for removing post-etch photoresist and bottom antireflective coating | ADVANCED TECH MATERIALS (US) | 2008-03-05 | — | — | CN | claimed |
| EP-1844367-A1 | COMPOSITION USEFUL FOR REMOVAL OF POST-ETCH PHOTORESIST AND BOTTOM ANTI-REFLECTION COATINGS | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2007-10-17 | — | — | EP | claimed |
| US-20060269844-A1 | Triazine compounds for removing acids and water from nonaqueous electrolytes for electrochemical cells | FERRO CORPORATION (US) | 2006-11-30 | — | — | US | claimed |
| US-20060154186-A1 | Composition useful for removal of post-etch photoresist and bottom anti-reflection coatings | ADVANCED TECHNOLOGY MATERIALS, INC. | 2006-07-13 | — | — | US | claimed |
| WO-2006074316-A1 | COMPOSITION USEFUL FOR REMOVAL OF POST-ETCH PHOTORESIST AND BOTTOM ANTI-REFLECTION COATINGS | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2006-07-13 | — | — | WO | claimed |
| US-6833454-B1 | Chemical compounds containing bis(triazolo)triazine structures and methods thereof | THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE NAVY | 2004-12-21 | — | — | US | claimed |
| EP-0397474-B1 | Photosensitive composition | TOSHIBA KK (JP) | 1997-12-10 | — | — | EP | claimed |
| US-4240920-A | A SURFACTANT, A PEROXY BLEACH AND A PORPHINE BLEACH | THE PROCTER & GAMBLE COMPANY (US) | 1980-12-23 | — | — | US | claimed |
| US-4001177-A | Flame-retarding polyamide composition | TORAY INDUSTRIES, INC. (JA) | 1977-01-04 | — | — | US | claimed |
| US-3980616-A | Flameproofing agent for polyamide resins | MITSUBISHI CHEMICAL INDUSTRIES LTD. (JA) | 1976-09-14 | — | — | US | claimed |