SCHEMBL331628

SCHEMBL331628

CCO[Si](C[Si](C)(C)C)(OCC)OCC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28345 0.83 LMNA (0.32)
SCHEMBL977222 0.79
SCHEMBL12458695 0.79
SCHEMBL30892606 0.77
SCHEMBL14028043 0.76
SCHEMBL3623774 0.75
SCHEMBL9676295 0.75
SCHEMBL331510 0.73
SCHEMBL30892618 0.73
SCHEMBL3420286 0.73

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240182606-A1 METHOD FOR PRODUCING PROPYLENE COPOLYMER USING CATALYST SYSTEM HAVING IMPROVED COPOLYMERIZATION ACTIVITY HANWHA TOTALENERGIES PETROCHEMICAL CO., LTD. (KR) 2024-06-06 US disclosed
CN-118063652-A Process for producing propylene copolymers using catalyst systems with improved copolymerization activity 韩华道达尔能源有限公司 2024-05-24 CN disclosed
US-8951711-B2 Patterning process and composition for forming silicon-containing film usable therefor SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-02-10 US disclosed
US-20140342289-A1 PATTERNING PROCESS AND COMPOSITION FOR FORMING SILICON-CONTAINING FILM USABLE THEREFOR SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-11-20 US disclosed
US-8835102-B2 Patterning process and composition for forming silicon-containing film usable therefor SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-09-16 US disclosed
US-8779277-B2 Light energy conversion material KABUSHIKI KAISHA TOYOTA CHUO KENKYUSHO (JP) 2014-07-15 US disclosed
US-20120276483-A1 PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-11-01 US disclosed
US-20120238095-A1 PATTERNING PROCESS AND COMPOSITION FOR FORMING SILICON-CONTAINING FILM USABLE THEREFOR SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-09-20 US disclosed
US-20120181163-A1 LIGHT ENERGY CONVERSION MATERIAL KABUSHIKI KAISHA TOYOTA CHUO KENKYUSHO (JP) 2012-07-19 US disclosed
US-8097745-B2 Method of producing organosilicon compound JSR CORPORATION (JP) 2012-01-17 US disclosed
US-20110082309-A1 METHOD OF PRODUCING ORGANOSILICON COMPOUND JSR CORPORATION (JP) 2011-04-07 US disclosed
US-7619048-B2 Method for producing propylene polymer using alkoxysilane compound containing trialkysilyl group in molecular structure SAMSUNG TOTAL PETROCHEMICALS CO., LTD. (KR) 2009-11-17 US disclosed
CN-100503662-C Method for producing propylene polymer using alkoxysilane compound SAMSUNG TOTAL PETROCHEMICALS (KR) 2009-06-24 CN disclosed
US-20070078240-A1 METHOD FOR PRODUCING PROPYLENE POLYMER USING ALKOXYSILANE COMPOUND CONTAINING TRIALKYLSILYL GROUP IN MOLECULAR STRUCTURE HANWHA TOTALENERGIES PETROCHEMICAL CO., LTD. (KR) 2007-04-05 US disclosed
CN-1939939-A Method for producing propylene polymer using alkoxysilane compound containing trialkylsilyl group in molecular structure SAMSUNG TOTAL PETROCHEMICALS (KR) 2007-04-04 CN disclosed