SCHEMBL977222

SCHEMBL977222

CCO[Si](C)(C[Si](OCC)(OCC)OCC)OCC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL332696 0.84
SCHEMBL7135810 0.83
SCHEMBL28345 0.81 LMNA (0.32)
SCHEMBL3623774 0.79
SCHEMBL331628 0.79
SCHEMBL12458695 0.77
SCHEMBL12458696 0.77
SCHEMBL183066 0.74
SCHEMBL13089274 0.74
SCHEMBL12898440 0.72

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 212 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250304819-A1 Flexible and foldable abrasion resistant photopatternable siloxane hard coat OPTITUNE OY (FI) 2025-10-02 US claimed
US-11634610-B2 Siloxane polymer compositions and their use OPTITUNE OY (FI) 2023-04-25 US claimed
US-20220010172-A1 SILOXANE POLYMER COMPOSITIONS AND THEIR USE OPTITUNE OY (FI) 2022-01-13 US claimed
US-11127864-B2 Carbosiloxane polymer compositions, methods of producing the same and the use thereof OPTITUNE OY (FI) 2021-09-21 US claimed
US-20210087429-A1 Flexible and foldable abrasion resistant photopatternable siloxane hard coat OPTITUNE OY (FI) 2021-03-25 US claimed
EP-3775075-A1 FLEXIBLE AND FOLDABLE ABRASION RESISTANT PHOTOPATTERNABLE SILOXANE HARD COAT Optitune Oy (FI) 2021-02-17 EP claimed
WO-2019193258-A1 FLEXIBLE AND FOLDABLE ABRASION RESISTANT PHOTOPATTERNABLE SILOXANE HARD COAT OPTITUNE OY (FI) 2019-10-10 WO claimed
US-10170297-B2 Compositions and methods using same for flowable oxide deposition VERSUM MATERIALS US, LLC (US) 2019-01-01 US claimed
US-20180277691-A1 Novel carbosiloxane polymer compositions, methods of producing the same and the use thereof OPTITUNE OY (FI) 2018-09-27 US claimed
US-20180066159-A1 SILOXANE POLYMER COMPOSITIONS AND THEIR USE BASF SE (DE) 2018-03-08 US claimed
EP-3271756-A2 NOVEL CARBOSILOXANE POLYMER COMPOSITIONS, METHODS OF PRODUCING THE SAME AND THE USE THEREOF Optitune Oy (FI) 2018-01-24 EP claimed
WO-2016146896-A1 NOVEL SILOXANE POLYMER COMPOSITIONS AND THEIR USE OPTITUNE OY (FI) 2016-09-22 WO claimed
US-20150056822-A1 COMPOSITIONS AND METHODS USING SAME FOR FLOWABLE OXIDE DEPOSITION AIR PRODUCTS AND CHEMICALS, INC. (US) 2015-02-26 US claimed
EP-2840164-A1 Compositions and methods using same for flowable oxide deposition AIR PRODUCTS AND CHEMICALS, INC. (US) 2015-02-25 EP claimed
US-20130243968-A1 CATALYST SYNTHESIS FOR ORGANOSILANE SOL-GEL REACTIONS AIR PRODUCTS AND CHEMICALS, INC. (US) 2013-09-19 US claimed
EP-2639331-A2 Catalyst synthesis for organosilane sol-gel reactions AIR PRODUCTS AND CHEMICALS, INC. (US) 2013-09-18 EP claimed
US-7932295-B2 Organic silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device JSR CORPORATION (JP) 2011-04-26 US claimed
US-7875317-B2 formed by hydrolyzing and condensing a siloxy compound in the presence of a polycarbosilane; low relative dielectric constant and excellent mechanical strength, storage stability, and chemical resistance; semiconductors JSR CORPORATION (JP) 2011-01-25 US claimed
US-20080246153-A1 ORGANIC SILICA-BASED FILM, METHOD OF FORMING THE SAME, COMPOSITION FOR FORMING INSULATING FILM FOR SEMICONDUCTOR DEVICE, INTERCONNECT STRUCTURE, AND SEMICONDUCTOR DEVICE JSR CORPORATION (JP) 2008-10-09 US claimed
US-7399715-B2 Organic silica-based film, method of forming the same, composition for forming insulating film for semiconductor device, interconnect structure, and semiconductor device JSR CORPORATION (JP) 2008-07-15 US claimed