Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of Propylene Glycol. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.59 |
| ▸ | TSHR | P16473 | 5/20 | 0.37 |
| ▸ | LMNA | P02545 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.35 |
| ▸ | OR51E2 | Q9H255 | 1/20 | 0.35 |
| ▸ | TP53 | P04637 | 1/20 | 0.33 |
| ▸ | MGAM | O43451 | 1/20 | 0.33 |
| ▸ | GAA | P10253 | 1/20 | 0.33 |
| ▸ | SI | P14410 | 1/20 | 0.33 |
| ▸ | MGAM2 | Q2M2H8 | 1/20 | 0.33 |
| ▸ | TGFBR1 | P36897 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Propylene Glycol SCHEMBL58534 | 0.92 | TDP1 (0.56) | TDP1TSHRALDH1A1OR51E2TP53 | |
| Propylene Glycol SCHEMBL28102165 | 0.92 | TDP1 (0.56) | TDP1TSHRALDH1A1OR51E2TP53 | |
| Propylene Glycol SCHEMBL28261417 | 0.92 | TDP1 (0.56) | TDP1TSHRALDH1A1OR51E2TP53 | |
| Propylene Glycol SCHEMBL2538043 | 0.91 | — | — | |
| Propylene Glycol SCHEMBL28329231 | 0.89 | TDP1 (0.53) | TDP1TSHRALDH1A1OR51E2TP53 | |
| Propylene Glycol SCHEMBL28277884 | 0.89 | TDP1 (0.53) | TDP1TSHRLMNAALDH1A1OR51E2 | |
| Propylene Glycol SCHEMBL14685915 | 0.89 | ALDH1A1 (0.53) | TDP1TSHRLMNAALDH1A1OR51E2 | |
| Propylene Glycol SCHEMBL28119019 | 0.89 | TDP1 (0.53) | TDP1TSHRALDH1A1OR51E2TP53 | |
| Propylene Glycol SCHEMBL28400237 | 0.88 | TDP1 (0.59) | TDP1TSHRALDH1A1OR51E2TP53 | |
| Propylene Glycol SCHEMBL20478 | 0.87 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9069256-B2 | Method of optical fabrication of three-dimensional polymeric structures with out of plane profile control | CARNEGIE MELLON UNIVERSITY (US) | 2015-06-30 | — | — | US | disclosed |
| US-8642991-B2 | Photosensitive quantum dot, composition comprising the same and method of forming quantum dot-containing pattern using the composition | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2014-02-04 | — | — | US | disclosed |
| US-8609013-B2 | Method of fabricating a microfabricated structure | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2013-12-17 | — | — | US | disclosed |
| US-8445178-B2 | Composition for radical polymerization and method of forming pattern using the composition | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2013-05-21 | — | — | US | disclosed |
| US-20120264065-A1 | Method of Optical Fabrication of Three-Dimensional Polymeric Structures With Out of Plane Profile Control | CARNEGIE MELLON UNIVERSITY | 2012-10-18 | — | — | US | disclosed |
| US-8192922-B2 | Method of optical fabrication of three-dimensional polymeric structures with out of plane profile control | CARNEGIE MELLON UNIVERSITY (US) | 2012-06-05 | — | — | US | disclosed |
| US-20100323298-A1 | Photosensitive composition, microfabrication method using the same, and microfabricated structure thereof | PARK JONG JIN | 2010-12-23 | — | — | US | disclosed |
| US-7803514-B2 | Photosensitive composition, microfabrication method using the same, and microfabricated structure thereof | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2010-09-28 | — | — | US | disclosed |
| US-20100117110-A1 | Photosensitive Quantum Dot, Composition Comprising the Same and Method of Forming Quantum Dot-Containing Pattern Using the Composition | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2010-05-13 | — | — | US | disclosed |
| US-20100119976-A1 | COMPOSITION FOR RADICAL POLYMERIZATION AND METHOD OF FORMING PATTERN USING THE COMPOSITION | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2010-05-13 | — | — | US | disclosed |
| US-20090233241-A1 | Method of Optical Fabrication of Three-Dimensional Polymeric Structures With Out of Plane Profile Control | CARNEGIE MELLON UNIVERSITY | 2009-09-17 | — | — | US | disclosed |
| US-20090206520-A1 | Photosensitive composition, microfabrication method using the same, and microfabricated structure thereof | SAMSUNG ELECTRONICS CO., LTD. | 2009-08-20 | — | — | US | disclosed |
| US-20090073349-A1 | THREE-DIMENSIONAL MICROFABRICATION METHOD USING PHOTOSENSITIVE NANOCRYSTALS AND DISPLAY DEVICE | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2009-03-19 | — | — | US | disclosed |
| WO-2007041508-A2 | METHOD OF OPTICAL FABRICATION OF THREE-DIMENSIONAL POLYMERIC STRUCTURES WITH OUT OF PLANE PROFILE CONTROL | CARNEGIE MELLON UNIVERSITY (US) | 2007-04-12 | — | — | WO | disclosed |
| US-5798409-A | CURED POLYURETHANE COATING EXHIBIT HIGH DAMPING, EXCELLENT SCRATCH-RESISTANCE; TWO PART REACTIVE | MINNESOTA MINING & MANUFACTURING COMPANY (US) | 1998-08-25 | — | — | US | disclosed |
| EP-0784641-A1 | REACTIVE TWO-PART POLYURETHANE COMPOSITIONS AND OPTIONALLY SELF-HEALABLE AND SCRATCH-RESISTANT COATINGS PREPARED THEREFROM | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1997-07-23 | — | — | EP | disclosed |
| WO-1996010595-A1 | REACTIVE TWO-PART POLYURETHANE COMPOSITIONS AND OPTIONALLY SELF-HEALABLE AND SCRATCH-RESISTANT COATINGS PREPARED THEREFROM | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1996-04-11 | — | — | WO | disclosed |