Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of Propylene Glycol. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.56 |
| ▸ | OR51E2 | Q9H255 | 1/20 | 0.39 |
| ▸ | FFAR3 | O14843 | 1/20 | 0.39 |
| ▸ | LCK | P06239 | 1/20 | 0.39 |
| ▸ | FYN | P06241 | 1/20 | 0.39 |
| ▸ | TP53 | P04637 | 1/20 | 0.38 |
| ▸ | TGFBR1 | P36897 | 1/20 | 0.35 |
| ▸ | TSHR | P16473 | 3/20 | 0.35 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.33 |
| ▸ | AKR1B1 | P15121 | 1/20 | 0.33 |
| ▸ | MME | P08473 | 1/20 | 0.32 |
| ▸ | PDE4A | P27815 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Propylene Glycol SCHEMBL28102165 | 1.00 | TDP1 (0.56) | TDP1OR51E2FFAR3LCKFYN | |
| Propylene Glycol SCHEMBL28261417 | 1.00 | TDP1 (0.56) | TDP1OR51E2FFAR3LCKFYN | |
| Propylene Glycol SCHEMBL28119019 | 0.97 | TDP1 (0.53) | TDP1OR51E2FFAR3LCKFYN | |
| Propylene Glycol SCHEMBL28277884 | 0.97 | TDP1 (0.53) | TDP1OR51E2FFAR3LCKFYN | |
| Propylene Glycol SCHEMBL28329231 | 0.97 | TDP1 (0.53) | TDP1OR51E2FFAR3LCKFYN | |
| Propylene Glycol SCHEMBL2481279 | 0.95 | TDP1 (0.50) | TDP1OR51E2FFAR3LCKFYN | |
| Propylene Glycol SCHEMBL29254418 | 0.93 | TDP1 (0.48) | TDP1OR51E2FFAR3LCKFYN | |
| Propylene Glycol SCHEMBL28400237 | 0.92 | TDP1 (0.59) | TDP1OR51E2TP53TGFBR1TSHR | |
| Propylene Glycol SCHEMBL3316533 | 0.92 | TDP1 (0.59) | TDP1OR51E2TP53TGFBR1TSHR | |
| Propylene Glycol SCHEMBL49092 | 0.91 | TDP1 (0.67) | TDP1OR51E2FFAR3LCKFYN |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 62101 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260146159-A1 | Random Copolymer | HighRI Optics, Inc. (US) | 2026-05-28 | — | — | US | claimed |
| US-20260147279-A1 | DEVELOPER COMPOSITION FOR METAL-CONTAINING PHOTORESIST, AND METHOD OF FORMING PATTERNS INCLUDING DEVELOPING METHOD USING THE COMPOSITION | SAMSUNG SDI CO., LTD. (KR) | 2026-05-28 | — | — | US | claimed |
| CN-122080041-A | Negative photoresist composition and application thereof | — | 2026-05-26 | — | — | CN | claimed |
| CN-121500673-B | Double-coordination cyclic hexanuclear tin oxygen cluster compound, photoresist composition and application thereof in lithography | DALIAN UNIVERSITY OF TECHNOLOGY (CN) | 2026-05-26 | — | — | CN | claimed |
| CN-122080775-A | High-durability anticorrosive paint and preparation process thereof | — | 2026-05-26 | — | — | CN | claimed |
| US-12637584-B2 | Waterborne polyurethane-epoxy resin based primer composition and its preparation method thereof | BASF COATINGS GMBH (DE) | 2026-05-26 | — | — | US | claimed |
| CN-122080295-A | Method for reducing residual monomer and metal impurities in photoresist resin | — | 2026-05-26 | — | — | CN | claimed |
| CN-122080355-A | Polyurea hydrogel film and preparation method thereof | — | 2026-05-26 | — | — | CN | claimed |
| CN-122080704-A | Primer for nylon and polyphenyl ether composite material and preparation method thereof | — | 2026-05-26 | — | — | CN | claimed |
| CN-122080762-A | Self-repairing polyurethane composition and preparation method thereof | — | 2026-05-26 | — | — | CN | claimed |
| US-4806458-A | Composition containing a mixture of hexa-alkyl disilazane and propylene glycol alkyl ether and/or propylene glycol alkyl ether acetate | HOECHST CELANESE CORPORATION (US) | 1989-02-21 | — | — | US | claimed |
| US-4777230-A | HIGH SOLID COATINGS | PENNWALT CORPORATION (US) | 1988-10-11 | — | — | US | claimed |
| EP-0273090-A1 | Solution polymerization of acrylic acid derived monomers using tertiary alkyl( C5)-hydroperoxides | ATOCHEM NORTH AMERICA, INC. (a Pennsylvania corp.) (US) | 1988-07-06 | — | — | EP | claimed |
| US-4737883-A | Keyboard for electrical devices | ILLINOIS TOOL WORKS INC. (US) | 1988-04-12 | — | — | US | claimed |
| EP-0260994-A2 | Process for producing integrated circuit | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1988-03-23 | — | — | EP | claimed |
| US-4732836-A | SOLUTION STABILITY PHENOLIC COMPOUNDS CONDENSED WITH QUINONES | HOECHST CELANESE CORPORATION (US) | 1988-03-22 | — | — | US | claimed |
| US-4732837-A | Novel mixed ester O-quinone photosensitizers | HOECHST CELANESE CORPORATION (US) | 1988-03-22 | — | — | US | claimed |
| US-4621042-A | O-CRESOL NOVOLAC RESIN | RCA CORPORATION (US) | 1986-11-04 | — | — | US | claimed |
| US-4596763-A | Coating novolak resin and naphthoquinone diazide sensitizer onto substrate, exposing to ultraviolet radiation | AMERICAN HOECHST CORPORATION (US) | 1986-06-24 | — | — | US | claimed |
| US-4550069-A | PHOTOSPEED INCREASED | AMERICAN HOECHST CORPORATION (US) | 1985-10-29 | — | — | US | claimed |