Phthalic Acid

Phthalic Acid

SCHEMBL3317643

C=C(C)C(=O)OCCC.C=C(C)C(=O)OCCC.O=C(O)c1ccccc1C(=O)O

nearest known ligand 0.54

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.54
GAA P10253 1/20 0.51
SMN1; SMN2 Q16637 1/20 0.51
TSHR P16473 6/20 0.49
LMNA P02545 3/20 0.49
TDP1 Q9NUW8 3/20 0.48
POLB P06746 1/20 0.48
APEX1 P27695 1/20 0.48
HTT P42858 1/20 0.48
THRB P10828 1/20 0.46
ALOX15 P16050 1/20 0.45
L3MBTL1 Q9Y468 1/20 0.44
TP53 P04637 1/20 0.42
CYP3A4 P08684 1/20 0.42
MAPK1 P28482 1/20 0.42
MAPK8 P45983 1/20 0.41
KDM4E B2RXH2 2/20 0.41
ESR1 P03372 1/20 0.41
ITGB3 P05106 1/20 0.41
ITGA2B P08514 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Phthalic Acid SCHEMBL4599263 0.92 TDP1 (0.51) ALDH1A1TSHRTDP1POLBAPEX1
Phthalic Acid SCHEMBL27969186 0.89 ALDH1A1 (0.56) ALDH1A1GAASMN1; SMN2TSHRLMNA
Benzoic Acid SCHEMBL23114213 0.87 POLB (0.58) ALDH1A1GAASMN1; SMN2TSHRLMNA
Phthalic Acid SCHEMBL17184272 0.87 TDP1 (0.48) ALDH1A1TSHRTDP1POLBAPEX1
Phthalic Acid SCHEMBL11794686 0.87 TDP1 (0.48) ALDH1A1TSHRTDP1POLBAPEX1
Phthalic Acid SCHEMBL30229511 0.87 TDP1 (0.48) ALDH1A1TSHRTDP1POLBAPEX1
Phthalic Acid SCHEMBL477948 0.87 THRB (0.54) ALDH1A1SMN1; SMN2TSHRLMNATDP1
Phthalic Acid SCHEMBL5590803 0.87 THRB (0.54) ALDH1A1SMN1; SMN2TSHRLMNATDP1
Phthalic Acid SCHEMBL434168 0.87 TDP1 (0.48) ALDH1A1TSHRTDP1POLBAPEX1
Phthalic Acid SCHEMBL674394 0.87 ALDH1A1 (0.54) ALDH1A1GAATSHRLMNATDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024029176-A1 PHOTOCURABLE INKJET INK COMPOSITION KJケミカルズ株式会社 2024-02-08 WO disclosed
WO-2024010042-A1 PRESSURE-SENSITIVE ADHESIVE AND PRESSURE-SENSITIVE ADHESIVE SHEET 日東電工株式会社 2024-01-11 WO disclosed
WO-2024010041-A1 ADHESIVE AND ADHESIVE SHEET 日東電工株式会社 2024-01-11 WO disclosed
WO-2023013400-A1 ADHESIVE AND ADHESIVE SHEET 日東電工株式会社 2023-02-09 WO disclosed
WO-2023013399-A1 ADHESIVE COMPOSITION AND ADHESIVE SHEET 日東電工株式会社 2023-02-09 WO disclosed
US-8414979-B2 Radiation-curable resin composition, radiation-curable coating material, and method for forming protective layer DIC CORPORATION (JP) 2013-04-09 US disclosed
US-8378002-B2 Aqueous ink composition, aqueous ink composition for inkjet recording, and inkjet recording method FUJIFILM CORPORATION (JP) 2013-02-19 US disclosed
US-20120223272-A1 INFRARED LIGHT-REFLECTING FILM AND PRODUCTION METHOD THEREOF FUJIFILM CORPORATION (JP) 2012-09-06 US disclosed
US-20100104765-A1 RADIATION-CURABLE RESIN COMPOSITION, RADIATION-CURABLE COATING MATERIAL, AND METHOD FOR FORMING PROTECTIVE LAYER DIC CORPORATION (JP) 2010-04-29 US disclosed
US-20100015360-A1 AQUEOUS INK COMPOSITION, AQUEOUS INK COMPOSITION FOR INKJET RECORDING, AND INKJET RECORDING METHOD FUJIFILM CORPORATION (JP) 2010-01-21 US disclosed
EP-2145932-A1 Aqueous ink composition, aqueous ink composition for inkjet recording, and inkjet recording method Fujifilm Corporation (JP) 2010-01-20 EP disclosed
EP-2133374-A1 ACTIVE ENERGY RAY-CURABLE RESIN COMPOSITION, ACTIVE ENERGY RAY-CURABLE COATING MATERIAL, AND METHOD FOR FORMING PROTECTIVE LAYER DIC Corporation (JP) 2009-12-16 EP disclosed
US-5763048-A PROTECTIVE LAYER OF CURED RESIN CONTAINING POLYCARBONATE RESIN PARTICLES; WEAR RESISTANCE DAI NIPPON PRINTING CO., LTD. (JP) 1998-06-09 US disclosed