SCHEMBL3324734

SCHEMBL3324734

CCN(CC)c1cccc(C(=O)O)c1CCC(C)C

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TP53 P04637 1/20 0.39
HTT P42858 1/20 0.39
ALDH1A1 P00352 5/20 0.37
KMT2A Q03164 4/20 0.37
MEN1 O00255 3/20 0.37
KDM4E B2RXH2 2/20 0.37
HSD17B10 Q99714 2/20 0.37
SMN1; SMN2 Q16637 1/20 0.37
L3MBTL1 Q9Y468 1/20 0.37
BRS3 P32247 1/20 0.36
TDP1 Q9NUW8 1/20 0.36
PTPN1 P18031 2/20 0.34
ABCC1 P33527 1/20 0.34
SCN1A P35498 1/20 0.33
SCN2A Q99250 1/20 0.33
SCN3A Q9NY46 1/20 0.33
HCAR3 P49019 1/20 0.33
NR1I2 O75469 1/20 0.33
CYP2C9 P11712 1/20 0.33
IDO1 P14902 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2457499 0.85 ALDH1A1 (0.42) TP53HTTALDH1A1KDM4EHSD17B10
SCHEMBL27475388 0.83 ALDH1A1 (0.45) HTTALDH1A1KDM4EHSD17B10BRS3
SCHEMBL43873 0.82 TP53 (0.44) TP53HTTALDH1A1KMT2AMEN1
SCHEMBL3324739 0.78 CLCN2 (0.39) TP53HTTALDH1A1KMT2AMEN1
SCHEMBL30274134 0.77 TP53 (0.45) TP53HTTALDH1A1KMT2AMEN1
SCHEMBL4608098 0.76 CYP1A2 (0.41) ALDH1A1KDM4EHSD17B10SMN1; SMN2BRS3
SCHEMBL29171181 0.76 PRNP (0.41) HTTALDH1A1KMT2AKDM4EHSD17B10
SCHEMBL1668024 0.74 TP53 (0.53) TP53HTTALDH1A1KMT2AMEN1
SCHEMBL31339541 0.73 ALDH1A1 (0.52) TP53HTTALDH1A1KMT2AMEN1
SCHEMBL11522678 0.73 TP53 (0.45) TP53HTTALDH1A1KMT2AMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2022064917-A1 CURED PRODUCT PRODUCTION METHOD, LAMINATE PRODUCTION METHOD, AND SEMICONDUCTOR DEVICE PRODUCTION METHOD 富士フイルム株式会社 2022-03-31 WO disclosed
EP-2131423-B1 NEGATIVE ELECTRODE BASE MEMBER TOKYO OHKA KOGYO CO LTD (JP) 2017-11-15 EP disclosed
US-9105929-B2 Negative electrode base member TOKYO OHKA KOGYO CO., LTD. (JP) 2015-08-11 US disclosed
US-8927147-B2 Negative electrode base member KANTO GAKUIN SCHOOL CORPORATION (JP) 2015-01-06 US disclosed
EP-2472655-B1 Negative electrode base member TOKYO OHKA KOGYO CO LTD (JP) 2014-03-12 EP disclosed
US-8551651-B2 Secondary cell having negative electrode base member TOKYO OHKA KOGYO CO., LTD. (JP) 2013-10-08 US disclosed
US-20130252098-A1 NEGATIVE ELECTRODE BASE MEMBER KANTO GAKUIN UNIVERSITY SURFACE ENGINEERING RESEARCH INSTITUTE (JP) 2013-09-26 US disclosed
US-20130252099-A1 NEGATIVE ELECTRODE BASE MEMBER KANTO GAKUIN UNIVERSITY SURFACE ENGINEERING RESEARCH INSTITUTE (JP) 2013-09-26 US disclosed
EP-2472655-A1 Negative electrode base member Tokyo Ohka Kogyo Co., Ltd. (JP) 2012-07-04 EP disclosed
US-20100119939-A1 NEGATIVE ELECTRODE BASE MEMBER TOKYO OHKA KOGYO CO., LTD. (JP) 2010-05-13 US disclosed
EP-2131423-A1 NEGATIVE ELECTRODE BASE MEMBER Tokyo Ohka Kogyo Co., Ltd. (JP) 2009-12-09 EP disclosed
EP-0678563-B1 Active-energy-ray-curable coating composition MITSUBISHI CHEM CORP (JP) 1997-07-23 EP disclosed
US-5565501-A ACRYLIC POLYMER; WEAR RESISTANCE MITSUBISHI CHEMICAL CORPORATION (JP) 1996-10-15 US disclosed
EP-0678563-A1 Active-energy-ray-curable coating composition MITSUBISHI CHEMICAL CORPORATION (JP) 1995-10-25 EP disclosed