SCHEMBL3326537

SCHEMBL3326537

CCc1ccc(OC(C)OCCOCc2ccc3ccccc3c2)cc1

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 1/20 0.49
CYP2A6 P11509 1/20 0.49
HTR2A P28223 1/20 0.40
HTR2C P28335 1/20 0.40
HTR2B P41595 1/20 0.40
MAOB P27338 1/20 0.40
TACR1 P25103 2/20 0.39
KDM4E B2RXH2 1/20 0.39
MAPK1 P28482 1/20 0.39
TDP1 Q9NUW8 1/20 0.39
RAB9A P51151 1/20 0.38
SLC1A3 P43003 1/20 0.38
SLC1A2 P43004 1/20 0.38
SLC1A1 P43005 1/20 0.38
PPARG P37231 1/20 0.37
PPARA Q07869 1/20 0.37
REN P00797 3/20 0.37
GABRA1 P14867 1/20 0.36
GABRG2 P18507 1/20 0.36
GABRB3 P28472 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2758482 0.88 SLC7A5 (0.39) CYP1A2CYP2A6HTR2AHTR2CHTR2B
SCHEMBL3321998 0.85 CYP1A2 (0.35) CYP1A2CYP2A6HTR2AKDM4EMAPK1
SCHEMBL3322395 0.83 CYP1A2 (0.44) CYP1A2CYP2A6HTR2AHTR2CHTR2B
SCHEMBL8674823 0.78 CYP1A2 (0.48) CYP1A2CYP2A6KDM4EMAPK1TDP1
SCHEMBL3325906 0.78 PPARA (0.43) TACR1PPARGPPARA
SCHEMBL3325903 0.77 CYP1A2 (0.36) CYP1A2CYP2A6HTR2AHTR2CHTR2B
SCHEMBL3322916 0.77 DRD2 (0.39) CYP1A2CYP2A6KDM4EPPARGPPARA
SCHEMBL25754255 0.77 CYP1A2 (0.55) CYP1A2CYP2A6HTR2AHTR2CHTR2B
SCHEMBL13464380 0.75 CYP1A2 (0.53) CYP1A2CYP2A6HTR2AHTR2CHTR2B
SCHEMBL16594921 0.75 CYP1A2 (0.53) CYP1A2CYP2A6HTR2AHTR2CHTR2B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120003585-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2012-01-05 US disclosed