⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5093293 | 0.85 | — | — | |
| SCHEMBL4808839 | 0.81 | — | — | |
| SCHEMBL16471018 | 0.77 | — | — | |
| SCHEMBL13327528 | 0.77 | — | — | |
| SCHEMBL855803 | 0.77 | — | — | |
| SCHEMBL12854401 | 0.77 | — | — | |
| SCHEMBL9150172 | 0.76 | HSD11B1 (0.32) | — | |
| SCHEMBL853996 | 0.76 | — | — | |
| SCHEMBL10054242 | 0.76 | — | — | |
| SCHEMBL13008684 | 0.76 | KMT2A (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8859187-B2 | Method of forming resist pattern and negative resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-10-14 | — | — | US | disclosed |
| EP-1895576-B1 | PATTERN FORMING METHOD | TOKYO OHKA KOGYO CO LTD (JP) | 2014-07-23 | — | — | EP | disclosed |
| US-8349543-B2 | Pattern-forming method, metal oxide film-forming material and method for using the metal oxide film-forming material | TOKYO OHKA KOGYO CO. LTD. (JP) | 2013-01-08 | — | — | US | disclosed |
| US-8124312-B2 | Method for forming pattern, and material for forming coating film | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-02-28 | — | — | US | disclosed |
| US-8101013-B2 | Film-forming material and method of forming pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-01-24 | — | — | US | disclosed |
| US-8097396-B2 | Reduced defects; improved shape and stability of latent image; comprised of acrylate copolymer having lactone ring and polycyclic ring containing monomers; increased alkali solubility under action of acid generator upon exposure | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-01-17 | — | — | US | disclosed |
| US-8043795-B2 | Method of forming resist pattern | TOKYO OHIKA KOGYO CO., LTD. (JP) | 2011-10-25 | — | — | US | disclosed |
| US-8025923-B2 | Method for manufacturing a structure | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-09-27 | — | — | US | disclosed |
| US-7932013-B2 | Pattern coating material and pattern forming method | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-04-26 | — | — | US | disclosed |
| US-7767378-B2 | Mixing a blend of copolymers of identical structural units but have mutually different measured values for a contact angle; mixing conditions for plurality of copolymers are adjusted so that a measured value of a contact angle for said resist composition is no higher than 40 degrees to avoid defects | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-08-03 | — | — | US | disclosed |
| US-20090134119-A1 | FILM-FORMING MATERIAL AND METHOD OF FORMING PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-05-28 | — | — | US | disclosed |
| US-20090098489-A1 | METHOD FOR FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-04-16 | — | — | US | disclosed |
| US-20090087625-A1 | METHOD FOR MANUFACTURING STRUCTURE, AND STRUCTURE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-04-02 | — | — | US | disclosed |
| US-20090061170-A1 | ANISOTROPIC FILM AND METHOD OF MANUFACTURING ANISOTROPIC FILM | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-03-05 | — | — | US | disclosed |
| US-20090042129-A1 | POSITIVE RESIST COMPOSITION AND METHOD FOR RESIST PATTERN FORMATION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-02-12 | — | — | US | disclosed |
| US-20090029288-A1 | METHOD FOR PRODUCING RESIST COMPOSITION AND RESIST COMPOSITION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-01-29 | — | — | US | disclosed |
| US-20090029284-A1 | PATTERN COATING MATERIAL AND PATTERN FORMING METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-01-29 | — | — | US | disclosed |
| US-20080063974-A1 | Positive Resist Composition and Method for Forming Resist Pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2008-03-13 | — | — | US | disclosed |
| EP-1895576-A1 | PATTERN COATING MATERIAL AND PATTERN FORMING METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2008-03-05 | — | — | EP | disclosed |
| EP-1813990-A1 | METHOD FOR FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2007-08-01 | — | — | EP | disclosed |