⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5408346 | 0.82 | — | — | |
| SCHEMBL5398625 | 0.79 | SPHK1 (0.30) | — | |
| SCHEMBL11391663 | 0.76 | — | — | |
| SCHEMBL11431878 | 0.73 | — | — | |
| SCHEMBL653461 | 0.70 | SLC6A3 (0.36) | — | |
| SCHEMBL21332245 | 0.67 | — | — | |
| SCHEMBL482468 | 0.67 | — | — | |
| SCHEMBL397866 | 0.67 | SLC6A3 (0.31) | — | |
| SCHEMBL5401052 | 0.66 | — | — | |
| SCHEMBL27701401 | 0.64 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1049 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2959342-A1 | PHOTORESIST HAVING POSITIVE RESIST CHARACTERISTICS, PROCESS FOR PHOTOCHEMICAL STRUCTURING THEREOF, PROCESS FOR PREPARING SILANES AND SILICA (HETERO)POLY(CO)CONDENSATES HAVING POSITIVE RESIST CHARACTERISTICS AND SILICA (HETERO)POLY(CO)CONDENSATES | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. (DE) | 2015-12-30 | — | — | EP | claimed |
| US-9126920-B2 | Method for producing 2-isopropylidene-5-methyl-4-hexenyl butyrate | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-09-08 | — | — | US | claimed |
| US-20150119597-A1 | METHOD FOR PRODUCING 2-ISOPROPYLIDENE-5-METHYL-4-HEXENYL BUTYRATE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-04-30 | — | — | US | claimed |
| EP-2114962-B1 | SILATED CYCLIC CORE POLYSULFIDES, THEIR PREPARATION AND USE IN FILLED ELASTOMER COMPOSTIONS | MOMENTIVE PERFORMANCE MAT INC (US) | 2015-02-18 | — | — | EP | claimed |
| EP-2114961-B1 | SILATED CORE POLYSULFIDES, THEIR PREPARATION AND USE IN FILLED ELASTOMER COMPOSITIONS | MOMENTIVE PERFORMANCE MAT INC (US) | 2014-11-26 | — | — | EP | claimed |
| WO-2014128303-A1 | PHOTORESIST HAVING POSITIVE RESIST CHARACTERISTICS, PROCESS FOR PHOTOCHEMICAL STRUCTURING THEREOF, PROCESS FOR PREPARING SILANES AND SILICA (HETERO)POLY(CO)CONDENSATES HAVING POSITIVE RESIST CHARACTERISTICS AND SILICA (HETERO)POLY(CO)CONDENSATES | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. (DE) | 2014-08-28 | — | — | WO | claimed |
| US-8722321-B2 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-05-13 | — | — | US | claimed |
| US-20120276485-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-11-01 | — | — | US | claimed |
| US-20120270159-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-10-25 | — | — | US | claimed |
| US-8188174-B2 | Silated core polysulfides, their preparation and use in filled elastomer compositions | MOMENTIVE PERFORMANCE MATERIALS INC. (US) | 2012-05-29 | — | — | US | claimed |
| EP-1270581-A2 | Blocked mercaptosilane coupling agents for filled rubbers | CROMPTON CORPORATION (US) | 2003-01-02 | — | — | EP | claimed |
| US-6500971-B2 | Ester compounds having alicyclic and oxirane structures and method for preparing the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-12-31 | — | — | US | claimed |
| US-20020160303-A1 | Ether monomers and polymers having multi-ring structures, and photosensitive polymers and resist compositions obtained from the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2002-10-31 | — | — | US | claimed |
| US-20020155379-A1 | Photosensitive monomer, photosensitive polymer and chemically amplified resist composition comprising lactone group having acid-labile protecting group | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2002-10-24 | — | — | US | claimed |
| US-20020099118-A1 | For use in tires, shoe soles | WITCO CORPORATION, A CORPORATION OF THE STATE OF DELAWARE | 2002-07-25 | — | — | US | claimed |
| US-20020055568-A1 | 3-(acylmercapto)propyltrialkoxy- or trihydroxysilane | WITCO CORPORATION | 2002-05-09 | — | — | US | claimed |
| US-20020055564-A1 | Sulfur silane coupling agents which are latent | WITCO CORPORATION | 2002-05-09 | — | — | US | claimed |
| US-20020042016-A1 | Resist composition comprising photosensitive polymer having loctone in its backbone | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2002-04-11 | — | — | US | claimed |
| US-20010024763-A1 | Photosensitive polymer including copolymer of alkyl vinyl ether and resist composition containing the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2001-09-27 | — | — | US | claimed |
| EP-1120689-A2 | Photosensitive copolymers of alkyl vinyl ether and resist compositions containing the same | SAMSUNG ELECTRONICS CO. LTD. (KR) | 2001-08-01 | — | — | EP | claimed |