SCHEMBL482468

SCHEMBL482468

C[C]1CC2CCC1C2

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21332245 1.00
SCHEMBL6560860 0.84
SCHEMBL6560334 0.82
SCHEMBL6560329 0.74
SCHEMBL6559507 0.74
SCHEMBL21332340 0.72 CHRM3 (0.31)
SCHEMBL3765297 0.67 SLC6A3 (0.30)
SCHEMBL2575530 0.67 SLC6A3 (0.33)
SCHEMBL473655 0.67
SCHEMBL5401050 0.67 SLC6A3 (0.30)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1145 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9519215-B2 Composition of matter and molecular resist made therefrom IRRESISTIBLE MATERIALS, LTD (GB) 2016-12-13 US claimed
US-20160246173-A1 Composition of Matter and Molecular Resist Made Therefrom IRRESISTIBLE MATERIALS LTD (GB) 2016-08-25 US claimed
US-9229322-B2 Composition of matter and molecular resist made therefrom IRRESISTIBLE MATERIALS LTD (GB) 2016-01-05 US claimed
US-9126920-B2 Method for producing 2-isopropylidene-5-methyl-4-hexenyl butyrate SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-09-08 US claimed
US-9122156-B2 Composition of matter and molecular resist made therefrom IRRESISTIBLE MATERIALS LTD (GB) 2015-09-01 US claimed
US-20150140489-A1 Composition of Matter and Molecular Resist Made Therefrom IRRESISTIBLE MATERIALS LTD (GB) 2015-05-21 US claimed
US-20150140491-A1 Composition of Matter and Molecular Resist Made Therefrom IRRESISTIBLE MATERIALS LTD (GB) 2015-05-21 US claimed
US-20150119597-A1 METHOD FOR PRODUCING 2-ISOPROPYLIDENE-5-METHYL-4-HEXENYL BUTYRATE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-04-30 US claimed
EP-2202577-B1 Chemically amplified positive resist composition and resist patterning process SHINETSU CHEMICAL CO (JP) 2014-08-27 EP claimed
US-8722321-B2 Patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-05-13 US claimed
US-20010021482-A1 PHOTOSENSITIVE RESIN COMPOSITION AND PATTERNING METHOD USING THE SAME KAICHIRO NAKANO 2001-09-13 US claimed
EP-1120689-A2 Photosensitive copolymers of alkyl vinyl ether and resist compositions containing the same SAMSUNG ELECTRONICS CO. LTD. (KR) 2001-08-01 EP claimed
WO-2001014879-A1 4-UNSUBSTITUTED DIHYDROISOQUINOLINONE DERIVATIVES AND COMBINATORIAL LIBRARIES THEREOF LION BIOSCIENCE AG (DE) 2001-03-01 WO claimed
EP-1078945-A2 Polymer for use in a photoresist composition SAMSUNG ELECTRONICS CO. LTD. (KR) 2001-02-28 EP claimed
US-6194443-B1 Aminophenol derivatives with fungicidal property BAYER AKTIENGESELLSCHAFT (DE) 2001-02-27 US claimed
EP-0934302-A2 AMINOPHENOL DERIVATES BAYER AG (DE) 1999-08-11 EP claimed
US-5869588-A UV ABSORBERS CIBA SPECIALTY CHEMICALS CORPORATION (US) 1999-02-09 US claimed
WO-1998016522-A2 AMINOPHENOL DERIVATES WITH FUNGICIDAL PROPERTY BAYER AKTIENGESELLSCHAFT (DE) 1998-04-23 WO claimed
US-5672704-A ULTRAVIOLET RADIATION STABILIZERS CIBA-GEIGY CORPORATION 1997-09-30 US claimed
US-5538840-A SILVER HALIDE EMULSIONS AND POLYMERS ON SUBSTRATES WITH TRIAZINE PHENOLS CIBA-GEIGY CORPORATION (US) 1996-07-23 US claimed