SCHEMBL3335831

SCHEMBL3335831

CC(C)C1CCCCCCCCC1

nearest known ligand 0.58

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
SHBG P04278 1/20 0.48
EPHX1 P07099 2/20 0.41
TP53 P04637 1/20 0.38
ALDH1A1 P00352 1/20 0.37
HSD17B10 Q99714 1/20 0.37
CA12 O43570 2/20 0.37
CA1 P00915 2/20 0.37
CA2 P00918 2/20 0.37
MMP2 P08253 2/20 0.37
CA9 Q16790 2/20 0.37
KDM4E B2RXH2 1/20 0.36
GMNN O75496 1/20 0.36
LMNA P02545 1/20 0.36
MAPT P10636 1/20 0.36
BLM P54132 1/20 0.36
PMP22 Q01453 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21575869 1.00 SHBG (0.48) SHBGEPHX1TP53ALDH1A1HSD17B10
SCHEMBL5132 1.00 SHBG (0.48) SHBGEPHX1TP53ALDH1A1HSD17B10
SCHEMBL8022524 1.00 SHBG (0.48) SHBGEPHX1TP53ALDH1A1HSD17B10
SCHEMBL5282 1.00
SCHEMBL5412 1.00 SHBG (0.48) SHBGEPHX1TP53ALDH1A1HSD17B10
SCHEMBL28542817 1.00 SHBG (0.48) SHBGEPHX1TP53ALDH1A1HSD17B10
SCHEMBL7739164 1.00 SHBG (0.48) SHBGEPHX1TP53ALDH1A1HSD17B10
Cyclohexane SCHEMBL5321429 1.00 SHBG (0.48) SHBGEPHX1TP53ALDH1A1HSD17B10
Water SCHEMBL9224817 0.97 SHBG (0.46) SHBGEPHX1TP53ALDH1A1HSD17B10
SCHEMBL140725 0.96

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9951038-B2 Quinazolin-4(3H)-one-type piperidine compounds and uses thereof PURDUE PHARMA L.P. (US) 2018-04-24 US disclosed
US-8232040-B2 Positive resist composition and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2012-07-31 US disclosed
US-20100143845-A1 POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2010-06-10 US disclosed
US-6410748-B1 Alicycli c group-containing monomer KABUSHIKI KAISHA TOSHIBA (JP) 2002-06-25 US disclosed
US-6291129-B1 LIGHT SENSITIVE ELEMENT WITH UNSATURATED POLYMERS KABUSHIKI KAISHA TOSHIBA (JP) 2001-09-18 US disclosed