⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25094 | 0.85 | — | — | |
| Ammonia Solution, Strong SCHEMBL27897772 | 0.82 | THRB (0.47) | — | |
| SCHEMBL7516401 | 0.78 | — | — | |
| SCHEMBL14633846 | 0.77 | THRB (0.33) | — | |
| SCHEMBL3188978 | 0.74 | — | — | |
| Ethylene Glycol SCHEMBL3139436 | 0.74 | THRB (0.40) | — | |
| SCHEMBL11255584 | 0.74 | ALDH1A1 (0.32) | — | |
| SCHEMBL27869153 | 0.74 | THRB (0.31) | — | |
| SCHEMBL14764576 | 0.73 | THRB (0.44) | — | |
| SCHEMBL55371 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20220121116-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-04-21 | — | — | US | disclosed |
| US-20200166837-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-05-28 | — | — | US | disclosed |
| WO-2020054449-A1 | RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD | 東京応化工業株式会社 | 2020-03-19 | — | — | WO | disclosed |
| WO-2020054563-A1 | RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD | 東京応化工業株式会社 | 2020-03-19 | — | — | WO | disclosed |
| US-20140004467-A1 | METHOD OF FORMING RESIST PATTERN AND NEGATIVE TONE-DEVELOPMENT RESIST COMPOSITION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-01-02 | — | — | US | disclosed |
| US-8232040-B2 | Positive resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-07-31 | — | — | US | disclosed |
| US-20100143845-A1 | POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-06-10 | — | — | US | disclosed |