Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.52 |
| ▸ | HPGD | P15428 | 4/20 | 0.52 |
| ▸ | ALOX15 | P16050 | 4/20 | 0.52 |
| ▸ | HSD17B10 | Q99714 | 4/20 | 0.52 |
| ▸ | CA2 | P00918 | 4/20 | 0.52 |
| ▸ | LMNA | P02545 | 3/20 | 0.52 |
| ▸ | RECQL | P46063 | 3/20 | 0.52 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.52 |
| ▸ | EGFR | P00533 | 2/20 | 0.52 |
| ▸ | FYN | P06241 | 2/20 | 0.52 |
| ▸ | MMP9 | P14780 | 2/20 | 0.52 |
| ▸ | CDK2 | P24941 | 2/20 | 0.52 |
| ▸ | CA1 | P00915 | 2/20 | 0.52 |
| ▸ | ADAMTS4 | O75173 | 1/20 | 0.52 |
| ▸ | MMP2 | P08253 | 1/20 | 0.52 |
| ▸ | MMP8 | P22894 | 1/20 | 0.52 |
| ▸ | CA6 | P23280 | 1/20 | 0.52 |
| ▸ | MMP12 | P39900 | 1/20 | 0.52 |
| ▸ | ADAMTS5 | Q9UNA0 | 1/20 | 0.52 |
| ▸ | TRPA1 | O75762 | 2/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29904876 | 1.00 | ALDH1A1 (0.52) | ALDH1A1HPGDALOX15HSD17B10CA2 | |
| SCHEMBL5329574 | 0.85 | ALDH1A1 (0.52) | ALDH1A1HPGDALOX15HSD17B10CA2 | |
| SCHEMBL1644688 | 0.85 | ALDH1A1 (0.42) | ALDH1A1HPGDALOX15HSD17B10CA2 | |
| SCHEMBL29646229 | 0.84 | ALDH1A1 (0.47) | ALDH1A1HPGDALOX15HSD17B10CA2 | |
| SCHEMBL18337 | 0.84 | ALDH1A1 (0.47) | ALDH1A1HPGDALOX15HSD17B10CA2 | |
| SCHEMBL11322501 | 0.82 | ALDH1A1 (0.45) | ALDH1A1HPGDALOX15HSD17B10CA2 | |
| SCHEMBL5372734 | 0.77 | SELL (0.36) | ALDH1A1HPGDALOX15HSD17B10CA2 | |
| SCHEMBL30678709 | 0.77 | SELL (0.36) | ALDH1A1HPGDALOX15HSD17B10CA2 | |
| SCHEMBL8520822 | 0.75 | ALDH1A1 (0.52) | ALDH1A1HPGDALOX15HSD17B10CA2 | |
| Pyrogallol SCHEMBL1042997 | 0.74 | ALDH1A1 (0.92) | ALDH1A1HPGDALOX15HSD17B10CA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 64 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024141400-A1 | COMPOSITION FOR SELECTIVELY REMOVING OXIDE COMPOUNDS AND ETCHING RESIDUES OF ONE OR BOTH OF CO AND CU | BASF SE (DE) | 2024-07-04 | — | — | WO | disclosed |
| US-20240213072-A1 | LAMINATE, RELEASE AGENT COMPOSITION, AND METHOD FOR MANUFACTURING PROCESSED SEMICONDUCTOR SUBSTRATE | NISSAN CHEMICAL CORPORATION (JP) | 2024-06-27 | — | — | US | disclosed |
| US-20240199924-A1 | LAMINATE, RELEASE AGENT COMPOSITION, AND METHOD FOR MANUFACTURING PROCESSED SEMICONDUCTOR SUBSTRATE | NISSAN CHEMICAL CORPORATION (JP) | 2024-06-20 | — | — | US | disclosed |
| EP-4310157-A1 | LAMINATE, RELEASE AGENT COMPOSITION, AND METHOD FOR MANUFACTURING MACHINED SEMICONDUCTOR SUBSTRATE | Nissan Chemical Corporation (JP) | 2024-01-24 | — | — | EP | disclosed |
| EP-4309893-A1 | LAMINATE, RELEASE AGENT COMPOSITION, AND METHOD FOR PRODUCING PROCESSED SEMICONDUCTOR SUBSTRATE | Nissan Chemical Corporation (JP) | 2024-01-24 | — | — | EP | disclosed |
| CN-117157738-A | Laminate, stripper composition, and method for producing processed semiconductor substrate | 日产化学株式会社 | 2023-12-01 | — | — | CN | disclosed |
| CN-117157739-A | Laminate, stripper composition, and method for producing processed semiconductor substrate | 日产化学株式会社 | 2023-12-01 | — | — | CN | disclosed |
| US-10607876-B2 | Method for processing mold material and method for manufacturing structural body | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-03-31 | — | — | US | disclosed |
| US-10112377-B2 | Supporting member separation method and supporting member separation apparatus | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-10-30 | — | — | US | disclosed |
| EP-2133366-B1 | FINE FIBROUS CELLULOSE MATERIAL AND METHOD FOR PRODUCING THE SAME | AIST (JP) | 2018-02-21 | — | — | EP | disclosed |
| US-6040367-A | EXCELLENT RESISTANCE TO AN IONIZING RADIATION, IN WHICH HETEROCYCLIC COMPOUND CONTAINING OXYMETHYLENE UNITS | MITSUBISHI ENGINEERING-PLASTICS CORPORATION (JP) | 2000-03-21 | — | — | US | disclosed |
| US-5977206-A | Polycarbonate resin composition | MITSUBISHI ENGINEERING-PLASTICS CORP. (JP) | 1999-11-02 | — | — | US | disclosed |
| US-5948847-A | ACRYLATED ESTER CROSSLINKED WITH NITROGEN CONTAINING ORGANIC COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-09-07 | — | — | US | disclosed |
| US-5948838-A | 0.01 TO 5 PARTS BY WEIGHT OF A COMPOUND CONTAINING OXYMETHYLENE UNIT | MITSUBISHI ENGINEERING-PLASTICS CORP. (JP) | 1999-09-07 | — | — | US | disclosed |
| US-5925495-A | Photoresist laminate and method for patterning using the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-07-20 | — | — | US | disclosed |
| US-5908738-A | Undercoating composition for photolithography | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-06-01 | — | — | US | disclosed |
| US-5756255-A | Undercoating composition for photolithography | TOKYO OHKA KOGYO CO., LTD. (JP) | 1998-05-26 | — | — | US | disclosed |
| EP-0794218-A2 | Polycarbonate resin composition stabilized against radiation | MITSUBISHI ENGINEERING-PLASTICS CORPORATION (JP) | 1997-09-10 | — | — | EP | disclosed |
| EP-0753540-A2 | Polycarbonate resin composition | MITSUBISHI ENGINEERING-PLASTICS CORPORATION (JP) | 1997-01-15 | — | — | EP | disclosed |
| US-4101519-A | MOLECULAR WEIGHT REDUCTION, TERTIARY AMINE CATALYST | GENERAL ELECTRIC COMPANY (US) | 1978-07-18 | — | — | US | disclosed |