Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.35 |
| ▸ | GAA | P10253 | 1/20 | 0.35 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.33 |
| ▸ | CNR1 | P21554 | 1/20 | 0.32 |
| ▸ | CNR2 | P34972 | 1/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3337531 | 0.96 | ALDH1A1 (0.35) | ALDH1A1GAAKDM4EMEN1KMT2A | |
| SCHEMBL12912359 | 0.78 | ALDH1A1 (0.36) | ALDH1A1GAAKDM4EMEN1KMT2A | |
| Ammonia Solution, Strong SCHEMBL27513941 | 0.76 | ALDH1A1 (0.35) | ALDH1A1GAAKDM4EMEN1KMT2A | |
| SCHEMBL978207 | 0.75 | CA12 (0.44) | ALDH1A1KDM4EMEN1KMT2ASMN1; SMN2 | |
| SCHEMBL16028020 | 0.75 | TSHR (0.42) | ALDH1A1MEN1KMT2A | |
| SCHEMBL2448884 | 0.74 | ALDH1A1 (0.33) | ALDH1A1GAAKDM4EMEN1KMT2A | |
| SCHEMBL296165 | 0.74 | TSHR (0.41) | ALDH1A1 | |
| SCHEMBL29170851 | 0.74 | TSHR (0.39) | ALDH1A1 | |
| SCHEMBL296309 | 0.72 | TSHR (0.44) | ALDH1A1SMN1; SMN2 | |
| SCHEMBL6037313 | 0.72 | TSHR (0.44) | ALDH1A1SMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8968458-B2 | Composition for resist underlayer film and process for producing same | JSR CORPORATION (JP) | 2015-03-03 | — | — | US | disclosed |
| US-8808446-B2 | Composition for resist underlayer film and process for producing same | JSR CORPORATION (JP) | 2014-08-19 | — | — | US | disclosed |
| US-20100151384-A1 | COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME | JSR CORPORATION (JP) | 2010-06-17 | — | — | US | disclosed |
| US-20090050020-A1 | COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME | JSR CORPORATION (JP) | 2009-02-26 | — | — | US | disclosed |
| EP-1855159-A1 | COMPOSITION FOR UNDERLAYER FILM OF RESIST AND PROCESS FOR PRODUCING THE SAME | JSR Corporation (JP) | 2007-11-14 | — | — | EP | disclosed |