SCHEMBL3338482

SCHEMBL3338482

C=CCNCCC[Si](C)(C)OC

nearest known ligand 0.39

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.31
GAA P10253 1/20 0.31
CNR1 P21554 1/20 0.30
CNR2 P34972 1/20 0.30
KDM4E B2RXH2 1/20 0.30
LMNA P02545 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2448885 0.85 ALDH1A1 (0.31) ALDH1A1GAACNR1CNR2KDM4E
SCHEMBL290374 0.82 GAA (0.32) ALDH1A1GAACNR1CNR2KDM4E
SCHEMBL3337524 0.81 CNR1 (0.32) CNR1CNR2
SCHEMBL558057 0.81 CYP2C19 (0.33) ALDH1A1
SCHEMBL4803557 0.79 KDM1A (0.31) ALDH1A1GAALMNA
SCHEMBL9702836 0.79 CYP2C19 (0.32) ALDH1A1
Hydrochloric Acid SCHEMBL10444990 0.78 KDM1A (0.31)
SCHEMBL822030 0.77 PAOX (0.33) ALDH1A1GAACNR1CNR2KDM4E
SCHEMBL14015574 0.77 GAA (0.33) ALDH1A1GAACNR1CNR2KDM4E
SCHEMBL7634203 0.76 KDM1A (0.31) KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2026041693-A1 HIGH-SOLIDS TRIGLYCERIDE OIL BASED WOOD COATING COMPOSITIONS SPSV B.V. (NL) 2026-02-26 WO claimed
EP-4700098-A1 HIGH-SOLIDS TRIGLYCERIDE OIL BASED WOOD COATING COMPOSITIONS SPSV B.V. (NL) 2026-02-25 EP claimed
WO-2026041693-A1 HIGH-SOLIDS TRIGLYCERIDE OIL BASED WOOD COATING COMPOSITIONS SPSV B.V. (NL) 2026-02-26 WO disclosed
EP-4700098-A1 HIGH-SOLIDS TRIGLYCERIDE OIL BASED WOOD COATING COMPOSITIONS SPSV B.V. (NL) 2026-02-25 EP disclosed
CN-118043332-A Method for producing cyclic silazane compound 信越化学工业株式会社 2024-05-14 CN disclosed
US-8968458-B2 Composition for resist underlayer film and process for producing same JSR CORPORATION (JP) 2015-03-03 US disclosed
US-8808446-B2 Composition for resist underlayer film and process for producing same JSR CORPORATION (JP) 2014-08-19 US disclosed
CN-101133364-B Composition for resist underlayer film and method for producing same JSR CORP 2013-03-20 CN disclosed
US-20100151384-A1 COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME JSR CORPORATION (JP) 2010-06-17 US disclosed
US-20090050020-A1 COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME JSR CORPORATION (JP) 2009-02-26 US disclosed
CN-101133364-A Composition for resist underlayer film and method for producing same JSR CORP (JP) 2008-02-27 CN disclosed
EP-1855159-A1 COMPOSITION FOR UNDERLAYER FILM OF RESIST AND PROCESS FOR PRODUCING THE SAME JSR Corporation (JP) 2007-11-14 EP disclosed